The first ICXOM congress held in Cambridge was the brain-child of Dr. Ellis Cosslett, founder of the Electron Optics Section of the Cavendish Laboratory. Dr. Cosslett pioneered research in x-ray optics and microanalysis and retained a close interest in all subject applications for this area of research, including physics, materials science, chemistry, and biology. X-Ray Optics and Microanalysis 1992 was held in his memory. At a special symposium, friends and colleagues reviewed the present status of research in x-ray optics and microanalysis. S.J. Pennycook of Oak Ridge National Laboratory, D.B. Williams of Lehigh University, J.A. Venables et al. of Arizona State University and Sussex University, and C. Jacobsen et al. of SUNY, Stony Brook are among the researchers whose papers are included in this volume.

This book has evolved by processes of selection and expansion from its predecessor, Practical Scanning Electron Microscopy (PSEM), published by Plenum Press in 1975. The interaction of the authors with students at the Short Course on Scanning Electron Microscopy and X-Ray Microanalysis held annually at Lehigh University has helped greatly in developing this textbook. The material has been chosen to provide a student with a general introduction to the techniques of scanning electron microscopy and x-ray microanalysis suitable for application in such fields as biology, geology, solid state physics, and materials science. Following the format of PSEM, this book gives the student a basic knowledge of (1) the user-controlled functions of the electron optics of the scanning electron microscope and electron microprobe, (2) the characteristics of electron-beam-sample inter actions, (3) image formation and interpretation, (4) x-ray spectrometry, and (5) quantitative x-ray microanalysis. Each of these topics has been updated and in most cases expanded over the material presented in PSEM in order to give the reader sufficient coverage to understand these topics and apply the information in the laboratory. Throughout the text, we have attempted to emphasize practical aspects of the techniques, describing those instru ment parameters which the microscopist can and must manipulate to obtain optimum information from the specimen. Certain areas in particular have been expanded in response to their increasing importance in the SEM field. Thus energy-dispersive x-ray spectrometry, which has undergone a tremendous surge in growth, is treated in substantial detail.

A complete introduction to x-ray microscopy, covering optics, 3D and chemical imaging, lensless imaging, radiation damage, and applications.

This book has its origins in the intensive short courses on scanning elec tron microscopy and x-ray microanalysis which have been taught annually at Lehigh University since 1972. In order to provide a textbook containing the materials presented in the original course, the lecturers collaborated to write the book Practical Scanning Electron Microscopy (PSEM), which was published by Plenum Press in 1975. The course con tinued to evolve and expand in the ensuing years, until the volume of material to be covered necessitated the development of separate intro ductory and advanced courses. In 1981 the lecturers undertook the project of rewriting the original textbook, producing the volume Scan ning Electron Microscopy and X-Ray Microanalysis (SEMXM). This vol ume contained substantial expansions of the treatment of such basic material as electron optics, image formation, energy-dispersive x-ray spectrometry, and qualitative and quantitative analysis. At the same time, a number of chapters, which had been included in the PSEM vol ume, including those on magnetic contrast and electron channeling con trast, had to be dropped for reasons of space. Moreover, these topics had naturally evolved into the basis of the advanced course. In addition, the evolution of the SEM and microanalysis fields had resulted in the devel opment of new topics, such as digital image processing, which by their nature became topics in the advanced course.

X-ray Optics and X-ray Microanalysis covers the proceedings of the Symposium on X-ray Optics and X-ray Microanalysis, held at Stanford University on August 22-24, 1962. The book focuses on X-ray microscopy, microradiography, radiation and irradiation, and X-ray microanalysis. The selection first offers information on the methods of X-ray microscopy and X-ray absorption microanalysis. Discussions focus on X-ray scanning microscopy, contact microradiography, point projection microscopy, and total dry-weight determinations. The text then takes a look at X-ray microanalysis in biology and medicine; electron microscopic enlargements of X-ray absorption micrographs; and automation in microradiography. The publication examines the production of Fresnel zone plates for extreme ultraviolet and soft X radiation; quantitative microradiographic studies of human epidermis; and irradiation effect on total organic nerve-cell material determined by integrating X-ray absorption. The manuscript then reviews the calculation of fluorescence excited by characteristic radiation in the X-ray microanalyzer and the method for calculating the absorption correction in electron-probe microanalysis. The selection is a valuable reference for readers interested in X-ray technology.

The first ICXOM congress held in Cambridge was the brain-child of Dr. Ellis Cosslett, founder of the Electron Optics Section of the Cavendish Laboratory. Dr. Cosslett pioneered research in x-ray optics and microanalysis and retained a close interest in all subject applications for this area of research, including physics, materials science, chemistry, and biology. X-Ray Optics and Microanalysis 1992 was held in his memory. At a special symposium, friends and colleagues reviewed the present status of research in x-ray optics and microanalysis. S.J. Pennycook of Oak Ridge National Laboratory, D.B. Williams of Lehigh University, J.A. Venables et al. of Arizona State University and Sussex University, and C. Jacobsen et al. of SUNY, Stony Brook are among the researchers whose papers are included in this volume.

The Fifth International Congress on X-Ray Optics and Microanalysis was organized by the Institute of Applied Physics at Tübingen University in Western Germany from September 9th through 14th, 1968. Since 1956, when the First Conference was arranged in Cambridge, England by one of the pioneers in this field, V. E. CossLETT, the experts in the fields of X-Ray Optics and Microanalysis have met every third year to exchange their scientific experiences. Later meetings were held at Uppsala, Sweden in 1959, at Stanford, California in 1962, and at Orsay, Francein 1965. The participants in the 1968 Conference came from the following countries: Germany 140, France 60, Great Britain 55, USA 20, Netherlands 16, Switzerland 12, Austria 9, Sweden 7, Belgium 6, Japan 5, Italy 4, two each from Israel, Yugoslavia, Canada, Norway, Hungary and one each from Argentine, Poland, South Africa. As at the latest congress in Paris the following central topics were treated: General problems of X-ray optics, physical bases of electron beam microanalysis, quantitative problems of X-ray microanalysis, instrumentation, microdiffraction, applications to metal lurgy, mineralogy, and biology. An exhibition showing some of the most modern instruments formed an important part of the conference. The Springer-Verlag, Heidelberg, deserves thanks for the careful and speedy work they have performed in printing these conference proceedings. We are further indebted to all contributors of this volume for their kind cooperation. Tübingen, August 1969 G. MöLLENSTEDT and K. H.