Techniques of Vacuum Ultraviolet Spectroscopy was first published in 1967. In the three decades since, the techniques associated with vacuum ultraviolet spectroscopy have been greatly expanded. Originally published as two volumes in the serial "Experimental Methods in the Physical Sciences," Vacuum Ultraviolet Spectroscopy combines in one paperback volume information on the many advances in vacuum ultraviolet (VUV) research. In addition, the book provides students and researchers with concise reviews of the important aspects of designing experiments in the VUV region.This is the only comprehensive treatise describing the use of synchrotron and other light sources for research, along with the new technologies in optical elements, multilayers, mirror coatings, soft x-ray zone plates, VUV detectors, interferometric spectrometers, and subjects such as spectromicroscopy, lithography, and photon-induced fluorescence. Vacuum Ultraviolet Spectroscopy is an ideal handbook both for the beginner and for the experienced researcher in any field requiring the use of VUV radiation. Key Features* Detailed review of synchrotron radiation sources including undulators and wigglers* Comprehensive outline of monochromator design* Concise review of optics theory for multilayers, spectrometers, and zone plates* Information about other important VUV sources such as laser produced plasmas and Electron Beam Ion Trap (EBIT) sources* Applications such as spectromicroscopy, lithography, and fluorescence

Provides comprehensive coverage of laser-induced ionization processes for mass spectrometry analysis Drawing on the expertise of the leading academic and industrial research groups involved in the development of photoionization methods for mass spectrometry, this reference for analytical scientists covers both the theory and current applications of photo-induced ionization processes. It places widely used techniques such as MALDI side by side with more specialist approaches such as REMPI and RIMS, and discusses leading edge developments in ultrashort laser pulse desorption, to give readers a complete picture of the state of the technology. Photoionization and Photo-Induced Processes in Mass Spectrometry: Fundamentals and Applications starts with a complete overview of the fundamentals of the technique, covering the basics of the gas phase ionization as well as those of laser desorption and ablation, pulse photoionization, and single particle ionization. Numerous application examples from different analytical fields are described that showcase the power and the wide scope of photo ionization in mass spectrometry. -The first general reference book on photoionization techniques for mass spectrometry -Examines technologies and applications of gas phase resonance-enhanced multiphoton ionization mass spectrometry (REMPI-MS) and gas phase resonance ionization mass spectrometry (RIMS) -Provides complete coverage of popular techniques like MALDI -Discusses the current and potential applications of each technology, focusing on process and environmental analysis Photoionization and Photo-Induced Processes in Mass Spectrometry: Fundamentals and Applications is an excellent book for spectroscopists, analytical chemists, photochemists, physical chemists, and laser specialists.

Some Aspects of Vacuum Ultraviolet Radiation Physics presents some data on the state of research in vacuum ultraviolet radiation in association with areas of physics. Organized into four parts, this book begins by elucidating the optical properties of solids in the vacuum ultraviolet region (v.u.v.), particularly the specific methods of determination of optical constants in v.u.v., the properties of metals, and those of ionic insulators. Part II deals with molecular spectroscopy, with emphasis on the spectra of diatomic and simple polyatomic molecules, paraffins, and condensed phases. Part III focuses on some aspects of emission spectroscopy in the v.u.v. in relation to laboratory plasmas. The last part describes the image formation by concave gratings, spectrophotometry, and diffusion by surfaces. This book will be very valuable to physicist and graduate students inclined to this field of interest.

These volumes contain 365 of the 505 papers presented at the VUV-11 Conference, held at Rikkyo University, Tokyo, from August 27th to September 1st 1995. The papers are divided into three sections: atomic and molecular spectroscopy, solid state spectroscopy and instrumentation and technological applications. New aspects presented were both quantitative and qualitative improvements in fluorescence spectroscopy and magnetic circular dichroism measurements. The fluorescence data are complementary to those of photoemission in a sense but they appear to open up a new method to analyze the optical excitation and relaxation processes. The application of magnetic circular dichroism has proved to be useful not only in analyzing the electronic structures of magnetic materials but also in practical applications to material engineering as found in experiments combined with photoelectron microscopy. Excellent developments in applications are only found in the field of surface photochemistry, where the technique of etching using VUV light has been appreciably refined. Although the majority of distinctive scientific features in the VUV-11 Conference have been brought about by the application of synchrotron radiation, experiments using a different type of light source appear to have progressed steadily. This is evident in the studies of plasma radiation.

This volume presents a complete and thorough examination of advances in the instrumentation, evaluation, and implementation of UV technology for reliable and efficient data acquisition and analysis. It provides real-world applications in expanding fields such as chemical physics, plasma science, photolithography, laser spectroscopy, astronomy and a