Ultra-thin Zirconium Oxide Film Deposited by Rapid Thermal Chemical Vapor Deposition as an Alternative Gate Dielectric
Title | Ultra-thin Zirconium Oxide Film Deposited by Rapid Thermal Chemical Vapor Deposition as an Alternative Gate Dielectric PDF eBook |
Author | You-Sheng Lin |
Publisher | |
Pages | 218 |
Release | 2001 |
Genre | |
ISBN |
High k Gate Dielectrics
Title | High k Gate Dielectrics PDF eBook |
Author | Michel Houssa |
Publisher | CRC Press |
Pages | 500 |
Release | 2003-12-01 |
Genre | Science |
ISBN | 1000687244 |
The drive toward smaller and smaller electronic componentry has huge implications for the materials currently being used. As quantum mechanical effects begin to dominate, conventional materials will be unable to function at scales much smaller than those in current use. For this reason, new materials with higher electrical permittivity will be requ
Rapid Thermal and Other Short-time Processing Technologies II
Title | Rapid Thermal and Other Short-time Processing Technologies II PDF eBook |
Author | Dim-Lee Kwong |
Publisher | The Electrochemical Society |
Pages | 458 |
Release | 2001 |
Genre | Technology & Engineering |
ISBN | 9781566773157 |
"Electronics, Dielectric Science and Technology, and High Temperature Materials Divisions."
Gate Stack and Silicide Issues in Silicon Processing
Title | Gate Stack and Silicide Issues in Silicon Processing PDF eBook |
Author | |
Publisher | |
Pages | 296 |
Release | 2002 |
Genre | Electric leakage |
ISBN |
Gate Stack and Silicide Issues in Silicon: Volume 670
Title | Gate Stack and Silicide Issues in Silicon: Volume 670 PDF eBook |
Author | S. A. Campbell |
Publisher | |
Pages | 296 |
Release | 2002-02-26 |
Genre | Technology & Engineering |
ISBN |
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners. This volume was first published in 2002.
High-k Gate Dielectrics for CMOS Technology
Title | High-k Gate Dielectrics for CMOS Technology PDF eBook |
Author | Gang He |
Publisher | John Wiley & Sons |
Pages | 560 |
Release | 2012-08-10 |
Genre | Technology & Engineering |
ISBN | 3527646361 |
A state-of-the-art overview of high-k dielectric materials for advanced field-effect transistors, from both a fundamental and a technological viewpoint, summarizing the latest research results and development solutions. As such, the book clearly discusses the advantages of these materials over conventional materials and also addresses the issues that accompany their integration into existing production technologies. Aimed at academia and industry alike, this monograph combines introductory parts for newcomers to the field as well as advanced sections with directly applicable solutions for experienced researchers and developers in materials science, physics and electrical engineering.
Silicon Based Unified Memory Devices and Technology
Title | Silicon Based Unified Memory Devices and Technology PDF eBook |
Author | Arup Bhattacharyya |
Publisher | CRC Press |
Pages | 512 |
Release | 2017-07-06 |
Genre | Technology & Engineering |
ISBN | 1351798324 |
The primary focus of this book is on basic device concepts, memory cell design, and process technology integration. The first part provides in-depth coverage of conventional nonvolatile memory devices, stack structures from device physics, historical perspectives, and identifies limitations of conventional devices. The second part reviews advances made in reducing and/or eliminating existing limitations of NVM device parameters from the standpoint of device scalability, application extendibility, and reliability. The final part proposes multiple options of silicon based unified (nonvolatile) memory cell concepts and stack designs (SUMs). The book provides Industrial R&D personnel with the knowledge to drive the future memory technology with the established silicon FET-based establishments of their own. It explores application potentials of memory in areas such as robotics, avionics, health-industry, space vehicles, space sciences, bio-imaging, genetics etc.