Transient Modeling of Selective Chemical Vapor Deposition of Tungsten During a Via Filling Process

Transient Modeling of Selective Chemical Vapor Deposition of Tungsten During a Via Filling Process
Title Transient Modeling of Selective Chemical Vapor Deposition of Tungsten During a Via Filling Process PDF eBook
Author Yeongdae Shon
Publisher
Pages 394
Release 1992
Genre Tungsten
ISBN

Download Transient Modeling of Selective Chemical Vapor Deposition of Tungsten During a Via Filling Process Book in PDF, Epub and Kindle

Modeling of Chemical Vapor Deposition of Tungsten Films

Modeling of Chemical Vapor Deposition of Tungsten Films
Title Modeling of Chemical Vapor Deposition of Tungsten Films PDF eBook
Author Chris R. Kleijn
Publisher Birkhäuser
Pages 138
Release 2013-11-11
Genre Science
ISBN 3034877412

Download Modeling of Chemical Vapor Deposition of Tungsten Films Book in PDF, Epub and Kindle

Semiconductor equipment modeling has in recent years become a field of great interest, because it offers the potential to support development and optimization of manufacturing equipment and hence reduce the cost and improve the quality of the reactors. This book is the result of two parallel lines of research dealing with the same subject - Modeling of Tungsten CVD processes -, which were per formed independently under very different boundary conditions. On the one side, Chris Kleijn, working in an academic research environment, was able to go deep enough into the subject to laya solid foundation and prove the validity of all the assumptions made in his work. On the other side, Christoph Werner, working in the context of an industrial research lab, was able to closely interact with manufacturing and development engineers in a modern submicron semiconductor processing line. Because of these different approaches, the informal collaboration during the course of the projects proved to be extremely helpful to both sides, even though - or perhaps because - different computer codes, different CVD reactors and also slightly different models were used. In spite of the inconsistencies which might arise from this double approach, we feel that the presentation of both sets of results in one book will be very useful for people working in similar projects.

Masters Theses in the Pure and Applied Sciences

Masters Theses in the Pure and Applied Sciences
Title Masters Theses in the Pure and Applied Sciences PDF eBook
Author Wade H. Shafer
Publisher Springer Science & Business Media
Pages 391
Release 2012-12-06
Genre Science
ISBN 1461524539

Download Masters Theses in the Pure and Applied Sciences Book in PDF, Epub and Kindle

Masters Theses in the Pure and Applied Sciences was first conceived, published, and disseminated by the Center for Information and Numerical Data Analysis and Synthesis (CINDAS)* at Purdue University in 1957, starting its coverage of theses with the academic year 1955. Beginning with Volume 13, the printing and dis semination phases of the activity were transferred to University Microfilms/Xerox of Ann Arbor, Michigan, with the though that such an arrangement would be more beneficial to the academic and general scientific and technical community. After five years of this joint undertaking we had concluded that it was in the interest of all concerned if the printing and distribution of the volumes were handled by an international publishing house to assure improved service and broader dissemi nation. Hence, starting with Volume 18, Masters Theses in the Pure and Applied Sciences has been disseminated on a worldwide basis by Plenum Publishing Corporation of New York, and in the same year the coverage was broadened to include Canadian universities. All back issues can also be ordered from Plenum. We have reported in Volume 37 (thesis year 1992) a total of 12,549 thesis titles from 25 Canadian and 153 United States universities. We are sure that this broader base for these titles reported will greatly enhance the value of this impor tant annual reference work. While Volume 37 reports theses submitted in 1992, on occasion, certain uni versities do report theses submitted in previous years but not reported at the time.

Chemical Vapor Deposition of Tungsten and Tungsten Silicides for VLSI/ ULSI Applications

Chemical Vapor Deposition of Tungsten and Tungsten Silicides for VLSI/ ULSI Applications
Title Chemical Vapor Deposition of Tungsten and Tungsten Silicides for VLSI/ ULSI Applications PDF eBook
Author John E.J. Schmitz
Publisher William Andrew
Pages 264
Release 1992-12-31
Genre Computers
ISBN

Download Chemical Vapor Deposition of Tungsten and Tungsten Silicides for VLSI/ ULSI Applications Book in PDF, Epub and Kindle

Publisher description.

Masters Theses in the Pure and Applied Sciences

Masters Theses in the Pure and Applied Sciences
Title Masters Theses in the Pure and Applied Sciences PDF eBook
Author W. H. Shafer
Publisher Springer Science & Business Media
Pages 410
Release 1994
Genre Education
ISBN 9780306447112

Download Masters Theses in the Pure and Applied Sciences Book in PDF, Epub and Kindle

Volume 37 (thesis year 1992) reports a total of 12,549 thesis titles from 25 Canadian and 153 US universities (theses submitted in previous years but only now reported are indicated by the thesis year shown in parenthesis). The organization, like that of past years, consists of thesis titles arrange

Study of Selective CVD Tungsten as a Diffusion Barrier for Electroless Copper Depositions

Study of Selective CVD Tungsten as a Diffusion Barrier for Electroless Copper Depositions
Title Study of Selective CVD Tungsten as a Diffusion Barrier for Electroless Copper Depositions PDF eBook
Author Yeeli Lee
Publisher
Pages 96
Release 1994
Genre
ISBN

Download Study of Selective CVD Tungsten as a Diffusion Barrier for Electroless Copper Depositions Book in PDF, Epub and Kindle

A Mathematical Model of the Slectivity Loss During Selective Tungsten Chemical Vapor Deposition by Hydrogen Reduction of Tungsten Hexafluoride

A Mathematical Model of the Slectivity Loss During Selective Tungsten Chemical Vapor Deposition by Hydrogen Reduction of Tungsten Hexafluoride
Title A Mathematical Model of the Slectivity Loss During Selective Tungsten Chemical Vapor Deposition by Hydrogen Reduction of Tungsten Hexafluoride PDF eBook
Author Cheng-Wu Chang
Publisher
Pages 184
Release 1993
Genre
ISBN

Download A Mathematical Model of the Slectivity Loss During Selective Tungsten Chemical Vapor Deposition by Hydrogen Reduction of Tungsten Hexafluoride Book in PDF, Epub and Kindle