Thin Film Phenomena
Title | Thin Film Phenomena PDF eBook |
Author | Kasturi L. Chopra |
Publisher | |
Pages | 872 |
Release | 1979 |
Genre | Technology & Engineering |
ISBN |
Thin Film Phenomena [by] Kasturi L. Chopra
Title | Thin Film Phenomena [by] Kasturi L. Chopra PDF eBook |
Author | Kasturi L. Chopra |
Publisher | |
Pages | 844 |
Release | 1969 |
Genre | Thin films |
ISBN |
Thin Film Phenomena
Title | Thin Film Phenomena PDF eBook |
Author | Symposium on thin film phenomena |
Publisher | |
Pages | 0 |
Release | 1978 |
Genre | |
ISBN |
Nanoscale Phenomena in Ferroelectric Thin Films
Title | Nanoscale Phenomena in Ferroelectric Thin Films PDF eBook |
Author | Seungbum Hong |
Publisher | Springer Science & Business Media |
Pages | 294 |
Release | 2013-11-27 |
Genre | Technology & Engineering |
ISBN | 1441990445 |
This book presents the recent advances in the field of nanoscale science and engineering of ferroelectric thin films. It comprises two main parts, i.e. electrical characterization in nanoscale ferroelectric capacitor, and nano domain manipulation and visualization in ferroelectric materials. Well known le'adingexperts both in relevant academia and industry over the world (U.S., Japan, Germany, Switzerland, Korea) were invited to contribute to each chapter. The first part under the title of electrical characterization in nanoscale ferroelectric capacitors starts with Chapter 1, "Testing and characterization of ferroelectric thin film capacitors," written by Dr. I. K. Yoo. The author provides a comprehensive review on basic concepts and terminologies of ferroelectric properties and their testing methods. This chapter also covers reliability issues in FeRAMs that are crucial for commercialization of high density memory products. In Chapter 2, "Size effects in ferroelectric film capacitors: role ofthe film thickness and capacitor size," Dr. I. Stolichnov discusses the size effects both in in-plane and out-of-plane dimensions of the ferroelectric thin film. The author successfully relates the electric performance and domain dynamics with proposed models of charge injection and stress induced phase transition. The author's findings present both a challenging problem and the clue to its solution of reliably predicting the switching properties for ultra-thin ferroelectric capacitors. In Chapter 3, "Ferroelectric thin films for memory applications: nanoscale characterization by scanning force microscopy," Prof. A.
Thin Film Processes
Title | Thin Film Processes PDF eBook |
Author | Jagannathan Thirumalai |
Publisher | BoD – Books on Demand |
Pages | 222 |
Release | 2017-04-12 |
Genre | Science |
ISBN | 9535130676 |
The book Thin Film Processes - Artifacts on Surface Phenomena and Technological Facets presents topics on global advancements in theoretical and experimental facts, instrumentation and practical applications of thin-film material perspectives and its applications. The aspect of this book is associated with the thin-film physics, the methods of deposition, optimization parameters and its wide technological applications. This book is divided into three main sections: Thin Film Deposition Methods: A Synthesis Perspective; Optimization Parameters in the Thin Film Science and Application of Thin Films: A Synergistic Outlook. Collected chapters provide applicable knowledge for a wide range of readers: common men, students and researchers. It was constructed by experts in diverse fields of thin-film science and technology from over 15 research institutes across the globe.
Chemical Vapor Deposition
Title | Chemical Vapor Deposition PDF eBook |
Author | Srinivasan Sivaram |
Publisher | Springer Science & Business Media |
Pages | 302 |
Release | 2013-11-11 |
Genre | Technology & Engineering |
ISBN | 1475747519 |
In early 1987 I was attempting to develop a CVD-based tungsten process for Intel. At every step ofthe development, information that we were collecting had to be analyzed in light of theories and hypotheses from books and papers in many unrelated subjects. Thesesources were so widely different that I came to realize there was no unifying treatment of CVD and its subprocesses. More interestingly, my colleagues in the industry were from many disciplines (a surface chemist, a mechanical engineer, a geologist, and an electrical engineer werein my group). To help us understand the field of CVD and its players, some of us organized the CVD user's group of Northern California in 1988. The idea for writing a book on the subject occurred to me during that time. I had already organized my thoughts for a course I taught at San Jose State University. Later Van Nostrand agreed to publish my book as a text intended for students at the senior/first year graduate level and for process engineers in the microelectronics industry, This book is not intended to be bibliographical, and it does not cover every new material being studied for chemical vapor deposition. On the other hand, it does present the principles of CVD at a fundamental level while uniting them with the needs of the microelectronics industry.
Thin Film Phenomena - Interfaces and Interactions: Proc. a Symp
Title | Thin Film Phenomena - Interfaces and Interactions: Proc. a Symp PDF eBook |
Author | J. E. Baglin |
Publisher | |
Pages | 525 |
Release | 1978 |
Genre | |
ISBN |