Systematically discusses the growth method, material properties, and applications for key semiconductor materials MOVPE is a chemical vapor deposition technique that produces single or polycrystalline thin films. As one of the key epitaxial growth technologies, it produces layers that form the basis of many optoelectronic components including mobile phone components (GaAs), semiconductor lasers and LEDs (III-Vs, nitrides), optical communications (oxides), infrared detectors, photovoltaics (II-IV materials), etc. Featuring contributions by an international group of academics and industrialists, this book looks at the fundamentals of MOVPE and the key areas of equipment/safety, precursor chemicals, and growth monitoring. It covers the most important materials from III-V and II-VI compounds to quantum dots and nanowires, including sulfides and selenides and oxides/ceramics. Sections in every chapter of Metalorganic Vapor Phase Epitaxy (MOVPE): Growth, Materials Properties and Applications cover the growth of the particular materials system, the properties of the resultant material, and its applications. The book offers information on arsenides, phosphides, and antimonides; nitrides; lattice-mismatched growth; CdTe, MCT (mercury cadmium telluride); ZnO and related materials; equipment and safety; and more. It also offers a chapter that looks at the future of the technique. Covers, in order, the growth method, material properties, and applications for each material Includes chapters on the fundamentals of MOVPE and the key areas of equipment/safety, precursor chemicals, and growth monitoring Looks at important materials such as III-V and II-VI compounds, quantum dots, and nanowires Provides topical and wide-ranging coverage from well-known authors in the field Part of the Materials for Electronic and Optoelectronic Applications series Metalorganic Vapor Phase Epitaxy (MOVPE): Growth, Materials Properties and Applications is an excellent book for graduate students, researchers in academia and industry, as well as specialist courses at undergraduate/postgraduate level in the area of epitaxial growth (MOVPE/ MOCVD/ MBE).

Optoelectronics ranks one of the highest increasing rates among the different industrial branches. This activity is closely related to devices which are themselves extremely dependent on materials. Indeed, the history of optoelectronic devices has been following closely that of the materials. KLUWER Academic Publishers has thus rightly identified "Materials for Optoelectronics" as a good opportunity for a book in the series entitled "Electronic Materials; Science and Technology". Although a sound background in solid state physics is recommended, the authors have confined their contribution to a graduate student level, and tried to define any concept they use, to render the book as a whole as self-consistent as possible. In the first section the basic aspects are developed. Here, three chapters consider semiconductor materials for optoelectronics under various aspects. Prof. G. E. Stillman begins with an introduction to the field from the point of view of the optoelectronic market. Then he describes how III-V materials, especially the Multi Quantum Structures meet the requirements of optoelectronic functions, including the support of microelectronics for optoelectronic integrated circuits. In chapter 2, Prof.

Bi-containing III-V alloys have been proposed as alternative candidates for near and mid-infrared optoelectronic applications in recent years stimulated by the large bandgap energy reduction arising from the Bi addition into the III-V matrix. Metal-organic vapor phase epitaxy (MOVPE) of Bi-containing III-V alloys has been explored covering from the studies on its fundamental growth kinetics to the heterostructure designs containing III-V-Bi layers. As a group V element with a large covalent radius, Bi incorporation in the III-V matrix is thermodynamically unflavored and subjected to phase-separation during the growth process. Low growth temperatures are required to slow down the surface kinetics that lead to the Bi droplets formation. At such low growth temperatures, the Bi incorporation in III-V systems is expected to be mainly controlled by a sequence of chemical reactions, which may be difficult to predict due to the large number of possible reaction pathways involved in the metal-organic precursor at the gas phase and on the surface. In this study, the equilibrium Bi solubility in the III-V semiconductors was explored to reveal the thermodynamic limitation for Bi incorporation and illustrate the possible approaches to enhance the Bi solubility through tuning the Gibbs free energy of the system by the epitaxial stain or additional element incorporation. MOVPE growth was also carried out systematically to study the important kinetic processes involved in the MOVPE growth of GaAs1-xBix and In1-yGayAs1-xBix. This research enriched our knowledge of the fundamental thermodynamics and kinetics associated with the Bi-containing III-Vs and their MOVPE growth, revealed practical approaches to enhance the Bi solubility in III-V matrix, and supported the future semiconductor heterostructure design utilizing the Bi-containing III-V alloys.

Here is one of the first single-author treatments of organometallic vapor-phase epitaxy (OMVPE)--a leading technique for the fabrication of semiconductor materials and devices. Also included are metal-organic molecular-beam epitaxy (MOMBE) and chemical-beam epitaxy (CBE) ultra-high-vacuum deposition techniques using organometallic source molecules. Of interest to researchers, students, and people in the semiconductor industry, this book provides a basic foundation for understanding the technique and the application of OMVPE for the growth of both III-V and II-VI semiconductor materials and the special structures required for device applications. In addition, a comprehensive summary detailing the OMVPE results observed to date in a wide range of III-V and II-VI semiconductors is provided. This includes a comparison of results obtained through the use of other epitaxial techniques such as molecular beam epitaxy (MBE), liquid-phase epitaxy (LPE), and vapor phase epitaxy using halide transport.

III-V semiconductors have attracted considerable attention due to their applications in the fabrication of electronic and optoelectronic devices as light emitting diodes and solar cells. The electrical properties of these semiconductors can also be tuned by adding impurity atoms. Because of their wide application in various devices, the search for new semiconductor materials and the improvement of existing materials is an important field of study. Doping with impurities is a common method of modifying and diversifying the properties of physical and chemical semiconductors. This book covers all known information about phase relations in quaternary systems based on III-V semiconductors, providing he first systematic account of phase equilibria in quaternary systems based on III-V semiconductors and making research originally published in Russian accessible to the wider scientific community. Features: Contains up-to-date experimental and theoretical information Allows readers to synthesize semiconducting materials with predetermined properties Delivers a critical evaluation of many industrially important systems presented in the form of two-dimensional sections for the condensed phases

The phenomenonofspontaneous ordering in semiconductoralloys, which can be categorized as a self-organized process, is observed to occur sponta neously during epitaxial growth of certain ternary alloy semiconductors and results in a modification of their structural, electronic, and optical properties. There has been a great dealofinterest in learning how to control this phenome non so that it may be used for tailoring desirable electronic and optical properties. There has been even greater interest in exploiting the phenomenon for its unique ability in providing an experimental environment of controlled alloy statistical fluctuations. As such, itimpacts areasofsemiconductorscience and technology related to the materials science ofepitaxial growth, statistical mechanics, and electronic structure of alloys and electronic and photonic devices. During the past two decades, significant progress has been made toward understanding the mechanisms that drive this phenomenon and the changes in physical properties that result from it. A variety of experimental techniques have been used to probe the phenomenon and several attempts made atproviding theoretical models both for the ordering mechanisms as well as electronic structure changes. The various chapters of this book provide a detailed account of these efforts during the past decade. The first chapter provides an elaborate account of the phenomenon, with an excellent perspective of the structural and elec tronic modifications itinduces.