The objectives of our research program have been to carry out a systematic experimental and theoretical study of the thermal and transport properties of granular metal films. This work has involved the preparation of a number of different granular metal systems by RF sputter deposition, characterization of these materials by x-ray diffraction (XRD), transmission electron microscopy (TEM), and x-ray photoelectron spectroscopy (XPS), the study of thermal properties by differential scanning calorimetry (DSC) measurements, and the study of the electrical transport behavior from room temperature to below 100 mK and, at low temperatures, in applied magnetic fields up to about 6 T. Using a variety of complementary analytical and numerical techniques, detailed theoretical studies have also been carried out on the structure, melting, transport, and optical properties of small granular particles.

This paper presents results of a successful four year effort funded by the Air Force to develop a measurement system for the study of optical-thin-film thermal transport properties. Data are presented on several coated samples. Characteristic features of the data are interpreted in terms of behavior expected on the basis of solutions of the heat diffusion equation. Comparisons are made between observed coating data and model predictions based on handbook data on coating materials in bulk format. These comparisons show close agreement for measurable properties in the special cases studied. The data are found to be free of unexpected structure.

The results of the following investigations are presented: (1) Improvements to the preparation and fabrication of evaporated thin metallic films; (2) Comparison of thin film thickness using x-rays, the temperature coefficient of the resistivity and goniophotometric measurements; (3) Use of goniophotometric measurements for detecting very thin surface layers (oxides); (4) Use of ellipsometric measurements for study of thin films and surfaces, with new instrumentation; (5) Measurement of resistivity and Hall constant of thin metal films in vacuo with high accuracy; (6) Use of the optical and electrical measurements performed on the same film in order to determine the scattering parameter and the optical effective mass of the conduction electrons, and the resistivity due to defects in the film; and (7) New results concerning the optical properties of Au, Cu, Pd, and Au-Pd. (Author).

This up-to-date handbook covers the main topics of preparation, characterization and properties of complex metal-based layer systems. The authors -- an outstanding group of researchers -- discuss advanced methods for structure, chemical and electronic state characterization with reference to the properties of thin functional layers, such as metallization and barrier layers for microelectronics, magnetoresistive layers for GMR and TMR, sensor and resistance layers. As such, the book addresses materials specialists in industry, especially in microelectronics, as well as scientists, and can also be recommended for advanced studies in materials science, analytics, surface and solid state science.

Thin films of conducting materials, such as metals, alloys and semiconductors are currently in use in many areas of science and technology, particularly in modern integrated circuit microelectronics that require high quality thin films for the manufacture of connection layers, resistors and ohmic contacts. These conducting films are also important for fundamental investigations in physics, radio-physics and physical chemistry. Physical Properties of Thin Metal Films provides a clear presentation of the complex physical properties particular to thin conducting films and includes the necessary theory, confirming experiments and applications. The volume will be an invaluable reference for graduates, engineers and scientists working in the electronics industry and fields of pure and applied science.