The synchrotron light source is becoming widely available, after its evolution from its infancy in the sixties to the present third generation source with insertion devices. It is timely to examine the impact that synchrotron light has made and will continue to make on chemical research. With this objective in mind, the editor of this invaluable book invited contributions from practitioners who are in the forefront of the research. The book summarizes most of the significant developments in the last decade in chemical and related research using synchrotron light. The utilization of the light as a probe as well as an energy source is emphasized.This book is organized into two parts, in order of increasing photon energy. Part I deals with the applications of low energy photons and covers areas such as gas phase photodissociation reactions and dynamics, soft X-ray fluorescence, IR and photoemission analysis of surfaces, spectroscopy of organic and polymeric materials, catalysts, electronic and magnetic materials, and spectromicroscopy. Part II encompasses applications using soft to hard X-rays, including spectroscopy of surface and thin films, XAFS, diffraction and scattering, and several technological applications, namely the microprobe, photoetching and tribology.

Publisher Description

The synchrotron light source is becoming widely available, after its evolution from its infancy in the sixties to the present third generation source with insertion devices. It is timely to examine the impact that synchrotron light has made and will continue to make on chemical research. With this objective in mind, the editor of this invaluable book invited contributions from practitioners who are in the forefront of the research. The book summarizes most of the significant developments in the last decade in chemical and related research using synchrotron light. The utilization of the light as a probe as well as an energy source is emphasized.This book is organized into two parts, in order of increasing photon energy. Part I deals with the applications of low energy photons and covers areas such as gas phase photodissociation reactions and dynamics, soft X-ray fluorescence, IR and photoemission analysis of surfaces, spectroscopy of organic and polymeric materials, catalysts, electronic and magnetic materials, and spectromicroscopy. Part II encompasses applications using soft to hard X-rays, including spectroscopy of surface and thin films, XAFS, diffraction and scattering, and several technological applications, namely the microprobe, photoetching and tribology.

These proceedings are the result of the third international workshop on Desorption Induced by Electronic Transitions, DIET III, which took place on Shelter Island, NY, May. 20-22, 1987. The work contained in this volume is an excellent summary of the current status of the field and should be a valuable reference text for both "seasoned" researchers and newcomers in the field of DIET. Based on the success of the meeting it seems clear that interest and enthusiasm in the field is strong. It is also apparent, from the many lively discussions during the meeting, that many unanswered questions (and controversies) remain to be solved. It was particularly pleasing to see many new participants from new and rapidly advancing fields, ranging from gas phase dynamics to semiconductor processing. The resulting cross-fertilization from these separate but related fields is playing an important role in helping us understand desorption processes at solid surfaces. In general, the topics covered during the course of the workshop over lapped those of both DIET I and DIET II. However, clear advances have been made and in general there is a much more sophisticated understand ing of the physics and chemistry of stimulated desorption. Of particular note in this regard is the gas phase research highlighted in this workshop by the work of Nenner et al. , where new results indicate that in the gas phase, photodissociation can precede or compete strongly with autoion ization and other electronic relaxation pathways.

The topics covered in this book include a variety of adsorption and model reaction studies on clean and modified single crystal metal surfaces obtained by means of properly selected surface sensitive techniques. The accent is on the revelation of the physics and chemistry involved in the effects of various modifiers on the adsorptive and reactivity properties of the surface with respect to different reactants. In this book current information that contributes to the fundamental understanding of the effect of additives is summarized. Some of the additives act as promoters, others as poisons, in a number of important catalytic reactions. A description of single- and double-component systems has been obtained by using surface-sensitive techniques, particularly suited for this purpose. For the benefit of the reader, a short summary of the main surface science techniques has been given in Chapter 2. Three general and interrelated topics are reviewed. The first concerns the interaction of electronegative (Cl, S, Se, C, N, O, P) and electropositive (alkali metals) atoms with metal surfaces (Chapter 4). The second topic covers the chemisorptive properties of metal surfaces modified by varying amounts of additives with respect to different reactants (CO, NO, N2, O2, H2, CO2, NH3, H2O and hydrocarbons) (Chapters 5 and 6). In particular the adsorption kinetics and energetics, and the electronic, structural and reactive properties of the coadsorbate systems are considered, whereby particular attention is given to recent surface science studies with well-characterized, single crystal, metal surfaces. In these chapters, special attention is paid to showing the contribution of different factors (the nature and adsorption state of the modifier and the coadsorbed molecule, the structure of the adsorbed layer, the type of interactions in the mixed overlayers, etc.) to the modifier effects. In the discussion of the third topic, model studies of several important catalytic reactions (Fischer-Tropsch synthesis, ammonia synthesis, CO oxidation, water-gas shift synthesis) on modified metal surfaces (Chapter 8) are considered.The book will be particularly useful to scientists who are interested in adsorption phenomena, surface properties and catalysis. It should also prove invaluable to those addressing the questions of condensed matter (surfaces and interfaces), materials science (e.g. corrosion of metals) and electrochemistry.