BuDocks Technical Digest
Title | BuDocks Technical Digest PDF eBook |
Author | |
Publisher | |
Pages | 476 |
Release | 1951 |
Genre | Civil engineering |
ISBN |
BuDocks Technical Digest, Construction, Maintenance & Operation of the Navy's Shore Establishments
Title | BuDocks Technical Digest, Construction, Maintenance & Operation of the Navy's Shore Establishments PDF eBook |
Author | |
Publisher | |
Pages | 374 |
Release | 1957 |
Genre | Civil engineering |
ISBN |
Cold Regions Technical Digest
Title | Cold Regions Technical Digest PDF eBook |
Author | |
Publisher | |
Pages | 16 |
Release | 1991 |
Genre | Engineering |
ISBN |
Technical Digest
Title | Technical Digest PDF eBook |
Author | |
Publisher | |
Pages | 456 |
Release | 1992 |
Genre | Industrial engineering |
ISBN |
Technical Digest, Symposium on Optical Fiber Measurements, 1990
Title | Technical Digest, Symposium on Optical Fiber Measurements, 1990 PDF eBook |
Author | G. W. Day |
Publisher | |
Pages | 218 |
Release | 1990 |
Genre | Optical fibers |
ISBN |
Technical Digest 1986
Title | Technical Digest 1986 PDF eBook |
Author | |
Publisher | |
Pages | 262 |
Release | 1986 |
Genre | Gallium arsenide semiconductors |
ISBN |
High Dielectric Constant Materials
Title | High Dielectric Constant Materials PDF eBook |
Author | Howard Huff |
Publisher | Springer Science & Business Media |
Pages | 740 |
Release | 2005 |
Genre | Science |
ISBN | 9783540210818 |
Issues relating to the high-K gate dielectric are among the greatest challenges for the evolving International Technology Roadmap for Semiconductors (ITRS). More than just an historical overview, this book will assess previous and present approaches related to scaling the gate dielectric and their impact, along with the creative directions and forthcoming challenges that will define the future of gate dielectric scaling technology. Topics include: an extensive review of Moore's Law, the classical regime for SiO2 gate dielectrics; the transition to silicon oxynitride gate dielectrics; the transition to high-K gate dielectrics (including the drive towards equivalent oxide thickness in the single-digit nanometer regime); and future directions and issues for ultimate technology generation scaling. The vision, wisdom, and experience of the team of authors will make this book a timely, relevant, and interesting, resource focusing on fundamentals of the 45 nm Technology Generation and beyond.