Synthesis and Characterization of Precursors for Chemical Vapor Deposition of Metal Oxide Thin Films
Title | Synthesis and Characterization of Precursors for Chemical Vapor Deposition of Metal Oxide Thin Films PDF eBook |
Author | May Nyman |
Publisher | |
Pages | 354 |
Release | 1992 |
Genre | Metallic films |
ISBN |
Synthesis and Characterization of Transition-metal Substituted Germacyclopent-3-enes and Their Use as Precursors for the Chemical Vapor Deposition of Binary Thin Films
Title | Synthesis and Characterization of Transition-metal Substituted Germacyclopent-3-enes and Their Use as Precursors for the Chemical Vapor Deposition of Binary Thin Films PDF eBook |
Author | John W. Garvey |
Publisher | |
Pages | 342 |
Release | 1996 |
Genre | Chemical vapor deposition |
ISBN |
Precursor Chemistry of Advanced Materials
Title | Precursor Chemistry of Advanced Materials PDF eBook |
Author | Roland A. Fischer |
Publisher | Springer Science & Business Media |
Pages | 240 |
Release | 2005-09-29 |
Genre | Science |
ISBN | 9783540016052 |
Material synthesis by the transformation of organometallic compounds (precursors) by vapor deposition techniques such as chemical vapor deposition (CVD) and atomic layer deposition (ALD) has been in the forefront of modern day research and development of new materials. There exists a need for new routes for designing and synthesizing new precursors as well as the application of established molecular precursors to derive tuneable materials for technological demands. With regard to the precursor chemistry, a most detailed understanding of the mechanistic complexity of materials formation from molecular precursors is very important for further development of new processes and advanced materials. To emphasize and stimulate research in these areas, this volume comprises a selection of case studies covering various key-aspects of the interplay of precursor chemistry with the process conditions of materials formation, particularly looking at the similarities and differences of CVD, ALD and nanoparticle synthesis, e.g. colloid chemistry, involving tailored molecular precursors.
Metal-organic Chemical Vapor Deposition of Cerium Oxide, Gallium-indium-oxide, and Magnesium Oxide Thin Films
Title | Metal-organic Chemical Vapor Deposition of Cerium Oxide, Gallium-indium-oxide, and Magnesium Oxide Thin Films PDF eBook |
Author | Nikki Lynn Edleman |
Publisher | |
Pages | |
Release | 2002 |
Genre | |
ISBN |
The synthesis and characterization of a new magnesium MOCVD precursor, Mg(dpm)2(TMEDA) is detailed. It is shown that the donating ligand TMEDA prevents oligomerization and subsequent volatility depression as observed in the commonly used [Mg(dpm)2]2. The superiority of Mg(dpm)2(TMEDA) as an MOCVD precursor is explicitly demonstrated by growth of epitaxial MgO thin films on single-crystal SrTiO3 substrates.
Synthesis and Characterization of Silicon Dioxide Thin Films by Plasma Enhances Chemical Vapor Deposition from Diethylsilane and Nitrous Oxide
Title | Synthesis and Characterization of Silicon Dioxide Thin Films by Plasma Enhances Chemical Vapor Deposition from Diethylsilane and Nitrous Oxide PDF eBook |
Author | Lan Chen |
Publisher | |
Pages | 120 |
Release | 1995 |
Genre | Silicon dioxide films |
ISBN |
Metal-organic Chemical Vapor Deposition of Indium Oxide Based Transparent Conducting Oxide Thin Films
Title | Metal-organic Chemical Vapor Deposition of Indium Oxide Based Transparent Conducting Oxide Thin Films PDF eBook |
Author | Jun Ni |
Publisher | |
Pages | |
Release | 2005 |
Genre | |
ISBN |
Four novel diamine adducts of bis(hexafluoroacetylacetonato)zinc [Zn(hfa)2·(diamine)] can be synthesized in a single step reaction. Single crystal x-ray diffraction studies reveal monomeric, six-coordinate structures. The thermal stabilities and vapor phase transport properties of these complexes are considerably greater than those of conventional solid/liquid zinc metal-organic chemical vapor deposition (MOCVD) precursors. Of the four complexes, bis(1,1,1,5,5,5-hexafluoro-2,4-pentadionato)(N,N '-diethylethylenediamine)zinc [Zn(hfa)2 ( N,N'-DEA)], is particularly effective in the growth of thin films of the transparent conducting oxide Zn- and Sn-doped In2O3 (ZITO) due to its superior volatility and low melting point of 64°C.
Chemical Vapor Deposition and Characterization of Titanium Dioxide Thin Films
Title | Chemical Vapor Deposition and Characterization of Titanium Dioxide Thin Films PDF eBook |
Author | David Christopher Gilmer |
Publisher | |
Pages | 314 |
Release | 1998 |
Genre | |
ISBN |