"The papers in this volume provide a permanent record of submissions to the Surface Oxide Films symposium that formed a part of the 204th Electrochemical Society meeting, held in Orlando, Florida (12-17 October 2003)."--p. iii.

The book is a multi-author survey (in 15 chapters) of the current state of knowledge and recent developments in our understanding of oxide surfaces. The author list includes most of the acknowledged world experts in this field. The material covered includes fundamental theory and experimental studies of the geometrical, vibrational and electronic structure of such surfaces, but with a special emphasis on the chemical properties and associated reactivity. The main focus is on metal oxides but coverage extends from 'simple' rocksalt materials such as MgO through to complex transition metal oxides with different valencies.

Aluminium is an important metal in manufacturing, due to its versatile properties and the many applications of both the processed metal and its alloys in different industries. Fundamentals of aluminium metallurgy provides a comprehensive overview of the production, properties and processing of aluminium, and its applications in manufacturing industries.Part one discusses different methods of producing and casting aluminium, covering areas such as casting of alloys, quality issues and specific production methods such as high-pressure diecasting. The metallurgical properties of aluminium and its alloys are reviewed in Part two, with chapters on such topics as hardening, precipitation processes and solute partitioning and clustering, as well as properties such as fracture resistance. Finally, Part three includes chapters on joining, laser sintering and other methods of processing aluminium, and its applications in particular areas of industry such as aerospace.With its distinguished editor and team of expert contributors, Fundamentals of aluminium metallurgy is a standard reference for researchers in metallurgy, as well as all those involved in the manufacture and use of aluminium products. - Provides a comprehensive overview of the production, properties and processing of aluminium, and its applications in manufacturing industries - Considers many issues of central importance in aluminium production and utilization considering quality issues and design for fatigue growth resistance - Metallurgical properties of aluminium and its alloys are further explored with particular reference to work hardening and applications of industrial alloys

Corrosion of Aluminium highlights the practical and general aspects of the corrosion of aluminium alloys with many illustrations and references. In addition to that, the first chapter allows the reader who is not very familiar with aluminium to understand the metallurgical, chemical and physical features of the aluminium alloys. The author Christian Vargel, has adopted a practitioner approach, based on the expertise and experience gained from a 40 year career in aluminium corrosion This approach is most suitable for assessing the corrosion resistance of aluminium- an assessment which is one of the main conditions for the development of many uses of aluminium in transport, construction, power transmission etc. - 600 bibliographic references provide a comprehensive guide to over 100 years of related study - Providing practical applications to the reader across many industries - Accessible to both the beginner and the expert

A totally new concept for clean surface processing of Si wafers is introduced in this book. Some fifty distinguished researchers and engineers from the leading Japanese semiconductor companies, such as NEC, Hitachi, Toshiba, Sony and Panasonic as well as from several universities reveal to us for the first time the secrets of these highly productive institutions. They describe the techniques and equipment necessary for the preparation of clean high-quality semiconductor surfaces as a first step in high-yield/high-quality device production. This book thus opens the door to the manufacturing of reliable nanoscale devices and will be extremely useful for every engineer, physicist and technician involved in the production of silicon semiconductor devices.

Oxides form a broad subject area of research and technology development which encompasses different disciplines such as materials science, solid state chemistry, physics etc. The aim of this book is to demonstrate the interplay of these fields and to provide an introduction to the techniques and methodologies involving film growth, characterization and device processing. The literature in this field is thus fairly scattered in different research journals covering one or the other aspect of the specific activity. This situation calls for a book that will consolidate this information and thus enable a beginner as well as an expert to get an overall perspective of the field, its foundations, and its projected progress.