This new edition draws upon the fundamentals of abrasive machining processes and the science of tribology to understand, predict, and improve abrasive machining processes. Each of the main elements of the abrasive machining system is looked at alongside the tribological factors that control the efficiency and quality of the processes described. The new edition has been updated to include a variety of industrial applications. Grinding and conditioning of grinding tools are dealt with in particular detail, and solutions are proposed for many of the most commonly experienced industrial problems, such as poor accuracy, poor surface quality, rapid tool wear, vibrations, workpiece burn, and high process costs. The entire book has been rewritten and restructured, with ten completely new chapters. Other new features include: - Extensive explanations of the main abrasive machining processes such as grinding (including reciprocating and creep-feed grinding, high-speed high-efficiency deep grinding, external and internal cylindrical grinding, and centerless grinding), honing, superfinishing, lapping, polishing, and finishing - Discussions of the new classes of abrasives, abrasive tools, and bonding materials - New case studies and troubleshooting on the most common grinding practices - New coverage on grinding tool conditioning, mechanical dressing, and nonmechanical dressing processes - Detailed explanations of the effects of process input parameters (such as cutting parameters, workpiece material and geometry, and abrasive tools) on process characteristics, workpiece quality, tool wear, and process parameters (such as cutting forces and temperature as well as achievable material removal rate) - Updated topics regarding process fluids for abrasive machining and fluid delivery

These proceedings review the progress in most aspects of semiconductor physics, including those related to materials, processing and devices. The conference continues the tradition of the ICPS series and these volumes include state-of-the-art lectures. The plenary and invited papers address areas of major interest.These volumes will serve as excellent material for researchers in semiconductor physics and related fields.

For lower-division courses with an equal balance of description and theory.

This bestselling text introduces descriptive inorganic chemistry in a less rigorous, less mathematical way. The book uses the periodic table as basis for understanding chemical properties and uncovering relationships between elements in different groups. Rayner-Canham and Overton’s text also familiarizes students with the historical background of inorganic chemistry as well as with its crucial applications (especially in regard to industrial processes and environmental issues), resulting in a comprehensive appreciation and understanding of the field and the role it will play in their fields of further study

The fifth edition of the Kirk-Othmer Encyclopedia of Chemical Technology builds upon the solid foundation of the previous editions, which have proven to be a mainstay for chemists, biochemists, and engineers at academic, industrial, and government institutions since publication of the first edition in 1949. The new edition includes necessary adjustments and modernisation of the content to reflect changes and developments in chemical technology. Presenting a wide scope of articles on chemical substances, properties, manufacturing, and uses; on industrial processes, unit operations in chemical engineering; and on fundamentals and scientific subjects related to the field. The Encyclopedia describes established technology along with cutting edge topics of interest in the wide field of chemical technology, whilst uniquely providing the necessary perspective and insight into pertinent aspects, rather than merely presenting information. * Set begins publication in March 2004 * Over 1000 articles in 27 volumes * More than 600 new or updated articles Reviews from the previous edition: "The most indispensable reference in the English language on all aspects of chemical technology...the best reference of its kind". Chemical Engineering News, 1992 "Overall, ECT is well written and cleanly edited, and no library claiming to be a useful resource for chemical engineering professionals should be without it." Nicholas Basta, Chemical Engineering, December 1992