Structure and Electronic Properties of Ultrathin Dielectric Films on Silicon and Related Structures: Volume 592

Structure and Electronic Properties of Ultrathin Dielectric Films on Silicon and Related Structures: Volume 592
Title Structure and Electronic Properties of Ultrathin Dielectric Films on Silicon and Related Structures: Volume 592 PDF eBook
Author D. A. Buchanan
Publisher Mrs Proceedings
Pages 408
Release 2000-10-17
Genre Technology & Engineering
ISBN

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The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners. The book, first published in 2000, includes detailed theoretical studies of the nature of SiO2 and its interface with silicon, electron paramagnetic resonance for the study of defects, electron tunneling, and band alignment among others.

Structure and Electronic Properties of Ultrathin Dielectric Films on Silicon and Related Structures

Structure and Electronic Properties of Ultrathin Dielectric Films on Silicon and Related Structures
Title Structure and Electronic Properties of Ultrathin Dielectric Films on Silicon and Related Structures PDF eBook
Author
Publisher
Pages 386
Release 1999
Genre Dielectric films
ISBN

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Silicon Nitride, Silicon Dioxide Thin Insulating Films, and Other Emerging Diele[c]trics VIII

Silicon Nitride, Silicon Dioxide Thin Insulating Films, and Other Emerging Diele[c]trics VIII
Title Silicon Nitride, Silicon Dioxide Thin Insulating Films, and Other Emerging Diele[c]trics VIII PDF eBook
Author Ram Ekwal Sah
Publisher The Electrochemical Society
Pages 606
Release 2005
Genre Nature
ISBN 9781566774598

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Rapid Thermal and Other Short-time Processing Technologies

Rapid Thermal and Other Short-time Processing Technologies
Title Rapid Thermal and Other Short-time Processing Technologies PDF eBook
Author Fred Roozeboom
Publisher The Electrochemical Society
Pages 482
Release 2000
Genre Technology & Engineering
ISBN 9781566772747

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The proceedings from this May 2000 symposium illustrate the range of applications in Rapid Thermal Processing (RTP). The refereed papers cover a variety of issues, such as ultra-shallow junctions; contacts for nanoscale CMOS; gate stacks; new applications of RTP, such as for the enhanced crystalization of amorphous silicon thin films; and advances on RTP systems and process monitoring, including optimizing and controlling gas flows in an RTCVD reactor. Most presentations are supported by charts and other graphical data. c. Book News Inc.

Oxide Reliability

Oxide Reliability
Title Oxide Reliability PDF eBook
Author D. J. Dumin
Publisher World Scientific
Pages 292
Release 2002
Genre Technology & Engineering
ISBN 9789810248420

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Presents in summary the state of our knowledge of oxide reliability.

Nucleation and Growth Processes in Materials

Nucleation and Growth Processes in Materials
Title Nucleation and Growth Processes in Materials PDF eBook
Author Antonios Gonis
Publisher
Pages 474
Release 2000
Genre Science
ISBN

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One of the goals of materials science is to design alloys with pre-specified desirable technological properties. To achieve this goal, it is necessary to have a thorough understanding of the fundamental mechanisms underlying materials behavior. In particular, one must understand the effects on alloy properties caused by intentional changes in concentration and how the combinations of temperature, time and uncontrollable foreign impurities affect microstructure. In addition to the equilibrium phase information contained in phase diagrams, nonequilibrium dynamic processes and metastable phases are known to be crucial in determining materials properties. This volume brings together researchers working on various aspects of nonequilibrium processes in materials to discuss current research issues and to provide guidelines for future work. Particular attention was paid to understanding particle nucleation and growth, both experimentally and theoretically, solid-state reactions, nanosystems, liquid-solid transformations, and solidification and amorphization. On the theoretical side, fundamental principles governing nucleation and growth, and related phenomena such as coarsening and Ostwald ripening, are discussed. Progress is also reported on the phase field method and on Monte Carlo simulations.

The Physics and Chemistry of SiO2 and the Si-SiO2 Interface-3, 1996

The Physics and Chemistry of SiO2 and the Si-SiO2 Interface-3, 1996
Title The Physics and Chemistry of SiO2 and the Si-SiO2 Interface-3, 1996 PDF eBook
Author Hisham Z. Massoud
Publisher
Pages 804
Release 1996
Genre Science
ISBN

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