This volume entitled "Protective Coatings and Thin Films : Synthesis, Characterization and Applications" contains the Proceedings of the NATO Advanced Research Workshop (ARW) held in Alvor, Portugal from May 30 to June 5, 1996. This NATO-ARW was an expert meeting on the surface protection and modification of solid materials subjected to interactions with the environment. The meeting attracted 10 key speakers, 40 contributing speakers and 3 observers from various countries. The existing knowledge and current status of the science and technology related to protective coatings and thin films were assessed through a series of oral presentations, key notes (titles underlined in the volume content) and contributed papers distributed over various sessions dealing with: (a) plasma-assisted physical and chemical vapor deposition processes to enhance wear and corrosion protection of materials, (b) low friction coatings operating in hostile environment (vacuum, space, extreme temperatures, . . . ), (c) polymer films for protection against mechanical damage and chemical attack, (d) characterization of the structure of films and correlations with mechanical properties, (e) wear and corrosion resistant thermal spray coatings, (f) functional gradient ceramic/metallic coatings produced by high energy laser beam and energetic deposition processes for high temperature applications, (g) protective coatings for optical systems, and (h) ion beam assisted deposition of coatings for protection of materials against aqueous corrosion.

This book explores chemical methods for thin film deposition with diverse nanostructured morphology and their applications. Unlike top-down techniques, chemical methods offer low cost, simplicity, and growth of nanostructured surface architecture with ease of small to large-scale area deposition. The book primarily focuses on innovative twelve chemical methods for thin-film deposition on one platform. Since each method has its own advantages and disadvantages, it is crucial to select the specific method for specific material to be deposited depending upon what type of application is targeted. Due to inclusive of diverse chemical deposition methods, researcher will have knowledge about best choice of the deposition method to be adopted. Inclusive methods discussed in the book are chemical bath deposition, successive ionic layer adsorption and reaction, ion exchange, electroless deposition, electrodeposition, hydrothermal, spray pyrolysis, spin coating, dip coating, doctor blade, screen printing, and sol-gel. The selection of the correct procedure for material to be deposited in thin film form depends on its unique process parameters based on the kind of application and its requirement. The role of preparative factors necessary for thin film alters properties related to structure and surface morphology, electrical conductivity and optical band gap which have been extensively discussed along with the underlying science of film synthesis. The book provides a comprehensive overview of the field of chemical methods for thin film synthesis to applications. In addition to synthesis, the book covers characterization, instrumentation, and industrial application of thin films. As a result, concentrated techniques will be of great interest to university/college professors, students and new engineers as well as postdocs and scientists in the area.

This book is about thin films; what they are, how they are prepared, how they are characterized, and what they are used for. The contents of this book not only showcase the diversity of thin films, but also reveals the commonality among the work performed in a variety of areas. The chapters in this volume are based on invited papers presented by prominent researchers in the field at a Symposium on "Thin Films: Preparation, Characterization, Applications" at the 221st National Meeting of the American Chemical Society held in San Diego, California. The coverage of the symposium was extensive; topics ranged from highly-ordered metal adlayers on well-defined electrode surfaces to bio-organic films on non-metallic nanoparticles. An objective of this book is for the readers to be able to draw from the experience and results of others in order to improve and expand the understanding of the science and technology of their own thin films systems.

This thoroughly updated new edition includes an entirely new team of contributing authors with backgrounds specializing in the various new applications of sputtering technology. It forms a bridge between fundamental theory and practical application, giving an insight into innovative new materials, devices and systems. Organized into three parts for ease of use, this Handbook introduces the fundamentals of thin films and sputtering deposition, explores the theory and practices of this field, and also covers new technology such as nano-functional materials and MEMS. Wide varieties of functional thin film materials and processing are described, and experimental data is provided with detailed examples and theoretical descriptions. A strong applications focus, covering current and emerging technologies, including nano-materials and MEMS (microelectrolmechanical systems) for energy, environments, communications, and/or bio-medical field. New chapters on computer simulation of sputtering and MEMS completes the update and insures that the new edition includes the most current and forward-looking coverage available All applications discussed are supported by theoretical discussions, offering readers both the "how" and the "why" of each technique 40% revision: the new edition includes an entirely new team of contributing authors with backgrounds specializing in the various new applications that are covered in the book and providing the most up-to-date coverage available anywhere

"Preparation of Thin Films provides a comprehensive account of various deposition techniques for the preparation of thin films of elements, compounds, alloys, ceramics, and semiconductors - emphasizing inorganic compound thin films and discussing high vacuum and chemical deposition methods used for preparing high temperature superconducting oxide thin films. "