This comprehensive introduction to polarized light provides students and researchers with the background and the specialized knowledge needed to fully utilize polarized light. It provides a basic introduction to the interaction of light with matter for those unfamiliar with photochemistry and photophysics. An in-depth discussion of polarizing optics is also given. Different analytical techniques are introduced and compared and introductions to the use of polarized light in various forms of spectroscopy are provided. Starts at a basic level and develops tools for research problems Discusses practical devices for controlling polarized light Compares the Jones, Mueller, and Poincaré sphere methods of analysis

Polarized Light and Optical Measurement is a five-chapter book that begins with a self-consistent conceptual picture of the phenomenon of polarization. Chapter 2 describes a number of interactions of light and matter used in devising optical elements in polarization studies. Specific optical elements are given in Chapter 3. The last two chapters explore the measurement of the state of polarization and the various roles played in optical instrumentation by polarization and polarization-sensitive elements. This book will provide useful information in this field of interest for research workers, postgraduate students, as well as undergraduate students.

New material on computerized optical processes, computerized ray tracing, and the fast Fourier transform, Bibre-Bragg sensors, and temporal phase unwrapping. * New introductory sections to all chapters. * Detailed discussion on lasers and laser principles, including an introduction to radiometry and photometry. * Thorough coverage of the CCD camera.

A one-stop, concise guide on determining and measuring thin film thickness by optical methods. This practical book covers the laws of electromagnetic radiation and interaction of light with matter, as well as the theory and practice of thickness measurement, and modern applications. In so doing, it shows the capabilities and opportunities of optical thickness determination and discusses the strengths and weaknesses of measurement devices along with their evaluation methods. Following an introduction to the topic, Chapter 2 presents the basics of the propagation of light and other electromagnetic radiation in space and matter. The main topic of this book, the determination of the thickness of a layer in a layer stack by measuring the spectral reflectance or transmittance, is treated in the following three chapters. The color of thin layers is discussed in chapter 6. Finally, in chapter 7, the author discusses several industrial applications of the layer thickness measurement, including high-reflection and anti-reflection coatings, photolithographic structuring of semiconductors, silicon on insulator, transparent conductive films, oxides and polymers, thin film photovoltaics, and heavily doped silicon. Aimed at industrial and academic researchers, engineers, developers and manufacturers involved in all areas of optical layer and thin optical film measurement and metrology, process control, real-time monitoring, and applications.

The revised 2nd edition of this practical book provides an expanded treatment and comparison of techniques used in advanced optical measurements, guiding its reader from fundamental radiometric and photometric concepts to the state-of-the-art in highly sensitive measurements of optical losses and in spectroscopic detection using coherent laser light and spontaneous radiation. The book describes and compares a broad array of high-sensitivity methods and techniques – from interferometric and/or calorimetric, acousto-optic and resonator or polarization to wavelength- and frequency-modulation, phase-shift and decay time studies, and direct-loss measurements for free-space, fiber- or waveguide-based systems and devices. Updated throughout, the new edition describes novel trends in spectral interferometry, frequency-comb and laser-excitation spectroscopy, reflected in the developments of Raman, Brillouin and FTIR (Fourier Transform Infra-Red) techniques for biomedical research, biotech sensing and detection. It also covers broad practical implementations of time- and frequency-domain terahertz spectroscopy measurements. This book reviews the physical concepts of radiation transfer, providing a quantitative foundation for the means of measurements of optical losses, which affect propagation and distribution of light waves in various media and in diverse optical systems and components. It focuses on the application of optical methods and procedures for the evaluation of transparent, reflecting, scattering, absorbing, and aggregated objects, and for determining the power and energy parameters of radiation and color properties of light. This updated new edition will serve as an up-to-date reference source and practical guide for those using photometric and radiometric techniques.

Optical Metrology is a rapidly expanding field i'n both its scientific foundations and technological developments, being of major concern to measurements, quality control, non-destructive tes ting and in fundamental research. In order to define the state-of-the-art, and to evaluate pre sent accomplishments, whilst giving an appraisal of how each of the particular topics will evolve the Optical Metrology-anAdvancedStudy Institute was organized with a concourse of the world's acknowledged experts. Thus, the Institute provided a forum for tutorial reviews blended with topics of current research in the form of a progressive and comprehensive presentation of recent promising developments, lea ding techniques and instrumentation in incoherent and coherent optics for Metrology, Sensing and Control in Science, Industry and Biomedici ne. Optical Metrology is a very broad field which is highly inter disciplinary in its applications, and in its scientific and technolo gical background. It is related to such diverse disciplines as physi cal and chemical sciences, engineering, electronics, computer scien ces, biological sciences and theoretical sciences, such as statistics. Although there was an emphasis on photomechanics and industri al applications, a marked diversity was reflected in the different background and interests of the participants. The vitality and viabi lity of the discipline was enhanced not only by the encouraging number of young scientists and industrialists participating and authoring, but also by the remarkably promising prospects found in x the practical applications supported by advanced electronic hybridi zation.