As the requirements of the semiconductor industry have become more demanding in terms of resolution and speed it has been necessary to push photoresist materials far beyond the capabilities previously envisioned. Currently there is significant worldwide research effort in to so called Next Generation Lithography techniques such as EUV lithography and multibeam electron beam lithography. These developments in both the industrial and the academic lithography arenas have led to the proliferation of numerous novel approaches to resist chemistry and ingenious extensions of traditional photopolymers. Currently most texts in this area focus on either lithography with perhaps one or two chapters on resists, or on traditional resist materials with relatively little consideration of new approaches. This book therefore aims to bring together the worlds foremost resist development scientists from the various community to produce in one place a definitive description of the many approaches to lithography fabrication. - Assembles up-to-date information from the world's premier resist chemists and technique development lithographers on the properties and capabilities of the wide range of resist materials currently under investigation - Includes information on processing and metrology techniques - Brings together multiple approaches to litho pattern recording from academia and industry in one place

Integrated circuits, and devices fabricated using the techniques developed for integrated circuits, have steadily gotten smaller, more complex, and more powerful. The rate of shrinking is astonishing – some components are now just a few dozen atoms wide. This book attempts to answer the questions, "What comes next? and "How do we get there?Nanolithography outlines the present state of the art in lithographic techniques, including optical projection in both deep and extreme ultraviolet, electron and ion beams, and imprinting. Special attention is paid to related issues, such as the resists used in lithography, the masks (or lack thereof), the metrology needed for nano-features, modeling, and the limitations caused by feature edge roughness. In addition emerging technologies are described, including the directed assembly of wafer features, nanostructures and devices, nano-photonics, and nano-fluidics.This book is intended as a guide to the researcher new to this field, reading related journals or facing the complexities of a technical conference. Its goal is to give enough background information to enable such a researcher to understand, and appreciate, new developments in nanolithography, and to go on to make advances of his/her own. - Outlines the current state of the art in alternative nanolithography technologies in order to cope with the future reduction in size of semiconductor chips to nanoscale dimensions - Covers lithographic techniques, including optical projection, extreme ultraviolet (EUV), nanoimprint, electron beam and ion beam lithography - Describes the emerging applications of nanolithography in nanoelectronics, nanophotonics and microfluidics

The progress in polymer science is revealed in the chapters of Polymer Science: A Comprehensive Reference, Ten Volume Set. In Volume 1, this is reflected in the improved understanding of the properties of polymers in solution, in bulk and in confined situations such as in thin films. Volume 2 addresses new characterization techniques, such as high resolution optical microscopy, scanning probe microscopy and other procedures for surface and interface characterization. Volume 3 presents the great progress achieved in precise synthetic polymerization techniques for vinyl monomers to control macromolecular architecture: the development of metallocene and post-metallocene catalysis for olefin polymerization, new ionic polymerization procedures, and atom transfer radical polymerization, nitroxide mediated polymerization, and reversible addition-fragmentation chain transfer systems as the most often used controlled/living radical polymerization methods. Volume 4 is devoted to kinetics, mechanisms and applications of ring opening polymerization of heterocyclic monomers and cycloolefins (ROMP), as well as to various less common polymerization techniques. Polycondensation and non-chain polymerizations, including dendrimer synthesis and various "click" procedures, are covered in Volume 5. Volume 6 focuses on several aspects of controlled macromolecular architectures and soft nano-objects including hybrids and bioconjugates. Many of the achievements would have not been possible without new characterization techniques like AFM that allowed direct imaging of single molecules and nano-objects with a precision available only recently. An entirely new aspect in polymer science is based on the combination of bottom-up methods such as polymer synthesis and molecularly programmed self-assembly with top-down structuring such as lithography and surface templating, as presented in Volume 7. It encompasses polymer and nanoparticle assembly in bulk and under confined conditions or influenced by an external field, including thin films, inorganic-organic hybrids, or nanofibers. Volume 8 expands these concepts focusing on applications in advanced technologies, e.g. in electronic industry and centers on combination with top down approach and functional properties like conductivity. Another type of functionality that is of rapidly increasing importance in polymer science is introduced in volume 9. It deals with various aspects of polymers in biology and medicine, including the response of living cells and tissue to the contact with biofunctional particles and surfaces. The last volume is devoted to the scope and potential provided by environmentally benign and green polymers, as well as energy-related polymers. They discuss new technologies needed for a sustainable economy in our world of limited resources. Provides broad and in-depth coverage of all aspects of polymer science from synthesis/polymerization, properties, and characterization methods and techniques to nanostructures, sustainability and energy, and biomedical uses of polymers Provides a definitive source for those entering or researching in this area by integrating the multidisciplinary aspects of the science into one unique, up-to-date reference work Electronic version has complete cross-referencing and multi-media components Volume editors are world experts in their field (including a Nobel Prize winner)

Conjugated Polymers for Next-Generation Applications, Volume One: Synthesis, Properties and Optoelectrochemical Devices describes the synthesis and characterization of varied conjugated polymeric materials and their key applications, including active electrode materials for electrochemical capacitors and lithium-ion batteries, along with new ideas of functional materials for next-generation high-energy batteries, a discussion of common design procedures, and the pros and cons of conjugated polymers for certain applications. The book's emphasis lies in the underlying electronic properties of conjugated polymers, their characterization and analysis, and the evaluation of their effectiveness for utilization in energy and electronics applications. This book is ideal for researchers and practitioners in the area of materials science, chemistry and chemical engineering. - Provides an overview of the synthesis and functionalization of conjugated polymers and their composites - Reviews important photovoltaics applications of conjugated polymeric materials, including their use in energy storage, batteries and optoelectronic devices - Discusses conjugated polymers and their application in electronics for sensing, bioelectronics, memory, and more

Since UV curing (light induced polymerisation of multifunctional oligomers) is a very ecoefficient and energy saving curing method, the growth rates of UV curable coatings are in the range of 10% per year. The typical UV coatings are solvent free (100% solids), thus helping the industry and the environment to reduce significantly VOC (volatile organic compounds). Recently, the automotive industry has discovered that UV cured coatings are very scratch resistant, which stimulated very extensive work into the development of UV coatings for automotive applications. Since UV curing is very universal, also other systems besides the 100% solid (typical) UV coatings are developed, like waterbased UV- , UV powder and Dual cure (UV and thermal) systems.UV Coatings contains an overview of the technology, the curing process including the equipment necessary, the raw materials (resins, diluents, photoinitiators) used, the advantages and drawbacks of this fast emerging technology, as well as proposed technical solutions to tackle the disadvantages. Structure-property relationships will be given, especially regarding the mechanical properties of coatings as well as scratch resistance, mainly dealing with automotive performance criteria. The main part of the book will deal with new developments, like water-based UV coatings, UV powder coatings and dual cure systems, cured by UV and thermal energy, which have been developed to cure the coating on three dimensional substrates in shadow areas. The main applications of UV Coatings will be described, starting with the classical ones on temperature sensitive substrates, like wood, paper and plastics, where the UV curable coatings are already well established.* Looking at UV curing as a key to scratch resistant automotive clear coats* Ecoefficiency of UV Coatings* Comprehensive overview of the technology, materials and markets

Advanced lithography grows up to several fields such as nano-lithography, micro electro-mechanical system (MEMS) and nano-phonics, etc. Nano-lithography reaches to 20 nm size in advanced electron device. Consequently, we have to study and develop true single nanometer size lithography. One of the solutions is to study a fusion of top down and bottom up technologies such as EB drawing and self-assembly with block copolymer. In MEMS and nano-photonics, 3 dimensional structures are needed to achieve some functions in the devices for the applications. Their formation are done by several methods such as colloid lithography, stereo-lithography, dry etching, sputtering, deposition, etc. This book covers a wide area regarding nano-lithography, nano structure and 3-dimensional structure, and introduces readers to the methods, methodology and its applications.