This book explores chemical methods for thin film deposition with diverse nanostructured morphology and their applications. Unlike top-down techniques, chemical methods offer low cost, simplicity, and growth of nanostructured surface architecture with ease of small to large-scale area deposition. The book primarily focuses on innovative twelve chemical methods for thin-film deposition on one platform. Since each method has its own advantages and disadvantages, it is crucial to select the specific method for specific material to be deposited depending upon what type of application is targeted. Due to inclusive of diverse chemical deposition methods, researcher will have knowledge about best choice of the deposition method to be adopted. Inclusive methods discussed in the book are chemical bath deposition, successive ionic layer adsorption and reaction, ion exchange, electroless deposition, electrodeposition, hydrothermal, spray pyrolysis, spin coating, dip coating, doctor blade, screen printing, and sol-gel. The selection of the correct procedure for material to be deposited in thin film form depends on its unique process parameters based on the kind of application and its requirement. The role of preparative factors necessary for thin film alters properties related to structure and surface morphology, electrical conductivity and optical band gap which have been extensively discussed along with the underlying science of film synthesis. The book provides a comprehensive overview of the field of chemical methods for thin film synthesis to applications. In addition to synthesis, the book covers characterization, instrumentation, and industrial application of thin films. As a result, concentrated techniques will be of great interest to university/college professors, students and new engineers as well as postdocs and scientists in the area.

This is the first text to cover all aspects of solution processed functional oxide thin-films. Chemical Solution Deposition (CSD) comprises all solution based thin- film deposition techniques, which involve chemical reactions of precursors during the formation of the oxide films, i. e. sol-gel type routes, metallo-organic decomposition routes, hybrid routes, etc. While the development of sol-gel type processes for optical coatings on glass by silicon dioxide and titanium dioxide dates from the mid-20th century, the first CSD derived electronic oxide thin films, such as lead zirconate titanate, were prepared in the 1980’s. Since then CSD has emerged as a highly flexible and cost-effective technique for the fabrication of a very wide variety of functional oxide thin films. Application areas include, for example, integrated dielectric capacitors, ferroelectric random access memories, pyroelectric infrared detectors, piezoelectric micro-electromechanical systems, antireflective coatings, optical filters, conducting-, transparent conducting-, and superconducting layers, luminescent coatings, gas sensors, thin film solid-oxide fuel cells, and photoelectrocatalytic solar cells. In the appendix detailed “cooking recipes” for selected material systems are offered.

Chemical Solution Synthesis for Materials Design and Thin Film Device Applications presents current research on wet chemical techniques for thin-film based devices. Sections cover the quality of thin films, types of common films used in devices, various thermodynamic properties, thin film patterning, device configuration and applications. As a whole, these topics create a roadmap for developing new materials and incorporating the results in device fabrication. This book is suitable for graduate, undergraduate, doctoral students, and researchers looking for quick guidance on material synthesis and device fabrication through wet chemical routes. Provides the different wet chemical routes for materials synthesis, along with the most relevant thin film structured materials for device applications Discusses patterning and solution processing of inorganic thin films, along with solvent-based processing techniques Includes an overview of key processes and methods in thin film synthesis, processing and device fabrication, such as nucleation, lithography and solution processing

Development of the thin film and coating technologies (TFCT) made possible the technological revolution in electronics and through it the revolution in IT and communications in the end of the twentieth century. Now, TFCT penetrated in many sectors of human life and industry: biology and medicine; nuclear, fusion, and hydrogen energy; protection against corrosion and hydrogen embrittlement; jet engine; space materials science; and many others. Currently, TFCT along with nanotechnologies is the most promising for the development of almost all industries. The 20 chapters of this book present the achievements of thin-film technology in many areas mentioned above but more than any other in medicine and biology and energy saving and energy efficiency.

The goal of producing devices that are smaller, faster, more functional, reproducible, reliable and economical has given thin film processing a unique role in technology.Principles of Vapor Deposition of Thin Films brings in to one place a diverse amount of scientific background that is considered essential to become knowledgeable in thin film depostition techniques. Its ultimate goal as a reference is to provide the foundation upon which thin film science and technological innovation are possible.* Offers detailed derivation of important formulae.* Thoroughly covers the basic principles of materials science that are important to any thin film preparation.* Careful attention to terminologies, concepts and definitions, as well as abundance of illustrations offer clear support for the text.

This 3e, edited by Peter M. Martin, PNNL 2005 Inventor of the Year, is an extensive update of the many improvements in deposition technologies, mechanisms, and applications. This long-awaited revision includes updated and new chapters on atomic layer deposition, cathodic arc deposition, sculpted thin films, polymer thin films and emerging technologies. Extensive material was added throughout the book, especially in the areas concerned with plasma-assisted vapor deposition processes and metallurgical coating applications.

This book covers the experimental and theoretical understanding of surface and thin film processes. It presents a unique description of surface processes in adsorption and crystal growth, including bonding in metals and semiconductors. Emphasis is placed on the strong link between science and technology in the description of, and research for, new devices based on thin film and surface science. Practical experimental design, sample preparation and analytical techniques are covered, including detailed discussions of Auger electron spectroscopy and microscopy. Thermodynamic and kinetic models of structure are emphasised throughout. The book provides extensive leads into practical and research literature, as well as resources on the World Wide Web (see http://venables.asu.edu/book). Each chapter contains problems which aim to develop awareness of the subject and the methods used. Aimed as a graduate textbook, this book will also be useful as a sourcebook for graduate students, researchers and practitioners in physics, chemistry, materials science and engineering.