Silicon-germanium-carbon Alloys by Ultra High Vacuum Chemical Vapor Deposition

Silicon-germanium-carbon Alloys by Ultra High Vacuum Chemical Vapor Deposition
Title Silicon-germanium-carbon Alloys by Ultra High Vacuum Chemical Vapor Deposition PDF eBook
Author Anda C. Mocuta
Publisher
Pages 0
Release 1999
Genre Carnegie Mellon University
ISBN

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The Production of Epitaxial Strained Silicon on Silicon Germanium Via Ultra High Vacuum Chemical Vapor Deposition

The Production of Epitaxial Strained Silicon on Silicon Germanium Via Ultra High Vacuum Chemical Vapor Deposition
Title The Production of Epitaxial Strained Silicon on Silicon Germanium Via Ultra High Vacuum Chemical Vapor Deposition PDF eBook
Author Jerry Keybl
Publisher
Pages 74
Release 2005
Genre
ISBN

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Silicon-Germanium Carbon Alloys

Silicon-Germanium Carbon Alloys
Title Silicon-Germanium Carbon Alloys PDF eBook
Author S. Pantellides
Publisher CRC Press
Pages 552
Release 2002-07-26
Genre Technology & Engineering
ISBN 9781560329633

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Carbon (C) and Silicon Germanium (SiGe) work like a magic sauce. At least in small concentrations, they make everything taste better. It is remarkable enough that SiGe, a new material, and the heterobipolar transistor, a new device, appear on the brink of impacting the exploding wireless market. The addition of C to SiGe, albeit in small concentrations, looks to have breakthrough potential. Here, at last, is proof that materials science can put a rocket booster on the silicon-mind, the silicon transistor. Scientific excitement arises, as always, from the new possibilities a multicomponent materials system offers. Bandgaps can be changed, strains can be tuned, and properties can be tailored. This is catnip to the materials scientist. The wide array of techniques applied here to the SiGeC system bear testimony to the ingenious approaches now available for mastering the complexities of new materials

Surface characteristics of etched and non-etched silicon germanium (SiGe)/Si graded structure with varying Ge concentration grown by ultra-high vacuum (UHV)/chemical vapor deposition (CVD) for optoelectronic and power conversion applications

Surface characteristics of etched and non-etched silicon germanium (SiGe)/Si graded structure with varying Ge concentration grown by ultra-high vacuum (UHV)/chemical vapor deposition (CVD) for optoelectronic and power conversion applications
Title Surface characteristics of etched and non-etched silicon germanium (SiGe)/Si graded structure with varying Ge concentration grown by ultra-high vacuum (UHV)/chemical vapor deposition (CVD) for optoelectronic and power conversion applications PDF eBook
Author Fred Semendy
Publisher
Pages 16
Release 2012
Genre Chemical vapor deposition
ISBN

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Silicon, Germanium, and Their Alloys

Silicon, Germanium, and Their Alloys
Title Silicon, Germanium, and Their Alloys PDF eBook
Author Gudrun Kissinger
Publisher CRC Press
Pages 424
Release 2014-12-09
Genre Science
ISBN 1466586656

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Despite the vast knowledge accumulated on silicon, germanium, and their alloys, these materials still demand research, eminently in view of the improvement of knowledge on silicon-germanium alloys and the potentialities of silicon as a substrate for high-efficiency solar cells and for compound semiconductors and the ongoing development of nanodevic

Growth and analysis of silicon-germanium-carbon nanostructures using scanning tunneling microscope direct writing and ultra-high vacuum chemical vapor deposition

Growth and analysis of silicon-germanium-carbon nanostructures using scanning tunneling microscope direct writing and ultra-high vacuum chemical vapor deposition
Title Growth and analysis of silicon-germanium-carbon nanostructures using scanning tunneling microscope direct writing and ultra-high vacuum chemical vapor deposition PDF eBook
Author Dean Aref Samara
Publisher
Pages 410
Release 1997
Genre Silicon
ISBN

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SiGe and Ge

SiGe and Ge
Title SiGe and Ge PDF eBook
Author David Louis Harame
Publisher The Electrochemical Society
Pages 1280
Release 2006
Genre Electronic apparatus and appliances
ISBN 1566775078

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The second International SiGe & Ge: Materials, Processing, and Devices Symposium was part of the 2006 ECS conference held in Cancun, Mexico from October 29-Nov 3, 2006. This meeting provided a forum for reviewing and discussing all materials and device related aspects of SiGe & Ge. The hardcover edition includes a bonus CD-ROM containing the PDF of the entire issue.