Contains papers from a December 1997 symposium on semiconductor radiation detectors for use in the energy range of a few eV to about 5 MeV. Primary emphasis is on developing semiconductor X-ray and gamma- ray detectors and imagers which combine the advantages of room- temperature operation with the excellent energy resolution of cryogenically cooled spectrometers. Papers are arranged in sections on cadmium zinc telluride growth, material properties, detectors, and systems; mercury and lead iodide materials, detectors, and systems; Group IV and III-V materials, detectors, and systems; ZnSe and ZnS materials and detectors; analysis and characteristics of detectors, systems, and applications; and IR materials and detectors. Annotation copyrighted by Book News, Inc., Portland, OR

Since its inception in 1966, the series of numbered volumes known as Semiconductors and Semimetals has distinguished itself through the careful selection of well-known authors, editors, and contributors. The"Willardson and Beer"Series, as it is widely known, has succeeded in publishing numerous landmark volumes and chapters. Not only did many of these volumes make an impact at the time of their publication, but they continue to be well-cited years after their original release. Recently, Professor Eicke R. Weber of the University of California at Berkeley joined as a co-editor of the series. Professor Weber, a well-known expert in the field of semiconductor materials, will further contribute to continuing the series' tradition of publishing timely, highly relevant, and long-impacting volumes. Some of the recent volumes, such as Hydrogen in Semiconductors, Imperfections in III/V Materials, Epitaxial Microstructures, High-Speed Heterostructure Devices, Oxygen in Silicon, and others promise indeed that this tradition will be maintained and even expanded. Reflecting the truly interdisciplinary nature of the field that the series covers, the volumes in Semiconductors and Semimetals have been and will continue to be of great interest to physicists, chemists, materials scientists, and device engineersin modern industry. One of the first comprehensive works on room-temperature nuclear detectors Edited by technical experts in the field Written by recognized authorities from industrial and academic institutions Focused on the electrical, optical, and structural properties of semiconductors used for room-temperature nuclear detectors

The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.

The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.

Sinc the dissolution of the Soviet Union the nuclear threats facing the world are complex and constantly evolving.This volume is structured to promote wide-ranging, multi-national exploration of critical technology needs and underlying scientific challenges to reducing the threat of nuclear/radiological terrorism; to illustrate through country-specific presentations how resulting technologies were used in national programs; and to outline the role of legal, policy and institutional frameworks in countering nuclear/radiological terrorism.

Volume IIIA Basic Techniques Handbook of Crystal Growth, Second Edition Volume IIIA (Basic Techniques), edited by chemical and biological engineering expert Thomas F. Kuech, presents the underpinning science and technology associated with epitaxial growth as well as highlighting many of the chief and burgeoning areas for epitaxial growth. Volume IIIA focuses on major growth techniques which are used both in the scientific investigation of crystal growth processes and commercial development of advanced epitaxial structures. Techniques based on vacuum deposition, vapor phase epitaxy, and liquid and solid phase epitaxy are presented along with new techniques for the development of three-dimensional nano-and micro-structures. Volume IIIB Materials, Processes, and Technology Handbook of Crystal Growth, Second Edition Volume IIIB (Materials, Processes, and Technology), edited by chemical and biological engineering expert Thomas F. Kuech, describes both specific techniques for epitaxial growth as well as an array of materials-specific growth processes. The volume begins by presenting variations on epitaxial growth process where the kinetic processes are used to develop new types of materials at low temperatures. Optical and physical characterizations of epitaxial films are discussed for both in situ and exit to characterization of epitaxial materials. The remainder of the volume presents both the epitaxial growth processes associated with key technology materials as well as unique structures such as monolayer and two dimensional materials. Volume IIIA Basic Techniques Provides an introduction to the chief epitaxial growth processes and the underpinning scientific concepts used to understand and develop new processes. Presents new techniques and technologies for the development of three-dimensional structures such as quantum dots, nano-wires, rods and patterned growth Introduces and utilizes basic concepts of thermodynamics, transport, and a wide cross-section of kinetic processes which form the atomic level text of growth process Volume IIIB Materials, Processes, and Technology Describes atomic level epitaxial deposition and other low temperature growth techniques Presents both the development of thermal and lattice mismatched streams as the techniques used to characterize the structural properties of these materials Presents in-depth discussion of the epitaxial growth techniques associated with silicone silicone-based materials, compound semiconductors, semiconducting nitrides, and refractory materials

Reports recent developments in a field that is coalescing but still lacks the coherence or certainty of a mature discipline in terms of accepted methodologies. The 39 papers discuss the resonance method as an attractive way to evaluate mechanical properties of thin gold films, heating effects on the Young's modulus of films sputtered onto micromachined resonators, test methods for characterizing piezoelectric thin films, polysilicon tensile testing with electrostatic gripping, silicon-based epitaxial films, and other aspects. Annotation copyrighted by Book News, Inc., Portland, OR