This book takes a holistic approach to reliability engineering for electrical and electronic systems by looking at the failure mechanisms, testing methods, failure analysis, characterisation techniques and prediction models that can be used to increase reliability for a range of devices. The text describes the reliability behavior of electrical and electronic systems. It takes an empirical scientific approach to reliability engineering to facilitate a greater understanding of operating conditions, failure mechanisms and the need for testing for a more realistic characterisation. After introducing the fundamentals and background to reliability theory, the text moves on to describe the methods of reliability analysis and charactersation across a wide range of applications. Takes a holistic approach to reliability engineering Looks at the failure mechanisms, testing methods, failure analysis, characterisation techniques and prediction models that can be used to increase reliability Facilitates a greater understanding of operating conditions, failure mechanisms and the need for testing for a more realistic characterisation

The book charts how reliability engineering has moved from the use of sometimes arbitrary standards to an empirical scientific approach of understanding operating conditions, failure mechanisms, the need for testing for a more realistic characterisation and, new for the second edition, includes the monitoring of performance/robustness in the field. Reliability Characterisation of Electrical and Electronic Systems brings together a number of experts and key players in the discipline to concisely present the fundamentals and background to reliability theory, elaborate on the current thinking and developments behind reliability characterisation, and give a detailed account of emerging issues across a wide range of applications. The second edition has a new section titled Reliability Condition Monitoring and Prognostics for Specific Application which provides a guide to critical issues in key industrial sectors such as automotive and aerospace. There are also new chapters on areas of growing importance such as reliability methods in high-temperature electronics and reliability and testing of electric aircraft power systems. Reviews emerging areas of importance such as reliability methods in high-temperature electronics and reliability testing of electric vehicles Looks at the failure mechanisms, testing methods, failure analysis, characterisation techniques and prediction models that can be used to increase reliability Facilitates a greater understanding of operating conditions, failure mechanisms and the need for testing

Atomic thin two-dimensional (2D) materials are the thinnest forms of materials to ever occur in nature and have the potential to dramatically alter and revolutionize our material world. Some of the unique properties of these materials including wide photoresponse wavelength, passivated surfaces, strong interaction with incident light, and high mobility have created tremendous interest in photodetector application. This book provides a comprehensive state-of-the-art knowledge about photodetector technology in the range visible to infrared region using various 2D materials including graphene, transition metal dichalcogenides, III-V semiconductor, and so on. It consists of 10 chapters contributed by a team of experts in this exciting field. We believe that this book will provide new opportunities and guidance for the development of next-generation 2D photodetector.

Advances in Chemical Mechanical Planarization (CMP) provides the latest information on a mainstream process that is critical for high-volume, high-yield semiconductor manufacturing, and even more so as device dimensions continue to shrink. The technology has grown to encompass the removal and planarization of multiple metal and dielectric materials and layers both at the device and the metallization levels, using different tools and parameters, requiring improvements in the control of topography and defects. This important book offers a systematic review of fundamentals and advances in the area. Part One covers CMP of dielectric and metal films, with chapters focusing on the use of particular techniques and processes, and on CMP of particular various materials, including ultra low-k materials and high-mobility channel materials, and ending with a chapter reviewing the environmental impacts of CMP processes. Part Two addresses consumables and process control for improved CMP, and includes chapters on the preparation and characterization of slurry, diamond disc pad conditioning, the use of FTIR spectroscopy for characterization of surface processes, and approaches for defection characterization, mitigation, and reduction. - Considers techniques and processes for CMP of dielectric and metal films - Includes chapters devoted to CMP for particular materials - Addresses consumables and process control for improved CMP

Fundamentals and Applications of Nanophotonics includes a comprehensive discussion of the field of nanophotonics, including key enabling technologies that have the potential to drive economic growth and impact numerous application domains such as ICT, the environment, healthcare, military, transport, manufacturing, and energy. This book gives readers the theoretical underpinnings needed to understand the latest advances in the field. After an introduction to the area, chapters two and three cover the essential topics of electrodynamics, quantum mechanics, and computation as they relate to nanophotonics. Subsequent chapters explore materials for nanophotonics, including nanoparticles, photonic crystals, nanosilicon, nanocarbon, III-V, and II-VI semiconductors. In addition, fabrication and characterization techniques are addressed, along with the importance of plasmonics, and the applications of nanophotonics in devices such as lasers, LEDs, and photodetectors. - Covers electrodynamics, quantum mechanics and computation as these relate to nanophotonics - Reviews materials, fabrication and characterization techniques for nanophotonics - Describes applications of the technology such as lasers, LEDs and photodetectors

Combining the positive characteristics of microfluidics and optics, microstructured optical fibres (MOFs) have revolutionized the field of optoelectronics. Tailored guiding, diffractive structures and photonic band-gap effects are used to produce fibres with highly specialised, complex structures, facilitating the development of novel kinds of optical fibre sensors and actuators.Part One outlines the key materials and fabrication techniques used for microstructured optical fibres. Microfluidics and heat flows, MOF-based metamaterials, novel and liquid crystal infiltrated photonic crystal fibre (PCF) designs, MOFs filled with carbon nanotubes and melting of functional inorganic glasses inside PCFs are all reviewed. Part Two then goes on to investigate sensing and optofluidic applications, with the use of MOFs in structural sensing, sensing units and mechanical sensing explored in detail. PCF's for switching applications are then discussed before the book concludes by reviewing MOFs for specific nucleic acid detection and resonant bio- and chemical sensing. - Provides users with the necessary knowledge to successfully design and implement microstructured optical fibres for a broad range of uses - Outlines techniques for developing both traditional and novel types of optical fibre - Highlights the adaptability of microstructured optical fibres achieved via the use of optofluidics, sensors and actuators, by presenting a diverse selection of applications

The atomic arrangement and subsequent properties of a material are determined by the type and conditions of growth leading to epitaxy, making control of these conditions key to the fabrication of higher quality materials. Epitaxial Growth of Complex Metal Oxides reviews the techniques involved in such processes and highlights recent developments in fabrication quality which are facilitating advances in applications for electronic, magnetic and optical purposes. Part One reviews the key techniques involved in the epitaxial growth of complex metal oxides, including growth studies using reflection high-energy electron diffraction, pulsed laser deposition, hybrid molecular beam epitaxy, sputtering processes and chemical solution deposition techniques for the growth of oxide thin films. Part Two goes on to explore the effects of strain and stoichiometry on crystal structure and related properties, in thin film oxides. Finally, the book concludes by discussing selected examples of important applications of complex metal oxide thin films in Part Three. - Provides valuable information on the improvements in epitaxial growth processes that have resulted in higher quality films of complex metal oxides and further advances in applications for electronic and optical purposes - Examines the techniques used in epitaxial thin film growth - Describes the epitaxial growth and functional properties of complex metal oxides and explores the effects of strain and defects