Recognizing the need for improved control measures in the manufacturing process of highly sensitized semiconductor technology, this practical reference provides in-depth and advanced treatment on the origins, procedures, and disposal of a variety of contaminants. It uses contemporary examples based on the latest hardware and processing apparatus to illustrate previously unavailable results and insights along with experimental and theoretical developments. Ensures the proper methods necessary to meet the standards established in the 1997 National Technology Roadmap for Semiconductors (NTRS)! Summarizing up-to-date control practices in the industry, Contamination-Free Manufacturing for Semiconductors and Other Precision Products: Details the physics and chemistry behind the mechanisms leading to contamination-induced failures Considers particles and molecular contaminants, including the entire spectrum of mass-based contaminants Outlines primary contamination problems and target control levels Reveals and offers solutions to inadequate areas of measurement capability and control technology Clarifies significant problems and decisions facing the industry by analyzing NTRS standards and contamination mechanisms Containing over 700 literature references, drawings, photographs, equations, and tables, Contamination-Free Manufacturing for Semiconductors and Other Precision Products is an essential reference for electrical and electronics, instrumentation, process, manufacturing, development, contamination control and quality engineers; physicists; and upper-level undergraduate and graduate students in these disciplines.

An exploration of how advances in computing technology and research can be combined to extend the capabilities and economics of modern power plants. The contributors, from academia as well as practising engineers, illustrate how the various methodologies can be applied to power plant operation.

As the most comprehensive reference and study guide available for engineers preparing for the breadth-and-depth mechanical PE examination, the twelfth edition of the Mechanical Engineering Reference Manual provides a concentrated review of the exam topics. Thousands of important equations and methods are shown and explained throughout the Reference Manual, plus hundreds of examples with detailed solutions demonstrate how to use these equations to correctly solve problems on the mechanical PE exam. Dozens of key charts, tables, and graphs, including updated steam tables and two new charts of LMTD heat exchanger correction factors, make it possible to work most exam problems using the Reference Manual alone. A complete, easy-to-use index saves you valuable time during the exam as it helps you quickly locate important information needed to solve problems. _____________________________ Since 1975 more than 2 million people preparing for their engineering, surveying, architecture, LEED(R), interior design, and landscape architecture exams have entrusted their exam prep to PPI. For more information, visit us at www.ppi2pass.com.

Corrosion monitoring technologies are a vital step in efforts to combat corrosion, which can have major economic and safety implications. This important book provides a comprehensive analysis of the range of techniques for corrosion monitoring, including practical applications and case studies. It reviews electrochemical techniques for corrosion monitoring, such as polarization techniques, potentiometric methods, harmonic analysis, galvanic sensors and multielectrode systems. Case studies discuss the ways that corrosion monitoring can be applied to engine exhaust systems, cooling water systems, pipelines and equipment in chemical plants.