Rapid thermal and integrated processing is an emerging single-wafer technology in ULSI semiconductor manufacturing, electrical engineering, applied physics and materials science. Here, the physics and engineering of this technology are discussed at the graduate level. Three interrelated areas are covered. First, the thermophysics of photon-induced annealing of semiconductor and related materials, including fundamental pyrometry and emissivity issues, the modelling of reactor designs and processes, and their relation to temperature uniformity. Second, process integration, treating the advances in basic equipment design, scale-up, integrated cluster-tool equipment, including wafer cleaning and integrated processing. Third, the deposition and processing of thin epitaxial, dielectric and metal films, covering selective deposition and epitaxy, integrated processing of layer stacks, and new areas of potential application, such as the processing of III-V semiconductor structures and thin- film head processing for high-density magnetic data storage.

The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.

Control technology permeates every aspect of our lives. We rely on them to perform a wide variety of tasks without giving much thought to the origins of the technology or how it became such an important part of our lives. Control System Applications covers the uses of control systems, both in the common and in the uncommon areas of our lives. From the everyday to the unusual, it's all here. From process control to human-in-the-loop control, this book provides illustrations and examples of how these systems are applied. Each chapter contains an introduction to the application, a section defining terms and references, and a section on further readings that help you understand and use the techniques in your work environment. Highly readable and comprehensive, Control System Applications explores the uses of control systems. It illustrates the diversity of control systems and provides examples of how the theory can be applied to specific practical problems. It contains information about aspec ts of control that are not fully captured by the theory, such as techniques for protecting against controller failure and the role of cost and complexity in specifying controller designs.

This is the first definitive book on rapid thermal processing (RTP), an essential namufacturing technology for single-wafer processing in highly controlled environments. Written and edited by nine experts in the field, this book covers a range of topics for academics and engineers alike, moving from basic theory to advanced technology for wafer manufacturing. The book also provides new information on the suitability or RTP for thin film deposition, junction formation, silicides, epitaxy, and in situ processing. Complete discussions on equipment designs and comparisons between RTP and other processing approaches also make this book useful for supplemental information on silicon processing, VLSI processing, and integrated circuit engineering.