The Colección Patricia Phelps de Cisneros (CPPC) is the foremost collection of geometric abstract art from Latin America. From the 1930s through the 1970s distinct artistic movements emerged in cities of Montevideo, Buenos Aires, São Paulo, Rio de Janeiro and Caracas that explored innovative forms of expression reflecting the new optimism sweeping the continent. This volume explores the ways in which the artists of these cities heralded the promise of a bright, modern future by creating a commensurate visual language to capture this positive spirit.

This book commences with a general introduction outlining the basic concepts of radical polymerization. This is followed by a chapter on radical reactions that is intended to lay the theoretical ground-work for the succeeding chapters on initiation, propagation and termination.

This introduction to the recent exciting developments in the applications of model theory to algebraic geometry, illustrated by E. Hrushovski's model-theoretic proof of the geometric Mordell-Lang Conjecture starts from very basic background and works up to the detailed exposition of Hrushovski's proof, explaining the necessary tools and results from stability theory on the way. The first chapter is an informal introduction to model theory itself, making the book accessible (with a little effort) to readers with no previous knowledge of model theory. The authors have collaborated closely to achieve a coherent and self- contained presentation, whereby the completeness of exposition of the chapters varies according to the existence of other good references, but comments and examples are always provided to give the reader some intuitive understanding of the subject.

In recent years silicon-centered radicals have played an important role in organic synthesis, polymer chemistry and material sciences. The aim of this book is to offer for the first time a description of silyl radicals within an interdisciplinary context, connecting structural characteristics and chemical properties to their application in different areas of chemistry. The first time different aspects of silyl radicals have been brought together Excellent reference tool for experienced practitioners ofradical and/or silicon chemistry Presents various aspects of these intermediates in an original, comprehensive fashion This book is essential for anyone working in free radical and/orsilicon chemistry as well as for those who want to approach these fields for the first time.

Proceedings of the NATO Advanced Research Workshop, Louvain-la-Neuve, Belgium, January 20-24, 1986