A comprehensive description of the principles and applications of positron and positronium chemistry. Pedagogical and tutorial in nature, it should be useful for graduate students and researchers in positron annihilation spectroscopy. The contributors are scientists in the frontiers of research.

This book provides a comprehensive description of the principles and applications of positron and positronium chemistry. Pedagogical and tutorial in nature, it will be ideal for graduate students and researchers in the area of positron annihilation spectroscopy. The contributing authors are authoritative scientists prominent in the frontiers of research, actively pursuing positron annihilation research on chemical and applied systems.

For one and a half decades, the application of positron annihilation to condensed-matter physics concentrated on the study of the Fermi surfaces of metals and alloys. As other, often more powerful, techniques for performing this type of study were developed, it appeared that condensed-matter positron physics was going to be relegated to being a niche interest. However, the situation changed dramatically when it was found that measurements of positron annihilation in metals were sensitive to the structures of well-known defects. This discovery, and subsequent research made it a major tool in materials science.

The only critical discussion available on the chemistry of the two "strange" light particles, the positron and positronium, with much space devoted to the excess electron. Positron annihilation allows the investigation of many unusual phenomena in the reaction kinetics of the positron, positronium, and excess electron, and in radiation chemistry and physics, while also providing important information on defects in solids.

ICPA-12 Proceedings of the 12. Int. Conf. on Positron Annihilation, München, Germany, Aug. 6-12, 2000

Positron Annihilation - ICPA-10 presents new results and ideas of researchers who seek more profound understanding of the nature of positron annihilation. All these scientific and technological thoughts are included in these two-volume proceedings, which contain 7 review talks, 203 contributed papers (among them, 20 are invited), and 3 summary talks. The volume is complete with keyword and author indices.

The topic of thin films is an area of increasing importance in materials science, electrical engineering and applied solid state physics; with both research and industrial applications in microelectronics, computer manufacturing, and physical devices. Advanced, high-performance computers, high-definition TV, broadband imaging systems, flat-panel displays, robotic systems, and medical electronics and diagnostics are a few examples of the miniaturized device technologies that depend on the utilization of thin film materials. This book presents an in-depth overview of the novel developments made by the scientific leaders in the area of modern dielectric films for advanced microelectronic applications. It contains clear, concise explanations of material science of dielectric films and their problem for device operation, including high-k, low-k, medium-k dielectric films and also specific features and requirements for dielectric films used in the packaging technology. A broad range of related topics are covered, from physical principles to design, fabrication, characterization, and applications of novel dielectric films.