An understanding of the processes involved in the basic and applied physics and chemistry of the interaction of plasmas with materials is vital to the evolution of technologies such as those relevant to microelectronics, fusion and space. The subjects dealt with in the book include: the physics and chemistry of plasmas, plasma diagnostics, physical sputtering and chemical etching, plasma assisted deposition of thin films, ion and electron bombardment, and plasma processing of inorganic and polymeric materials. The book represents a concentration of a substantial amount of knowledge acquired in this area - knowledge which was hitherto widely scattered throughout the literature - and thus establishes a baseline reference work for both established and tyro research workers.

This book deals with the specific contact between the fourth state of matter, i.e. plasma, and the first state of matter, i.e. a solid wall, in controlled fusion experiments. A comprehensive analysis of the main processes of plasma-surface interaction is given together with an assessment of the most critical questions within the context of general criteria and operation limits. It also contains a survey on other important aspects in nuclear fusion.

This book is a primer on the interplay between plasma and materials in a fusion reactor, so-called plasma–materials interactions (PMIs), highlighting materials and their influence on plasma through PMI. It aims to demonstrate that a plasma-facing surface (PFS) responds actively to fusion plasma and that the clarifying nature of PFS is indispensable to understanding the influence of PFS on plasma. It describes the modern insight into PMI, namely, relevant feedback to plasma performance from plasma-facing material (PFM) on changes in a material surface by plasma power load by radiation and particles, contrary to a conventional view that unilateral influence from plasma on PFM is dominant in PMI. There are many books and reviews on PMI in the context of plasma physics, that is, how plasma or plasma confinement works in PMI. By contrast, this book features a materials aspect in PMI focusing on changes caused by heat and particle load from plasma: how PFMs are changed by plasma exposure and then, accordingly, how the changed PFM interacts with plasma.

The current status of the science and technology related to coatings, thin films and surface modifications produced by directed energy techniques is assessed in Materials Surface Processing by Directed Energy Techniques. The subject matter is divided into 20 chapters - each presented at a tutorial level – rich with fundamental science and experimental results. New trends and new results are also evoked to give an overview of future developments and applications. - Provides a broad overview on modern coating and thin film deposition techniques, and their applications - Presents and discusses various problems of physics and chemistry involved in the production, characterization and applications of coatings and thin films - Each chapter includes experimental results illustrating various models, mechanisms or theories

Pattern transfer by dry etching and plasma-enhanced chemical vapor de position are two of the cornerstone techniques for modern integrated cir cuit fabrication. The success of these methods has also sparked interest in their application to other techniques, such as surface-micromachined sen sors, read/write heads for data storage and magnetic random access memory (MRAM). The extremely complex chemistry and physics of plasmas and their interactions with the exposed surfaces of semiconductors and other materi als is often overlooked at the manufacturing stage. In this case, the process is optimized by an informed "trial-and-error" approach which relies heavily on design-of-experiment techniques and the intuition of the process engineer. The need for regular cleaning of plasma reactors to remove built-up reaction or precursor gas products adds an extra degree of complexity because the interaction of the reactive species in the plasma with the reactor walls can also have a strong effect on the number of these species available for etching or deposition. Since the microelectronics industry depends on having high process yields at each step of the fabrication process, it is imperative that a full understanding of plasma etching and deposition techniques be achieved.

Plasma Deposition, Treatment, and Etching of Polymers takes a broad look at the basic principles, the chemical processes, and the diagnostic procedures in the interaction of plasmas with polymer surfaces. This recent technology has yielded a large class of new materials offering many applications, including their use as coatings for chemical fibers and films. Additional applications include uses for the passivation of metals, the surface hardening of tools, increased biocompatibility of biomedical materials, chemical and physical sensors, and a variety of micro- and optoelectronic devices. - Appeals to a broad range of industries from microelectronics to space technology - Discusses a wide array of new uses for plasma polymers - Provides a tutorial introduction to the field - Surveys various classes of plasma polymers, their chemical and morphological properties, effects of plasma process parameters on the growth and structure of these synthetic materials, and techniques for characterization - Interests scientists, engineers, and students alike

This is a comprehensive overview of the technology of plasma-based processing, written by an outstanding group of 29 contributors.