Plasma Enhanced Chemical Vapor Deposition of Silicon Oxide and Silicon Nitride
Title | Plasma Enhanced Chemical Vapor Deposition of Silicon Oxide and Silicon Nitride PDF eBook |
Author | William H. Ritchie |
Publisher | |
Pages | 118 |
Release | 1986 |
Genre | Plasma (Ionized gases) |
ISBN |
Carbide, Nitride and Boride Materials Synthesis and Processing
Title | Carbide, Nitride and Boride Materials Synthesis and Processing PDF eBook |
Author | A.W. Weimer |
Publisher | Springer Science & Business Media |
Pages | 675 |
Release | 2012-12-06 |
Genre | Technology & Engineering |
ISBN | 9400900716 |
Carbide, Nitride and Boride Materials Synthesis and Processing is a major reference text addressing methods for the synthesis of non-oxides. Each chapter has been written by an expert practising in the subject area, affiliated with industry, academia or government research, thus providing a broad perspective of information for the reader. The subject matter ranges from materials properties and applications to methods of synthesis including pre- and post-synthesis processing. Although most of the text is concerned with the synthesis of powders, chapters are included for other materials such as whiskers, platelets, fibres and coatings. Carbide, Nitride and Boride Materials Synthesis and Processing is a comprehensive overview of the subject and is suitable for practitioners in the industry as well as those looking for an introduction to the field. It will be of interest to chemical, mechanical and ceramic engineers, materials scientists and chemists in both university and industrial environments working on or with refractory carbides, nitrides and borides.
Plasma-enhanced Chemical Vapor Deposition of Silicon Nitride from 1,1,3,3,5,5,-hexamethylcyclotrisilazane
Title | Plasma-enhanced Chemical Vapor Deposition of Silicon Nitride from 1,1,3,3,5,5,-hexamethylcyclotrisilazane PDF eBook |
Author | Todd Alan Brooks |
Publisher | |
Pages | 286 |
Release | 1988 |
Genre | |
ISBN |
Plasma Enhanced Chemical Vapor Deposition of Silicon Nitride and Oxynitride Films Using Disilane as Silicon Source
Title | Plasma Enhanced Chemical Vapor Deposition of Silicon Nitride and Oxynitride Films Using Disilane as Silicon Source PDF eBook |
Author | Giridhar Nallapati |
Publisher | |
Pages | 108 |
Release | 1999 |
Genre | |
ISBN |
Silicon Nitride and Silicon Dioxide Thin Insulating Films
Title | Silicon Nitride and Silicon Dioxide Thin Insulating Films PDF eBook |
Author | |
Publisher | |
Pages | 306 |
Release | 2001 |
Genre | Silicon dioxide |
ISBN |
Chemical Vapor Deposition for Microelectronics
Title | Chemical Vapor Deposition for Microelectronics PDF eBook |
Author | Arthur Sherman |
Publisher | William Andrew |
Pages | 240 |
Release | 1987 |
Genre | Computers |
ISBN |
Presents an extensive, comprehensive study of chemical vapor deposition (CVD). Understanding CVD requires knowledge of fluid mechanics, plasma physics, chemical thermodynamics, and kinetics as well as homogenous and heterogeneous chemical reactions. This text presents these aspects of CVD in an integrated fashion, and also reviews films for use in integrated circuit technology.
Deposition of Fluorinated Silicon Nitride Using Plasma Enhanced Chemical Vapor Deposition
Title | Deposition of Fluorinated Silicon Nitride Using Plasma Enhanced Chemical Vapor Deposition PDF eBook |
Author | Mohammad Ibrahim Khan |
Publisher | |
Pages | 334 |
Release | 1990 |
Genre | Plasma-enhanced chemical vapor deposition |
ISBN |