Plasma Processing of Materials
Title | Plasma Processing of Materials PDF eBook |
Author | National Research Council |
Publisher | National Academies Press |
Pages | 88 |
Release | 1991-02-01 |
Genre | Technology & Engineering |
ISBN | 0309045975 |
Plasma processing of materials is a critical technology to several of the largest manufacturing industries in the worldâ€"electronics, aerospace, automotive, steel, biomedical, and toxic waste management. This book describes the relationship between plasma processes and the many industrial applications, examines in detail plasma processing in the electronics industry, highlights the scientific foundation underlying this technology, and discusses education issues in this multidisciplinary field. The committee recommends a coordinated, focused, and well-funded research program in this area that involves the university, federal laboratory, and industrial sectors of the community. It also points out that because plasma processing is an integral part of the infrastructure of so many American industries, it is important for both the economy and the national security that America maintain a strong leadership role in this technology.
Plasma Chemistry
Title | Plasma Chemistry PDF eBook |
Author | Alexander Fridman |
Publisher | Cambridge University Press |
Pages | |
Release | 2008-05-05 |
Genre | Technology & Engineering |
ISBN | 1139471732 |
Providing a fundamental introduction to all aspects of modern plasma chemistry, this book describes mechanisms and kinetics of chemical processes in plasma, plasma statistics, thermodynamics, fluid mechanics and electrodynamics, as well as all major electric discharges applied in plasma chemistry. Fridman considers most of the major applications of plasma chemistry, from electronics to thermal coatings, from treatment of polymers to fuel conversion and hydrogen production and from plasma metallurgy to plasma medicine. It is helpful to engineers, scientists and students interested in plasma physics, plasma chemistry, plasma engineering and combustion, as well as chemical physics, lasers, energy systems and environmental control. The book contains an extensive database on plasma kinetics and thermodynamics and numerical formulas for practical calculations related to specific plasma-chemical processes and applications. Problems and concept questions are provided, helpful in courses related to plasma, lasers, combustion, chemical kinetics, statistics and thermodynamics, and high-temperature and high-energy fluid mechanics.
Lecture Notes on Principles of Plasma Processing
Title | Lecture Notes on Principles of Plasma Processing PDF eBook |
Author | Francis F. Chen |
Publisher | Springer Science & Business Media |
Pages | 213 |
Release | 2012-12-06 |
Genre | Science |
ISBN | 1461501814 |
Plasma processing of semiconductors is an interdisciplinary field requiring knowledge of both plasma physics and chemical engineering. The two authors are experts in each of these fields, and their collaboration results in the merging of these fields with a common terminology. Basic plasma concepts are introduced painlessly to those who have studied undergraduate electromagnetics but have had no previous exposure to plasmas. Unnecessarily detailed derivations are omitted; yet the reader is led to understand in some depth those concepts, such as the structure of sheaths, that are important in the design and operation of plasma processing reactors. Physicists not accustomed to low-temperature plasmas are introduced to chemical kinetics, surface science, and molecular spectroscopy. The material has been condensed to suit a nine-week graduate course, but it is sufficient to bring the reader up to date on current problems such as copper interconnects, low-k and high-k dielectrics, and oxide damage. Students will appreciate the web-style layout with ample color illustrations opposite the text, with ample room for notes. This short book is ideal for new workers in the semiconductor industry who want to be brought up to speed with minimum effort. It is also suitable for Chemical Engineering students studying plasma processing of materials; Engineers, physicists, and technicians entering the semiconductor industry who want a quick overview of the use of plasmas in the industry.
Plasma Chemical Processing
Title | Plasma Chemical Processing PDF eBook |
Author | |
Publisher | |
Pages | 108 |
Release | 1979 |
Genre | Technology & Engineering |
ISBN |
Plasma Chemical Processing
Title | Plasma Chemical Processing PDF eBook |
Author | |
Publisher | |
Pages | 92 |
Release | 1976 |
Genre | |
ISBN |
The Application of Plasmas to Chemical Processing
Title | The Application of Plasmas to Chemical Processing PDF eBook |
Author | Raymond F. Baddour |
Publisher | Pergamon |
Pages | 232 |
Release | 1967 |
Genre | Chemical engineering |
ISBN |
Handbook of Advanced Plasma Processing Techniques
Title | Handbook of Advanced Plasma Processing Techniques PDF eBook |
Author | R.J. Shul |
Publisher | Springer Science & Business Media |
Pages | 664 |
Release | 2011-06-28 |
Genre | Technology & Engineering |
ISBN | 3642569897 |
Pattern transfer by dry etching and plasma-enhanced chemical vapor de position are two of the cornerstone techniques for modern integrated cir cuit fabrication. The success of these methods has also sparked interest in their application to other techniques, such as surface-micromachined sen sors, read/write heads for data storage and magnetic random access memory (MRAM). The extremely complex chemistry and physics of plasmas and their interactions with the exposed surfaces of semiconductors and other materi als is often overlooked at the manufacturing stage. In this case, the process is optimized by an informed "trial-and-error" approach which relies heavily on design-of-experiment techniques and the intuition of the process engineer. The need for regular cleaning of plasma reactors to remove built-up reaction or precursor gas products adds an extra degree of complexity because the interaction of the reactive species in the plasma with the reactor walls can also have a strong effect on the number of these species available for etching or deposition. Since the microelectronics industry depends on having high process yields at each step of the fabrication process, it is imperative that a full understanding of plasma etching and deposition techniques be achieved.