The first edition of this title has become a well-known reference book on ion sources. The field is evolving constantly and rapidly, calling for a new, up-to-date version of the book. In the second edition of this significant title, editor Ian Brown, himself an authority in the field, compiles yet again articles written by renowned experts covering various aspects of ion source physics and technology. The book contains full chapters on the plasma physics of ion sources, ion beam formation, beam transport, computer modeling, and treats many different specific kinds of ion sources in sufficient detail to serve as a valuable reference text.

The first edition of this title has become a well-known reference book on ion sources. The field is evolving constantly and rapidly, calling for a new, up-to-date version of the book. In the second edition of this significant title, editor Ian Brown, himself an authority in the field, compiles yet again articles written by renowned experts covering various aspects of ion source physics and technology. The book contains full chapters on the plasma physics of ion sources, ion beam formation, beam transport, computer modeling, and treats many different specific kinds of ion sources in sufficient detail to serve as a valuable reference text.

;Contents: Brief information on certain elemental processes occurring in plasma ion sources; Plasma ion sources (basic physical processes, designs, properties, and parameters); The mass spectrum and charge composition of beams extracted from plasma ion sources; Plasma sources of ions of refractory metals; Extraction of ions and the primary formation of ion beams. Beam propagation and a study of beams; Penetration of a plasma from an ion source into a vacuum. Energy of the ions leaving the source plasma; The vibrational properties of a plasma and their influence on the processes in plasma ion sources and neutralized ion beams.

The present book contains the proceedings of the workshop "Plasma Technology and Applications" which was held at 11 Ciocco (Lucca-Italy) during 5-6 July 1991. The workshop was organized just before ICPIG XX to emphasize the role of plasma physics and plasma chemistry in different fields of technology. Topics cover different applications such as lamps, plasma treatment of materials (etching, deposition, nitriding), plasma sources (microwave excitation, negative ion sources) and plasma destruction of pollutants. Several chapters deal with basic concepts in plasma physics, non equilibrium plasma modeling and plasma diagnostics as well as with laser interaction with solid targets. The authors gratefully acknowledge the financial support provided by university of Bari (Italy) and by CNR (Centro di Studio per la Chimica dei Plasmi, Istituto di Fisica Atomica e Molecolare (IFAM) and Progetto Finalizzato Materiali Speciali per Tecnologie Avanzate) as well as the sponsorship of ENEA. M. Capitelli C. Gorse v CONTENTS Plasmas in nature, laboratory and technology 1 A.M. Ignatov and A.A. Rukhadze Laser diagnostics of plasmas 11 L. Pyatnitsky Probe diagnostics of plasmas 27 G. Dilecce Theory, properties and applications of non equilibrium plasmas created by external energy sources 45 E. Son Non-Equilibrium plasma modeling 59 M. Capitel1i, R. Celiberto, G. Capriati, C. Gorse and S. Longo Gas discharge lamps 81 M. Koedam Plasma etching processes and diagnostics 93 R. d'Agostino and F. Fracassi Plasma deposition: processes and diagnostics 109 A

This book describes the development of sources of negative ions and their application in science and industry. It describes the physical foundations and implementation of the key methods of negative ion production and control, such as charge exchange, thermionic emission, plasma volume, secondary emission (sputtering) and surface-plasma sources, as well as the history of their development. Following on from this essential foundational material, the book goes on to explore transport of negative ion beams, and beam-plasma instabilities. Now in its second edition, the book has been substantially expanded and updated to address the many developments since it was first published, most importantly the development and investigation of cesiated surfaces with work function ~1.2-1.3 eV in conditions close to discharges in surface plasma sources. The book also includes a new chapter on development of conversion targets for high-energy neutral beam injectors, covering gas targets, plasma targets and photon targets for efficient conversion of high energy negative ion beams to neutral beams. With exposition accessible at the graduate level, and a comprehensive bibliography, this book will appeal to all students and researchers whose work concerns ion sources and their applications to accelerators, beam physics, storage rings, cyclotrons, and plasma traps.

Acknowledged as the "founding father" of and world renowned expert on electron cyclotron resonance sources Richard Geller has produced a unique book devoted to the physics and technicalities of electron cyclotron resonance sources. Electron Cyclotron Resonance Ion Sources and ECR Plasmas provides a primer on electron cyclotron phenomena in ion sour