Advancements in photopolymers have led to groundbreaking achievements in the electronics, print, optical engineering, and medical fields. At present, photopolymers have myriad applications in semiconductor device manufacturing, printed circuit boards (PCBs), ultraviolet (UV) curing, printing plates, 3-D printing, microelectromechanical systems (MEMS), and medical materials. Processes such as photopolymerization, photodegradation, and photocrosslinking, as well as lithography technology in which photofabrications are performed by images of photopolymers, have given rise to very large-scale integrated (VLSI) circuits, microproducts, and more. Addressing topics such as chemically amplified resists, immersion lithography, extreme ultraviolet (EUV) lithography, and nanoimprinting, Photopolymers: Photoresist Materials, Processes, and Applications covers photopolymers from core concepts to industrial applications, providing the chemical formulae and structures of the materials discussed as well as practical case studies from some of the world’s largest corporations. Offering a state-of-the-art review of progress in the development of photopolymers, this book provides valuable insight into current and future opportunities for photopolymer use.

Advancements in photopolymers have led to groundbreaking achievements in the electronics, print, optical engineering, and medical fields. At present, photopolymers have myriad applications in semiconductor device manufacturing, printed circuit boards (PCBs), ultraviolet (UV) curing, printing plates, 3-D printing, microelectromechanical systems (MEMS), and medical materials. Processes such as photopolymerization, photodegradation, and photocrosslinking, as well as lithography technology in which photofabrications are performed by images of photopolymers, have given rise to very large-scale integrated (VLSI) circuits, microproducts, and more. Addressing topics such as chemically amplified resists, immersion lithography, extreme ultraviolet (EUV) lithography, and nanoimprinting, Photopolymers: Photoresist Materials, Processes, and Applications covers photopolymers from core concepts to industrial applications, providing the chemical formulae and structures of the materials discussed as well as practical case studies from some of the world’s largest corporations. Offering a state-of-the-art review of progress in the development of photopolymers, this book provides valuable insight into current and future opportunities for photopolymer use.

This text provides an introduction to the fundamental theories and applications of rapid prototyping and traces its development in the arena of advanced manufacturing technologies.

This report contains a review of the state of the art in photoinitiated polymerisation. The review is divided into two main parts. The first part is devoted to a basic description of the different photoinitiation processes encountered. In the second part photopolymerisation reactions are presented and discussed. This review is published together with an indexed section containing bibliographic references and abstracts to the cited articles.

The objective of this book is to acquaint the reader with a novel class of photochemical oxidants and polymerization initiators that have become widely accepted in industry. As most of the work with these materials is reported in the patent literature, an effort has been made to study this area of scientific activity, as well as present a thorough review of the journal publications. Photochemistry, History and Commercial Applications of HABIs also presents new technologies such as waveguides, holography along with some more traditional applications (i.e. filters, litho plates, and photoresists). - A complete review of technology associated with hexaarylbiimidazoles