The most expensive phase in the manufacture of micro-optical components and fiber optics is also one of the most performance-critical: optical alignment of the components. The increasing degree of miniaturization makes this an especially challenging task. Active alignment methods result in higher costs and awkward processes, and for some applications, they simply are not possible. Passive Micro-Optical Alignment Methods introduces the passive alignment methods that are currently available and illustrates them with many examples, references, and critiques. The first book dedicated to passive alignment, it begins with an overview of the current activities, requirements, and general results of passive optical alignments, followed by three sections of in-depth analysis. The first of these discusses mechanical passive alignment, highlighting silicon waferboard, solder, and "Jitney" technologies as well as application of mechanical alignment to 3D free-space interconnects. The next section describes the various visual alignment techniques applied to Planar Lightwave Circuits (PLCs) and low-cost plastic and surface mount packaging. The final section details various utilities that aid passive alignment and their resulting tradeoffs and demonstrates Monte Carlo analysis to evaluate the potential of a given method. Passive Micro-Optical Alignment Methods provides the tools necessary to meet the challenge of precision and low-cost alignment for applications that require micron or sub-micron tolerance.

The development of new-generation micro-manufacturing technologies and systems has revolutionised the way products are designed and manufactured today with a s- nificant impact in a number of key industrial sectors. Micro-manufacturing techno- gies are often described as disruptive, enabling and interdisciplinary leading to the creation of whole new classes of products that were previously not feasible to ma- facture. While key processes for volume manufacture of micro-parts such as mach- ing and moulding are becoming mature technologies, micro-assembly remains a key challenge for the cost-effective manufacture of complex micro-products. The ability to manufacture customizable micro-products that can be delivered in variable volumes within relatively short timescales is very much dependent on the level of development of the micro-assembly processes, positioning, alignment and measurement techniques, gripping and feeding approaches and devices. Micro-assembly has developed rapidly over the last few years and all the pred- tions are that it will remain a critical technology for high-value products in a number of key sectors such as healthcare, communications, defence and aerospace. The key challenge is to match the significant technological developments with a new gene- tion of micro-products that will establish firmly micro-assembly as a mature manuf- turing process. th The book includes the set of papers presented at the 5 International Precision - sembly Seminar IPAS 2010 held in Chamonix, France from the 14th to the 17th February 2010.

Optical Methods of Measurement: Wholefield Techniques, Second Edition provides a comprehensive collection of wholefield optical measurement techniques for engineering applications. Along with the reorganization of contents, this edition includes a new chapter on optical interference, new material on nondiffracting and singular beams and their applications, and updated bibliography and additional reading sections. The book explores the propagation of laser beams, metrological applications of phase-singular beams, various detectors such as CCD and CMOS devices, and recording materials. It also covers interference, diffraction, and digital fringe pattern measurement techniques, with special emphasis on phase measurement interferometry and algorithms. The remainder of the book focuses on theory, experimental arrangements, and applications of wholefield techniques. The author discusses digital hologram interferometry, digital speckle photography, digital speckle pattern interferometry, Talbot interferometry, and holophotoelasticity. This updated book compiles the major wholefield methods of measurement in one volume. It provides a solid understanding of the techniques by describing the physics behind them. In addition, the examples given illustrate how the techniques solve measurement problems.

This handbook provides the most comprehensive, up-to-date and easy-to-apply information on the physics, mechanics, reliability and packaging of micro- and opto-electronic materials. It details their assemblies, structures and systems, and each chapter contains a summary of the state-of-the-art in a particular field. The book provides practical recommendations on how to apply current knowledge and technology to design and manufacture. It further describes how to operate a viable, reliable and cost-effective electronic component or photonic device, and how to make such a device into a successful commercial product.

Assembling an international team of experts, this book reports on the progress in the rapidly growing field of monolithic micro- and nanoresonators. The book opens with a chapter on photonic crystal-based resonators (nanocavities). It goes on to describe resonators in which the closed trajectories of light are supported by any variety of total internal reflection in curved and polygonal transparent dielectric structures. The book also covers distributed feedback microresonators for slow light, controllable dispersion, and enhanced nonlinearity. A portion of coverage is dedicated to the unique properties of resonators, which are extremely efficient tools when conducting multiple applications.

This new edition of the bestselling Microlithography: Science and Technology provides a balanced treatment of theoretical and operational considerations, from elementary concepts to advanced aspects of modern submicron microlithography. Each chapter reflects the current research and practices from the world's leading academic and industrial laboratories detailed by a stellar panel of international experts. New in the Second Edition In addition to updated information on existing material, this new edition features coverage of technologies developed over the last decade since the first edition appeared, including: Immersion Lithography 157nm Lithography Electron Projection Lithography (EPL) Extreme Ultraviolet (EUV) Lithography Imprint Lithography Photoresists for 193nm and Immersion Lithography Scatterometry Microlithography: Science and Technology, Second Edition authoritatively covers the physics, chemistry, optics, metrology tools and techniques, resist processing and materials, and fabrication methods involved in the latest generations of microlithography such as immersion lithography and extreme ultraviolet (EUV) lithography. It also looks ahead to the possible future systems and technologies that will bring the next generations to fruition. Loaded with illustrations, equations, tables, and time-saving references to the most current literature, this book is the most comprehensive and reliable source for anyone, from student to seasoned professional, looking to achieve robust, accurate, and cost-effective microlithography processes and systems.

Helps readers understand the important advances in nanophotonics materials development and their latest applications This book introduces the current state of and emerging trends in the development of integrated nanophotonics. Written by three well-qualified authors, it systematically reviews the knowledge of integrated nanophotonics from theory to the most recent technological developments. It also covers the applications of integrated nanophotonics in essential areas such as neuromorphic computing, biosensing, and optical communications. Lastly, it brings together the latest advancements in the key principles of photonic integrated circuits, plus the recent advances in tackling the barriers in photonic integrated circuits. Sample topics included in this comprehensive resource include: Platforms for integrated nanophotonics, including lithium niobate nanophotonics, indium phosphide nanophotonics, silicon nanophotonics, and nonlinear optics for integrated photonics The devices and technologies for integrated nanophotonics in on-chip light sources, optical packaging of photonic integrated circuits, optical interconnects, and light processing devices Applications on neuromorphic computing, biosensing, LIDAR, and computing for AI and artificial neural network and deep learning Materials scientists, physicists, and physical chemists can use this book to understand the totality of cutting-edge theory, research, and applications in the field of integrated nanophotonics.