The objective of this workshop on optical thin films was to generate a list of basic research efforts which should be pursued in thin film processing techniques and thin film diagnostics which would lead to the development of more damage resistant, more predictable and repeatable thin film coatings which would exhibit long life and stable performance. A group of invited papers covering laser damage, surface preparation, film microstructure, deposition techniques and diagnostics were presented. Discussion of the research needs to advance basic understanding and improvement of optical thin films is summarized, and a prioritized research program which has been generated by the Workshop Advisory Committee is given.

Thin films science and technology plays an important role in the high-tech industries. Thin film technology has been developed primarily for the need of the integrated circuit industry. The demand for development of smaller and smaller devices with higher speed especially in new generation of integrated circuits requires advanced materials and new processing techniques suitable for future giga scale integration (GSI) technology. In this regard, physics and technology of thin films can play an important role to acheive this goal. The production of thin films for device purposes has been developed over the past 40 years. Thin films as a two dimensional system are of great importance to many real-world problems. Their material costs are very small as compared to the corresponding bulk material and they perform the same function when it comes to surface processes. Thus, knowledge and determination of the nature, functions and new properties of thin films can be used for the development of new technologies for future applications. Thin film technology is based on three foundations: fabrication, characterization and applications. Some of the important applications of thin films are microelectronics, communication, optical electronics, catalysis, coating of all kinds, and energy generation and conservation strategies. This book emphasizes the importance of thin films and their properties for the new technologies. It presents basic principles, processes techniques and applications of thin films. As thin films physics and technology is a multidisciplinary field, the book will be useful to a wide varity of readers (especially young researcher) in physics, electronic engineering, material science and metallurgy. Contents: Deposition Processes; Characterization Techniques; Surface Processes; Nanomaterials; Optical Materials; Superconductivity; Magnetic Thin Films. Readership: Graduate students and researchers involved with the physics and technology of thin films.

Thin Film Nanophotonics: Conclusions from the Third International Workshop on Thin Films for Electronics, Electro-Optics, Energy and Sensors (TFE3S) provides up-to-date coverage of the properties and photonic applications of nanostructured thin films, including discussions on optical waveguides, photonic lattices for wideband reflectors, polarizers, bandpass filters, meta surfaces, plasmonic resonance sensors, smart windows, optical switches, photovoltaics, and many more. This is an important reference source for materials scientists, engineers and physicists working in the areas of nanomaterials and photonics. New thin film applications such as thin-film topological insulators and 2D materials are gaining attention and growing exponentially, hence this book is an ideal reference on how engineered thin films for various nano-photonics applications present exponential growth in a wide array of areas. Focuses on the interaction of photons with nanostructured thin films, nanocrystals, nanowires, semiconductor nanodots and photonic crystals Offers a comprehensive overview of the latest advances in thin-film nanophotonics Discusses how the properties of thin films make them particularly useful for photonic applications

Providing insider viewpoints and perspectives unavailable in any other text, this book presents useful guidelines and tools to produce effective coatings and films. Covering subjects ranging from materials selection and process development to successful system construction and optimization, it contains expanded discussions on design visualization, dense wavelength division multiplexing, new coating equipment, electrochromic and chemically active coatings, ion-assisted deposition, and optical monitoring sensitivity. Furnishing real-world examples and know-how, the book introduces Fourier analysis and synthesis without difficult mathematical concepts and equations.

Thin film science and technology plays an important role in the high-tech industries. The production of thin films for device purposes has been developed over the past 40 years. Thin films as a two-dimensional system are of great importance to many real-world problems. Their material costs are very small as compared to the corresponding bulk material and they perform the same function when it comes to surface processes. Thus, knowledge and determination of the nature, functions and new properties of thin films can be used for the development of new technologies for future applications. Some of the important applications of thin films are microelectronics, communications, optical electronics, catalysis, coating of all kinds, and energy generation and conservation strategies. This book emphasizes the importance of thin films in new technologies. It presents basic concepts, techniques, materials, processing and applications of thin films. As thin film physics and technology is a multidisciplinary filed, the book will be useful to a wide variety of readers (especially young researchers) in physics, electronic engineering, materials science and metallurgy.

Baumeister organizes this book around the key subjects associated with functions of optical thin film performance, and provides a valuable resource in the field of thin film technology. The information is widely backed up with citations to patents and published literature. The author draws from 25 years of experience teaching classes at the UCLA Extension Program, and at companies worldwide to answer questions, such as: what are the conventions for a given analysis formalism? and, what other design approaches have been tried for this application?