The book reviews the most recent achievements in optical technologies for XUV and X-ray coherent sources. Particular attention is given to free-electron-laser facilities, but also to other sources available at present, such as synchrotrons, high-order laser harmonics and X-ray lasers. The optical technologies relevant to each type of source are discussed. In addition, the main technologies used for photon handling and conditioning, namely multilayer mirrors, adaptive optics, crystals and gratings are explained. Experiments using coherent light received during the last decades a lot of attention for the X-ray regime. Strong efforts were taken for the realization of almost fully coherent sources, e.g. the free-electron lasers, both as independent sources in the femtosecond and attosecond regimes and as seeding sources for free-electron-lasers and X-ray gas lasers. In parallel to the development of sources, optical technologies for photon handling and conditioning of such coherent and intense X-ray beams advanced. New problems were faced for the realization of optical components of beamlines demanding to manage coherent X-ray photons, e.g. the preservation of coherence and time structure of ultra short pulses.

Master the physics and understand the current applications of modern X-ray and EUV sources with this fully updated second edition.

This detailed, comprehensive book describes the fundamental properties of soft X-rays and extreme ultraviolet (EUV) radiation and discusses their applications in a wide variety of fields, including EUV lithography for semiconductor chip manufacture and soft X-ray biomicroscopy. The author begins by presenting the relevant basic principles such as radiation and scattering, wave propagation, diffraction, and coherence. He then goes on to examine a broad range of phenomena and applications. The topics covered include spectromicroscopy, EUV astronomy, synchrotron radiation, and soft X-ray lasers. The author also provides a wealth of useful reference material such as electron binding energies, characteristic emission lines and photo-absorption cross-sections. The book will be of great interest to graduate students and researchers in engineering, physics, chemistry, and the life sciences. It will also appeal to practising engineers involved in semiconductor fabrication and materials science.

As part of the Physics 2010 decadal survey project, the Department of Energy and the National Science Foundation requested that the National Research Council assess the opportunities, over roughly the next decade, in atomic, molecular, and optical (AMO) science and technology. In particular, the National Research Council was asked to cover the state of AMO science, emphasizing recent accomplishments and identifying new and compelling scientific questions. Controlling the Quantum World, discusses both the roles and challenges for AMO science in instrumentation; scientific research near absolute zero; development of extremely intense x-ray and laser sources; exploration and control of molecular processes; photonics at the nanoscale level; and development of quantum information technology. This book also offers an assessment of and recommendations about critical issues concerning maintaining U.S. leadership in AMO science and technology.

The Vol.1 devoted to various topics of optics and optic instrumentation, and contains 17 chapters written by 36 experts in the field from 15 countries: Brazil, China, Denmark, France, Germany, India, Japan, Mexico, Russia, Turkey, Slovenia, South Korea, UK, Ukraine and USA. 'Advances in Optics: Reviews' Book Series is a comprehensive study of the field of optics, which provides readers with the most up-to-date coverage of optics, photonics and lasers with a good balance of practical and theoretical aspects. Directed towards both physicists and engineers this Book Series is also suitable for audiences focusing on applications of optics. A clear comprehensive presentation makes these books work well as both a teaching resources and a reference books. The book is intended for researchers and scientists in physics and optics, in academia and industry, as well as postgraduate students.

With this fully updated second edition, readers will gain a detailed understanding of the physics and applications of modern X-ray and EUV radiation sources. Taking into account the most recent improvements in capabilities, coverage is expanded to include new chapters on free electron lasers (FELs), laser high harmonic generation (HHG), X-ray and EUV optics, and nanoscale imaging; a completely revised chapter on spatial and temporal coherence; and extensive discussion of the generation and applications of femtosecond and attosecond techniques. Readers will be guided step by step through the mathematics of each topic, with over 300 figures, 50 reference tables and 600 equations enabling easy understanding of key concepts. Homework problems, a solutions manual for instructors, and links to YouTube lectures accompany the book online. This is the 'go-to' guide for graduate students, researchers and industry practitioners interested in X-ray and EUV interaction with matter.

These proceedings comprise invited and contributed papers presented at the 14th International Conference on X-Ray Lasers (ICXRL 2014). This conference is part of a continuing series dedicated to recent developments and applications of x-ray lasers and other coherent x-ray sources with attention to supporting technologies and instrumentation. New results in the generation of intense, coherent x-rays and progress toward practical devices and their applications in numerous fields are reported. Areas of research in plasma-based x-ray lasers, 4th generation accelerator-based sources and higher harmonic generation, and other x-ray generation schemes are covered. The scope of ICXRL 2014 included, but was not limited to: Laser-pumped X-ray lasers Discharge excitation and other X-ray laser pumping methods Injection/seeding of X-ray amplifiers New lasing transitions and novel X-ray laser schemes High Harmonic sources-Free-electron laser generation in the XUV and X-ray range Novel schemes for coherent XUV and X-ray generation XUV and X-ray optics and metrology-Driving laser technology Theory and modeling of X-ray gain medium and beam characteristics Applications of high brightness and ultrashort X-ray sources