Increasing possibilities of computer-aided data processing have caused a new revival of optical techniques in many areas of mechanical and chemical en gineering. Optical methods have a long tradition in heat and mass transfer and in fluid dynamics. Global experimental information is not sufficient for developing constitution equations to describe complicated phenomena in fluid dynamics or in transfer processes by a computer program . Furthermore, a detailed insight with high local and temporal resolution into the thermo-and fluiddynamic situations is necessary. Sets of equations for computer program in thermo dynamics and fluid dynamics usually consist of two types of formulations: a first one derived from the conservation laws for mass, energy and momentum, and a second one mathematically modelling transport processes like laminar or turbulent diffusion. For reliably predicting the heat transfer, for example, the velocity and temperature field in the boundary layer must be known, or a physically realistic and widely valid correlation describing the turbulence must be avail able. For a better understanding of combustion processes it is necessary to know the local concentration and temperature just ahead of the flame and in the ignition zone.

An accessible, introductory text explaining how to select, set up and use optical spectroscopy and optical microscopy techniques.

The measurement and characterisation of surface topography is crucial to modern manufacturing industry. The control of areal surface structure allows a manufacturer to radically alter the functionality of a part. Examples include structuring to effect fluidics, optics, tribology, aerodynamics and biology. To control such manufacturing methods requires measurement strategies. There is now a large range of new optical techniques on the market, or being developed in academia, that can measure areal surface topography. Each method has its strong points and limitations. The book starts with introductory chapters on optical instruments, their common language, generic features and limitations, and their calibration. Each type of modern optical instrument is described (in a common format) by an expert in the field. The book is intended for both industrial and academic scientists and engineers, and will be useful for undergraduate and postgraduate studies.

From the reviews: "Haus’ book provides numerous insights on topics of wide importance, and contains much material not available elsewhere in book form. [...] an indispensable resource for those working in quantum optics or electronics." Optics & Photonics News

Optical Measurements, Modeling, and Metrology represents one of eight volumes of technical papers presented at the Society for Experimental Mechanics Annual Conference on Experimental and Applied Mechanics, held at Uncasville, Connecticut, June 13-16, 2011. The full set of proceedings also includes volumes on Dynamic Behavior of Materials, Mechanics of Biological Systems and Materials, Mechanics of Time-Dependent Materials and Processes in Conventional and Multifunctional Materials; MEMS and Nanotechnology; Experimental and Applied Mechanics, Thermomechanics and Infra-Red Imaging, and Engineering Applications of Residual Stress.

This volume is an essential handbook for anyone interested in performing the most accurate spectrophotometric or other optical property of materials measurements. The chapter authors were chosen from the leading experts in their respective fields and provide their wisdom and experience in measurements of reflectance, transmittance, absorptance, emittance, diffuse scattering, color, and fluorescence. The book provides the reader with the theoretical underpinning to the methods, the practical issues encountered in real measurements, and numerous examples of important applications. - Written by the leading international experts from industry, government, and academia - Written as a handbook, with in depth discussion of the topics - Focus on making the most accurate and reproducible measurements - Many practical applications and examples

The first edition of this book concentrated on relating scatter from optically smooth surfaces to the microroughness on those surfaces. After spending six years in the semiconductor industry, Dr. Stover has updated and expanded the third edition. Newly included are scatter models for pits and particles as well as the use of wafer scanners to locate and size isolated surface features. New sections cover the multimillion-dollar wafer scanner business, establishing that microroughness is the noise, not the signal, in these systems. Scatter measurements, now routinely used to determine whether small-surface features are pits or particles and inspiring new technology that provides information on particle material, are also discussed. These new capabilities are now supported by a series of international standards, and a new chapter reviews those documents. New information on scatter from optically rough surfaces has also been added. Once the critical limit is exceeded, scatter cannot be used to determine surface-roughness statistics, but considerable information can still be obtained - especially when measurements are made on mass-produced products. Changes in measurement are covered, and the reader will find examples of scatter measurements made using a camera for a fraction of the cost and in a fraction of the time previously possible. The idea of relating scatter to surface appearance is also discussed, and appearance has its own short chapter. After all, beauty is in the eye of the beholder, and what we see is scattered light.