A comprehensive review of the state of the art and advances in the field, while also outlining the future potential and development trends of optical imaging and optical metrology, an area of fast growth with numerous applications in nanotechnology and nanophysics. Written by the world's leading experts in the field, it fills the gap in the current literature by bridging the fields of optical imaging and metrology, and is the only up-to-date resource in terms of fundamental knowledge, basic concepts, methodologies, applications, and development trends.

Choosing from the numerous 3D vision methods available can be frustrating for scientists and engineers, especially without a comprehensive resource to consult. Filling this gap, this handbook gives an in-depth look at the most popular 3D imaging techniques. Written by key players in the field and inventors of important imaging technologies, it helps you understand the core of 3D imaging technology and choose the proper 3D imaging technique for your needs. For each technique, the book provides its mathematical foundations, summarizes its successful applications, and discusses its limitations.

This book describes the experimental and theoretical bases for the development of specifically quantum-mechanical approaches to metrology, imaging, and communication. In particular, it presents novel techniques developed over the last two decades and explicates them both theoretically and by reference to experiments which demonstrate their principles in practice. The particular techniques explored include two-photon interferometry, two-photon optical aberration and dispersion cancellation, lithography, microscopy, and cryptography.

New material on computerized optical processes, computerized ray tracing, and the fast Fourier transform, Bibre-Bragg sensors, and temporal phase unwrapping. * New introductory sections to all chapters. * Detailed discussion on lasers and laser principles, including an introduction to radiometry and photometry. * Thorough coverage of the CCD camera.

Handbook of Optical Metrology: Principles and Applications begins by discussing key principles and techniques before exploring practical applications of optical metrology. Designed to provide beginners with an introduction to optical metrology without sacrificing academic rigor, this comprehensive text: Covers fundamentals of light sources, lenses, prisms, and mirrors, as well as optoelectronic sensors, optical devices, and optomechanical elements Addresses interferometry, holography, and speckle methods and applications Explains Moiré metrology and the optical heterodyne measurement method Delves into the specifics of diffraction, scattering, polarization, and near-field optics Considers applications for measuring length and size, displacement, straightness and parallelism, flatness, and three-dimensional shapes This new Second Edition is fully revised to reflect the latest developments. It also includes four new chapters—nearly 100 pages—on optical coherence tomography for industrial applications, interference microscopy for surface structure analysis, noncontact dimensional and profile metrology by video measurement, and optical metrology in manufacturing technology.

Here for the first time is an integrated mathematical view of the physics and numerical modeling of optical projection lithography that efficiently covers the full spectrum of the important concepts. Alfred Wong offers rigorous underpinning, clarity in systematic formulation, physical insight into emerging ideas, as well as a system-level view of the parameter tolerances required in manufacturing. Readers with a good working knowledge of calculus can follow the step-by-step development, and technologists can gather general concepts and the key equations that result. Even the casual reader will gain a perspective on the key concepts, which will likely help facilitate dialog among technologists.

Provides basic explanations of the operation and application of the most common methods in the field and in commercial use. The first half of the book presents a working knowledge of the mechanism and limitations of optical dimensional measurement methods. The book concludes with a series of manufacturing application examples.