Ten years have passed since the publication of the first edition of this classic text in April 2001. Considerable new material amounting to 100 pages has been added in this second edition. Each chapter now contains a Summary section at the end. The new material in Chapter 4 consists of a detailed comparison of Gaussian apodization with a corresponding beam, determination of the optimum value of the Gaussian radius relative to that of the pupil to yield maximum focal-point irradiance, detailed discussion of standard deviation, aberration balancing, and Strehl ratio for primary aberrations, derivation of the aberration-free and defocused OTF, discussion of an aberrated beam yielding higher axial irradiance in a certain defocused region than its aberration-free focal-point value, illustration that aberrated PSFs lose the advantage of Gaussian apodizaton in reducing the secondary maxima of a PSF, and a brief description of the characterization of the width of a multimode beam. In Chapter 5, the effect of random longitudinal defocus on a PSF is included. The coherence length of atmospheric turbulence is calculated for looking both up and down through the atmosphere. Also discussed are the angle of arrival of a light wave propagating through turbulence, and lucky imaging where better-quality short-exposure images are selected, aligned, and added to obtain a high-quality image.

An accessible, well presented introduction to the theory of optical aberrations, covering key topics that are often missing from comparable books.

This book provides a clear, concise, and consistent exposition of what aberrations are, how they arise in optical imaging systems, and how they affect the quality of images formed by them. The emphasis of the book is on physical insight, problem solving, and numerical results, and the text is intended for engineers and scientists who have a need and a desire for a deeper and better understanding of aberrations and their role in optical imaging and wave propagation. Some knowledge of Gaussian optics and an appreciation for aberrations would be useful but is not required.

Here for the first time is an integrated mathematical view of the physics and numerical modeling of optical projection lithography that efficiently covers the full spectrum of the important concepts. Alfred Wong offers rigorous underpinning, clarity in systematic formulation, physical insight into emerging ideas, as well as a system-level view of the parameter tolerances required in manufacturing. Readers with a good working knowledge of calculus can follow the step-by-step development, and technologists can gather general concepts and the key equations that result. Even the casual reader will gain a perspective on the key concepts, which will likely help facilitate dialog among technologists.

This comprehensive and self-contained text for researchers and professionals presents a detailed account of optical imaging from the viewpoint of both ray and wave optics.

Optical microscopy and associated technologies have advanced rapidly along with laser technology. These techniques have stimulated further development of the optical imaging theory, including 3-dimensional microscopy imaging theory, the theory of imaging with ultrashort pulsed beam illumination and the aberration theory for high numerical-aperture objectives. This book introduces these new theories in modern optical microscopy, providing comparisons with classical imaging as appropriate.

A concise introduction to lens design, including the fundamental theory, concepts, methods and tools used in the field. Covering all the essential concepts and providing suggestions for further reading at the end of each chapter, this book is an essential resource for graduate students working in optics and photonics.