Flat panel displays (FPDs) are microfabricated devices that are often fabricated on specialized glass substrates known as display glass. The surface chemistry of the outer few nanometers of display glass can have an important influence on FDP performance and yield. Display glass surface characterization is difficult because (i) display glass surface composition varies significantly from its bulk composition; (ii) high-surface area forms of glass, such as fibers and powders, may not have the same surface composition as melt-formed planar surfaces, and (iii) the surface composition of display glass may be altered through exposure to chemical treatments commonly used during flat panel display production, including acids, bases, etchants, detergents, and plasmas.

The book consists of a series of edited chapters, each written by an expert in the field and focusing on a particular characterization technique as applied to glass. The book covers a variety of techniques ranging from the very common (like Raman and FTIR) to the most recent (and less well known) ones, like SEM for structural analysis and photoelastic measurements. The level of the chapters make it suitable for researchers and for graduate students about to start their research work. It will also: discuss the technique itself, background, nuances when it comes to looking at glassy materials, interpretation of results, case studies, and recent and near-future innovations Fill a widening gap in modern techniques for glass characterization Provide much needed updates on the multiple essential characterization techniques

Methods of Surface Analysis deals with the determination of the composition of surfaces and the identification of species attached to the surface. The text applies methods of surface analysis to obtain a composition depth profile after various stages of ion etching or sputtering. The composition at the solid—solid interface is revealed by systematically removing atomic planes until the interface of interest is reached, in which the investigator can then determine its composition. The book reviews the effect of ion etching on the results obtained by any method of surface analysis including the effect of the rate of etching, incident energy of the bombarding ion, the properties of the solid, the effect of the ion etching on generating an output signal of electrons, ions, or neutrals. The text also describes the effect of the residual gases in the vacuum environment. The book considers the influence of the sample geometry, of the type (metal, insulator, semiconductor, organic), and of the atomic number can have on surface analysis. The text describes in detail low energy ion scattering spectroscopy, X-ray photoelectron spectroscopy, Auger electron spectroscopy, secondary ion mass spectroscopy, and infrared reflection-absorption spectroscopy. The book can prove useful for researchers, technicians, and scientists whose works involve organic chemistry, analytical chemistry, and other related fields of chemistry, such as physical chemistry or inorganic chemistry.

Surveying and comparing all techniques relevant for practical applications in surface and thin film analysis, this second edition of a bestseller is a vital guide to this hot topic in nano- and surface technology. This new book has been revised and updated and is divided into four parts - electron, ion, and photon detection, as well as scanning probe microscopy. New chapters have been added to cover such techniques as SNOM, FIM, atom probe (AP),and sum frequency generation (SFG). Appendices with a summary and comparison of techniques and a list of equipment suppliers make this book a rapid reference for materials scientists, analytical chemists, and those working in the biotechnological industry. From a Review of the First Edition (edited by Bubert and Jenett) "... a useful resource..." (Journal of the American Chemical Society)

To use materials effectively, their composition, degree of perfection, physical and mechanical characteristics, and microstructure must be accurately determined. This concise encyclopledia covers the wide range of characterization techniques necessary to achieve this. Articles included are not only concerned with the characterization techniques of specific materials such as polymers, metals, ceramics and semiconductors but also techniques which can be applied to materials in general. The techniques described cover bulk methods, and also a number of specific methods to study the topography and composition of surface and near-surface regions. These techniques range from the well-established and traditional to the very latest including: atomic force microscopy; confocal optical microscopy; gamma ray diffractometry; thermal wave imaging; x-ray diffraction and time-resolved techniques. This unique concise encyclopedia comprises 116 articles by leading experts in the field from around the world to create the ideal guide for materials scientists, chemists and engineers involved with any aspect of materials characterization. With over 540 illustrations, extensive cross-referencing, approximately 900 references, and a detailed index, this concise encyclopedia will be a valuable asset to any materials science collection.

This one-of-a-kind reference examines conventional and advanced methodologies for the quantitative evaluation of properties and characterization of microstructures in metals. It presents methods for uncovering valuable information including precipitate mechanisms, kinetics, stability, crystallographic orientation, the effects of thermo-mechanical p