Offering thorough coverage of atomic layer deposition (ALD), this book moves from basic chemistry of ALD and modeling of processes to examine ALD in memory, logic devices and machines. Reviews history, operating principles and ALD processes for each device.

This book summarizes the most recent and compelling experimental results for complex oxide interfaces. The results of this book were obtained with the cutting-edge photoemission technique at highest energy resolution. Due to their fascinating properties for new-generation electronic devices and the challenge of investigating buried regions, the book chiefly focuses on complex oxide interfaces. The crucial feature of exploring buried interfaces is the use of soft X-ray angle-resolved photoemission spectroscopy (ARPES) operating on the energy range of a few hundred eV to increase the photoelectron mean free path, enabling the photons to penetrate through the top layers – in contrast to conventional ultraviolet (UV)-ARPES techniques. The results presented here, achieved by different research groups around the world, are summarized in a clearly structured way and discussed in comparison with other photoemission spectroscopy techniques and other oxide materials. They are complemented and supported by the most recent theoretical calculations as well as results of complementary experimental techniques including electron transport and inelastic resonant X-ray scattering.

With the use of ferroelectric materials in memory devices and the need for high-speed integrated optics devices, interest in ferroelectric thin films continues to grow. With their remarkable properties, such as energy nonvolatility, fast switching, radiative stability and unique optoacoustic and optoelectronic properties, Lithium Niobate-Based Heterostructures: Synthesis, properties and electron phenomena discusses why lithium niobate (LiNbO3) is one of the most promising of all ferroelectric materials. Based on years of study, this book presents the systematic characterization of substructure and electronic properties of a heterosystem formed in the deposition process of lithium niobate films onto the surface of silicon wafers.