Measurements on the Near Infra-red Absorption of Some Diatomic Gases ...

Measurements on the Near Infra-red Absorption of Some Diatomic Gases ...
Title Measurements on the Near Infra-red Absorption of Some Diatomic Gases ... PDF eBook
Author Elmer Samuel Imes
Publisher
Pages 36
Release 1919
Genre Absorption spectra
ISBN

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MEASUREMENTS ON THE NEAR INFRA-RED ABSORPTION OF SOME DIATOMIC GASES.

MEASUREMENTS ON THE NEAR INFRA-RED ABSORPTION OF SOME DIATOMIC GASES.
Title MEASUREMENTS ON THE NEAR INFRA-RED ABSORPTION OF SOME DIATOMIC GASES. PDF eBook
Author ELMER SAMUEL IMES
Publisher
Pages 98
Release 1918
Genre
ISBN

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The Excitation of the Secondary Spectrum of Hydrogen by Electron Impacts

The Excitation of the Secondary Spectrum of Hydrogen by Electron Impacts
Title The Excitation of the Secondary Spectrum of Hydrogen by Electron Impacts PDF eBook
Author Ora Stanley Duffendack
Publisher
Pages 762
Release 1921
Genre Absorption spectra
ISBN

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Contributions from the Physical Laboratory of the University of Michigan

Contributions from the Physical Laboratory of the University of Michigan
Title Contributions from the Physical Laboratory of the University of Michigan PDF eBook
Author University of Michigan Physical Laboratory
Publisher
Pages 1022
Release 1913
Genre Physics
ISBN

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The Astrophysical Journal

The Astrophysical Journal
Title The Astrophysical Journal PDF eBook
Author
Publisher
Pages 406
Release 1920
Genre Astrophysics
ISBN

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"Letters to the Editor" issued as Part 2 and separately paged from v. 148, 1967. Beginning in 2009, the Letters published only online.

Papers

Papers
Title Papers PDF eBook
Author University of Michigan. Department of Physics
Publisher
Pages 794
Release 1913
Genre Physics
ISBN

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Plasma Processing of Semiconductors

Plasma Processing of Semiconductors
Title Plasma Processing of Semiconductors PDF eBook
Author P.F. Williams
Publisher Springer Science & Business Media
Pages 610
Release 2013-11-11
Genre Technology & Engineering
ISBN 9401158843

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Plasma Processing of Semiconductors contains 28 contributions from 18 experts and covers plasma etching, plasma deposition, plasma-surface interactions, numerical modelling, plasma diagnostics, less conventional processing applications of plasmas, and industrial applications. Audience: Coverage ranges from introductory to state of the art, thus the book is suitable for graduate-level students seeking an introduction to the field as well as established workers wishing to broaden or update their knowledge.