Proceedings of the March 1997 symposium, the central thrust being the relationship of magnetic properties and device performance to structure at the atomic, nanometer, and submicron length scales in these systems of reduced dimensionality. The 89 contributions cover the following topics: synthesis, processing, and characterization; novel applications and approaches for magnetism; nano-microstructure and magnetic properties; structure and properties--mixing, strain, and steps; nanoscale magnetic confinement, particles, and arrays; magnetization reversal and domain structure; synthesis and characterization; synchrotron radiation studies of magnetic materials; magneto-optical properties, effects, and measurements; magnetic phenomena; CMR and tunneling; and interlayer coupling and spin polarization. Annotation copyrighted by Book News, Inc., Portland, OR

The Symposium on Magnetic Ultrathin Films, Multilayers and Surfaces, hosted by the European Materials Research Society, was held at the Palais de la Musique et des Congré in Strasbourg, France on June 4-7, 1996. Its central theme was the relationship of magnetic properties and device performance to structure at the nano and micrometer length scale. Research on the magnetism of surfaces, ultrathin films and multilayers has increased dramatically during recent years. This development was triggered by the discovery of coupling between ferromagnetic layers across nonmagnetic spacer layers and of the giant magnetoresistance effect in systems of reduced dimension using various micro and nanofabrication techniques has become a subject of special interest. It is certainly the promising application potential of these effects in new magnetic recording device geometries which causes this intensive research, which is done both by companies and at universities and research institutes. A selection of invited and contributed papers presented at the Symposium and accepted for publication is contained in this volume. The contents of these proceedings are organized into seven sections. A. Nanowires, Nanoparticles, Nanostructuring B. Ultrathin Films and Surfaces, Characterization C. Giant Magnetoresistance D. Coupling, Tunneling E. Growth, Structure, Magnetism F. Growth, Structure, Magnetoresistance G. Coupling, Magnetic processes, Magneto-optics. The first four sections contain invited and oral contributed papers in the listed research domains, while the last three sections contain the contributions presented during three large poster sessions.

The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.

The inexorable drive for increased integrated circuit functionality and performance places growing demands on the metal and dielectric thin films used in fabricating these circuits, as well as spurring demand for new materials applications and processes. This book directly addresses issues of widespread concern in the microelectronics industry - smaller feature sizes, new materials and new applications that challenge the reliability of new technologies. While the book continues the focus on issues related to interconnect reliability, such as electromigration and stress, particular emphasis is placed on the effects of microstructure. An underlying theme is understanding the importance of interactions among different materials and associated interfaces comprising a single structure with dimensions near or below the micrometer scale. Topics include: adhesion and fracture; gate oxide growth and oxide interfaces; surface preparation and gate oxide reliability; oxide degradation and defects; micro-structure, texture and reliability; novel measurement techniques; interconnect performance and reliability modeling; electromigration and interconnect reliability and stress and stress relaxation.

Contains 49 papers from the December 1997 symposium. The contributions are organized into three sections devoted to silicon-, II-VI-, and III-V-based thin films, as well as a section on general thin films. A number of processes are dealt with, including VEST; ion-beam, plasma, laser, low temperature sputter, and metalorganic chemical vapor depositions; and various growth techniques. In addition, analysis and modeling methodologies are discussed. Annotation copyrighted by Book News, Inc., Portland, OR

The proliferation of lasers and systems employing lasers has brought with it the potential for adverse effects from these bright, coherent light sources. This includes the possibility of damage from pulsed lasers, as well as temporary blinding by continuous-waver lasers. With nearly every wavelength possible being emitted by these sources, there exists a need to develop optical limiters and tunable filters which can suppress undesired radiation of any wavelength. This book addresses a number of materials and devices which have the potential for meeting the challenge. The proceedings is divided into five parts. Parts I and II cover research in organic and inorganic materials primarily based on nonlinear absorption or phase transitions for optical limiting of pulsed lasers. Part III includes photo-refractive materials and liquid crystals which find primary applications in dynamic filters. Part IV covers various aspects of device and material characterization, including nonlinear beam propagation effects. Theoretical modelling of materials properties is the subject of Part V.

The focus of semiconductor wafer processing is rapidly changing. Pure device performance is no longer sufficient to ensure a technology's success as IC chips approach 1GB. Yield, reliability, cost and manufacturability are principal drivers of the industry. Great strides have been made in understanding the science and impact of front-end (pre-metal) chemical surface preparations and are beginning to influence the 'real' technology and its evolution. Efforts in understanding particle and metals removal, along with Si surface etching and microroughness are prime examples of areas where work is beginning to pay off together with processes related to the back-end (post-metal). The focus of this book is to report new findings and to discuss surface preparation with an emphasis on gaining a mechanistic understanding of the underlying science upon which the technology is based. Topics include: megasonic cleaning; SC1 technology; surface preparation and gate oxide reliability; CMP/CMP cleaning; post-etch processing; surface microroughness; wet chemical cleaning and gate oxide integrity; analytical studies of surfaces; wet chemical cleaning/etching; dry wafer cleaning; and environmentally friendly processing.