No single volume has been entirely devoted to the properties of magnetic lenses, so far as I am aware, although of course all the numerous textbooks on electron optics devote space to them. The absence of such a volume, bringing together in formation about the theory and practical design of these lenses, is surprising, for their introduction some fifty years ago has created an entirely new family of commercial instruments, ranging from the now traditional transmission electron microscope, through the reflection and transmission scanning microscopes, to co lumns for micromachining and microlithography, not to mention the host of experi mental devices not available commercially. It therefore seemed useful to prepare an account of the various aspects of mag netic lens studies. These divide naturally into the five chapters of this book: the theoretical background, in which the optical behaviour is described and formu lae given for the various aberration coefficients; numerical methods for calculat ing the field distribution and trajectory tracing; extensive discussion of the paraxial optical properties and aberration coefficients of practical lenses, il lustrated with curves from which numerical information can be obtained; a comple mentary account of the practical, engineering aspects of lens design, including permanent magnet lenses and the various types of superconducting lenses; and final ly, an up-to-date survey of several kinds of highly unconventional magnetic lens, which may well change the appearance of future electron optical instruments very considerably after they cease to be unconventional.

Good,No Highlights,No Markup,all pages are intact, Slight Shelfwear,may have the corners slightly dented, may have slight color changes/slightly damaged spine.

The three volumes in the PRINCIPLES OF ELECTRON OPTICS Series constitute the first comprehensive treatment of electron optics in over forty years. While Volumes 1 and 2 are devoted to geometrical optics, Volume 3 is concerned with wave optics and effects due to wave length. Subjects covered include:Derivation of the laws of electron propagation from SchrUdinger's equationImage formation and the notion of resolutionThe interaction between specimens and electronsImage processingElectron holography and interferenceCoherence, brightness, and the spectral functionTogether, these works comprise a unique and informative treatment of the subject. Volume 3, like its predecessors, will provide readers with both a textbook and an invaluable reference source.

The field of electron and ion optics is based on the analogy between geometrical light optics and the motion of charged particles in electromagnetic fields. The spectacular development of the electron microscope clearly shows the possibilities of image formation by charged particles of wavelength much shorter than that of visible light. As new applications such as particle accelerators, cathode ray tubes, mass and energy spectrometers, microwave tubes, scanning-type analytical instruments, heavy beam technologies, etc. emerged, the scope of particle beam optics has been exten ded to the formation of fine probes. The goal is to concentrate as many particles as possible in as small a volume as possible. Fabrication of microcircuits is a good example of the growing importance of this field. The current trend is towards increased circuit complexity and pattern density. Because of the diffraction limitation of processes using optical photons and the technological difficulties connected with x-ray processes, charged particle beams are becoming popular. With them it is possible to write directly on a wafer under computer control, without using a mask. Focused ion beams offer especially great possibilities in the submicron region. Therefore, electron and ion beam technologies will most probably playa very important role in the next twenty years or so.

This book contains proposals to redesign the scanning electron microscope, so that it is more compatible with other charged particle beam instrumentation and analytical techniques commonly used in surface science research. It emphasizes the concepts underlying spectrometer designs in the scanning electron microscope, and spectrometers are discussed under one common framework so that their relative strengths and weaknesses can be more readily appreciated. This is done, for the most part, through simulations and derivations carried out by the author himself.The book is aimed at scientists, engineers and graduate students whose research area or study in some way involves the scanning electron microscope and/or charged particle spectrometers. It can be used both as an introduction to these subjects and as a guide to more advanced topics about scanning electron microscope redesign.

Focusing of Charged Particles, Volume II presents the aspects of particle optics, including the electron, the ion optical domains, and the accelerator field. This book provides a detailed analysis of the principles of the laws of propagation of beams. Comprised of three parts encompassing three chapters, this volume starts with an overview of how a beam of charged particles traverses a region that is at a uniform, constant, electrostatic potential. This book then discusses the principle of charge repulsion effect by which the space charge of the beam modifies the potential in the region that it traverses. Other chapters examine the general design techniques and performances obtainable for electron guns applicable for use in initiating a beam for linear beam tubes that is given in a condensed form. The last chapter deals with the two stable charged particles that can be accelerated, namely, protons and electrons. This book is a valuable resource to physicists, accelerator experts, and experimenters in search of interactions in the detector target.