Presentations from the Symposium on Low Energy Ion Beam and Plasma Modification of Materials held at the Spring 1991 Materials Research Society Conference.

This book provides a comprehensive introduction to all aspects of low-energy ion–solid interaction from basic principles to advanced applications in materials science. It features a balanced and insightful approach to the fundamentals of the low-energy ion–solid surface interaction, focusing on relevant topics such as interaction potentials, kinetics of binary collisions, ion range, radiation damages, and sputtering. Additionally, the book incorporates key updates reflecting the latest relevant results of modern research on topics such as topography evolution and thin-film deposition under ion bombardment, ion beam figuring and smoothing, generation of nanostructures, and ion beam-controlled glancing angle deposition. Filling a gap of almost 20 years of relevant research activity, this book offers a wealth of information and up-to-date results for graduate students, academic researchers, and industrial scientists working in these areas.

This conference consisted of 15 oral sessions, including three plenary papers covering areas of general interest, 22 specialist invited papers and 51 contributed presentations as well as three poster sessions. There were several scientific highlights covering a diverse spectrum of materials and ion beam processing methods. These included a wide range of conventional and novel applications such as: optical displays and opto-electronics, motor vehicle and tooling parts, coatings tailored for desired properties, studies of fundamental defect properties, the production of novel (often buried) compounds, and treating biomedical materials. The study of nanocrystals produced by ion implantation in a range of host matrices, particularly for opto-electronics applications, was one especially new and exciting development. Despite several decades of study, major progress was reported at the conference in understanding defect evolution in semiconductors and the role of defects in transient impurity diffusion. The use of implantation to tune or isolate optical devices and in forming optically active centres and waveguides in semiconductors, polymers and oxide ceramics was a major focus of several presentations at the conference. The formation of hard coatings by ion assisted deposition or direct implantation was also an area which showed much recent progress. Ion beam techniques had also developed apace, particularly those based on plasma immersion ion implantation or alternative techniques for large area surface treatment. Finally, the use of ion beams for the direct treatment of cancerous tissue was a particularly novel and interesting application of ion beams.

Final report presents review of the experimental data obtained during the first and the second year of the 2-years research effort on Application of Microsecond Plasma Opening Switch (MPOS) Technology for Materials Surface Modification. Following second year programmatic plan, formulated in the conclusion of the 1-st year report we focused our effort on study of aluminum alloys modification (Al2024, 6061, 7075), including enhancement of their corrosion resistance, testing feasibility of treatment of non-planar surfaces, testing new technology of composite film formation (TiAl) and improvement of aluminum alloys bulk fatigue properties. The ion beam parameters used are 250 keV energy, and current and energy densities of 150 A/sq cm and 2.2 J/sq cm, respectively. Characterization of the treated samples showed structural changes to a depth of about +1 micron. We demonstrated factor of 3 enhancement of corrosion resistance for the treated Al alloys samples, as measured by their mass loss. EDAX and Auger analysis of irradiated Al samples with pre-deposited thin Ti films indicate that mixing due to ion beam irradiation occurs to a depth of up to 1 micron. The systematic study on the bulk tensile and fatigue properties of the MPOS treated Al2024, Al7075 alloy samples were carried out both in air and in corrosive media. The measurements indicate no deterioration of the fatigue life time in the air for the MFOS treated samples, compared with non-treated. In the same time significant enhancement of fatigue life time for the treated 7075 alloy in corrosive media (1.5 times higher in fatigue limit) was registered. For the 2024 alloy the enhancement of fatigue lifetime was detectable only for higher stresses.

The current status of the science and technology related to coatings, thin films and surface modifications produced by directed energy techniques is assessed in Materials Surface Processing by Directed Energy Techniques. The subject matter is divided into 20 chapters - each presented at a tutorial level – rich with fundamental science and experimental results. New trends and new results are also evoked to give an overview of future developments and applications. Provides a broad overview on modern coating and thin film deposition techniques, and their applications Presents and discusses various problems of physics and chemistry involved in the production, characterization and applications of coatings and thin films Each chapter includes experimental results illustrating various models, mechanisms or theories

This book, by 36 authorities on the subject, deals with ion beam processing for basic sputter etching of samples, for sputter deposition of thin films, for synthesis of material in thin film form, and of the modification of thin film properties.

Laser and Ion Beam Modification of Materials is a compilation of materials from the proceedings of the symposium U: Material Synthesis and Modification by Ion beams and Laser Beams. This collection discusses the founding of the KANSAI Science City in Japan, and the structures, equipment, and research projects of two institutions are discussed pertaining to eV-MeV ion beams. A description of ion beams as used in materials research and in manufacturing processes, along with trends in ion implantation technology in semiconductors, is discussed. Research into ion beams by China and its industrial uses in non-semiconductor area is noted. For industrial applications, developing technology in terms of high speed, large surface modifications and use of high doses is important. Thus, the development of different ion beam approaches is examined. Industrial applications of ion and laser processing are discussed as cluster beams are used in solid state physics and chemistry. Mention is made on a high power discharge pumped solid state physics (ArF) excimer laser as a potential light source for better material processing. Under ion beam material processing is nanofabrication using focused ion beams, important for research work in mesoscopic systems. Progress in the use of ion-beam mixing using kinetic energy of ion-beams to mingle with pre-deposited surface layers of substrate materials has shown promise. Advanced materials researchers and scientists, as well as academicians in the field of nuclear physics, will find this collection helpful.