TO THE SECOND EDITION In the nine years since this book was first written, rapid progress has been made scientifically in nuclear fusion, space physics, and nonlinear plasma theory. At the same time, the energy shortage on the one hand and the exploration of Jupiter and Saturn on the other have increased the national awareness of the important applications of plasma physics to energy production and to the understanding of our space environment. In magnetic confinement fusion, this period has seen the attainment 13 of a Lawson number nTE of 2 x 10 cm -3 sec in the Alcator tokamaks at MIT; neutral-beam heating of the PL T tokamak at Princeton to KTi = 6. 5 keV; increase of average ß to 3%-5% in tokamaks at Oak Ridge and General Atomic; and the stabilization of mirror-confined plasmas at Livermore, together with injection of ion current to near field-reversal conditions in the 2XIIß device. Invention of the tandem mirror has given magnetic confinement a new and exciting dimension. New ideas have emerged, such as the compact torus, surface-field devices, and the EßT mirror-torus hybrid, and some old ideas, such as the stellarator and the reversed-field pinch, have been revived. Radiofrequency heat ing has become a new star with its promise of dc current drive. Perhaps most importantly, great progress has been made in the understanding of the MHD behavior of toroidal plasmas: tearing modes, magnetic Vll Vlll islands, and disruptions.

Plasma processing of semiconductors is an interdisciplinary field requiring knowledge of both plasma physics and chemical engineering. The two authors are experts in each of these fields, and their collaboration results in the merging of these fields with a common terminology. Basic plasma concepts are introduced painlessly to those who have studied undergraduate electromagnetics but have had no previous exposure to plasmas. Unnecessarily detailed derivations are omitted; yet the reader is led to understand in some depth those concepts, such as the structure of sheaths, that are important in the design and operation of plasma processing reactors. Physicists not accustomed to low-temperature plasmas are introduced to chemical kinetics, surface science, and molecular spectroscopy. The material has been condensed to suit a nine-week graduate course, but it is sufficient to bring the reader up to date on current problems such as copper interconnects, low-k and high-k dielectrics, and oxide damage. Students will appreciate the web-style layout with ample color illustrations opposite the text, with ample room for notes. This short book is ideal for new workers in the semiconductor industry who want to be brought up to speed with minimum effort. It is also suitable for Chemical Engineering students studying plasma processing of materials; Engineers, physicists, and technicians entering the semiconductor industry who want a quick overview of the use of plasmas in the industry.

The aim of this book is twofold: to provide an introduction for newcomers to state of the art computer simulation techniques in space plasma physics and an overview of current developments. Computer simulation has reached a stage where it can be a highly useful tool for guiding theory and for making predictions of space plasma phenomena, ranging from microscopic to global scales. The various articles are arranged, as much as possible, according to the - derlying simulation technique, starting with the technique that makes the least number of assumptions: a fully kinetic approach which solves the coupled set of Maxwell’s equations for the electromagnetic ?eld and the equations of motion for a very large number of charged particles (electrons and ions) in this ?eld. Clearly, this is also the computationally most demanding model. Therefore, even with present day high performance computers, it is the most restrictive in terms of the space and time domain and the range of particle parameters that can be covered by the simulation experiments. It still makes sense, therefore, to also use models, which due to their simp- fying assumptions, seem less realistic, although the e?ect of these assumptions on the outcome of the simulation experiments needs to be carefully assessed.

Plasma Physics: Confinement, Transport and Collective Effects provides an overview of modern plasma research with special focus on confinement and related issues. Beginning with a broad introduction, the book leads graduate students and researchers – also those from related fields - to an understanding of the state-of-the-art in modern plasma physics. Furthermore, it presents a methodological cross section ranging from plasma applications and plasma diagnostics to numerical simulations, the latter providing an increasingly important link between theory and experiment. Effective references guide the reader from introductory texts through to contemporary research. Some related exercises in computational plasma physics are supplied on a special web site

The aim of this book is to offer to the next generation of young researchers a broad and largely self-contained introduction to the physics of heavy ion collisions and the quark-gluon plasma, providing material beyond that normally found in the available textbooks. For each of the main aspects - QCD thermodynamics and global features of the QGP, collision hydrodynamics, electromagnetic probes, jet and quarkonium production, color glass condensate, and the gravity connection - the present volume provides extensive and pedagogical lectures, surveying the present status of both theory and experiment. A particular feature of this volume is that all lectures have been written with the active assistance of selected students present at the course in order to ensure the adequate level and coverage for the intended readership.

Introduction to Plasma Physics is the standard text for an introductory lecture course on plasma physics. The text’s six sections lead readers systematically and comprehensively through the fundamentals of modern plasma physics. Sections on single-particle motion, plasmas as fluids, and collisional processes in plasmas lay the groundwork for a thorough understanding of the subject. The authors take care to place the material in its historical context for a rich understanding of the ideas presented. They also emphasize the importance of medical imaging in radiotherapy, providing a logical link to more advanced works in the area. The text includes problems, tables, and illustrations as well as a thorough index and a complete list of references.

Plasma is usually said to be a gas of charged particles. Taken as it is, this definition isnot especially useful and, in many cases, proves to be wrong. Yet, two basic necessary(but not sufficient) properties of the plasma are: a) presence of freely moving chargedparticles, and b) large number of these particles. Plasma does not have to consists ofcharged particles only, neutrals may be present as well, and their relative number wouldaffect the features of the system. For the time being, we, however, shall concentrate onthe charged component only