Ion Beam Handbook for Material Analysis emerged from the U.S.-Italy Seminar on Ion Beam Analysis of Near Surface Regions held at the Baia-Verde Hotel, Catania, June 17-20, 1974. The seminar was sponsored by the National Science Foundation and the Consiglio Nazionale delle Ricerche under the United States-Italy Cooperative Science Program. The book provides a useful collection of tables, graphs, and formulas for those involved in ion beam analysis. These tables, graphs, and formulas are divided into five chapters that cover the following topics: energy loss and energy straggling; backscattering spectrometry; channeling; applications of ion-induced nuclear reactions; and the use of ion-induced X-ray yields.

The Handbook of Modern Ion Beam Materials Analysis, 2nd Edition is a compilation of updated techniques and data for use in the ion-beam analysis of materials. The information presented is unavailable collectively from any other source, and places a strong emphasis on practical examples of the analysis techniques as they are applied to common problems. Revised and updated from the popular handbook previously released in 1995, this edition is written and compiled by over 30 leading authorities in the field of ion beam analysis. It provides an excellent introduction to the fundamentals and lab practices of ion beam analysis and is also useful as a teaching text for undergraduate senior or first-year graduate students This text is a comprehensive collection of nuclear and atomic data for the applications of ion beam materials analysis. In addition, the DVD includes bonus info - both the Ion Beam Analysis Nuclear Data Library (IBANDL) and GUPIX Subroutines (CSA and YLS) for X-ray Database.

The Handbook of Modern Ion Beam Materials Analysis is a compilation of updated techniques and data for use in the ion-beam analysis of materials. The information presented is unavailable collectively from any other source, and places a strong emphasis on practical examples of the analysis techniques as they are applied to common problems. The book's 13 chapters cover discussions and examples, while 18 appendices provide extensive compilations of relevant data. Numerous techniques are discussed, including elastic recoil detection and activation analysis. Material in the book pushes the boundaries of ion-beam analysis to higher energies. The detection of light elements is emphasized, and background materials in the areas of energy loss, nuclear theory, instrumentation, analysis pitfalls and radiation safety are also provided for a better understanding of the principles basic to the techniques.

The use of ion beams for materials analysis involves many different ion-atom interaction processes which previously have largely been considered in separate reviews and texts. A list of books and conference proceedings is given in Table 2. This book is divided into three parts, the first which treats all ion beam techniques and their applications in such diverse fields as materials science, thin film and semiconductor technology, surface science, geology, biology, medicine, environmental science, archaeology and so on.

A comprehensive review of ion beam application in modern materials research is provided, including the basics of ion beam physics and technology. The physics of ion-solid interactions for ion implantation, ion beam synthesis, sputtering and nano-patterning is treated in detail. Its applications in materials research, development and analysis, developments of special techniques and interaction mechanisms of ion beams with solid state matter result in the optimization of new material properties, which are discussed thoroughly. Solid-state properties optimization for functional materials such as doped semiconductors and metal layers for nano-electronics, metal alloys, and nano-patterned surfaces is demonstrated. The ion beam is an important tool for both materials processing and analysis. Researchers engaged in solid-state physics and materials research, engineers and technologists in the field of modern functional materials will welcome this text.

Our intention has been to write a book that would be useful to people with a variety of levels of interest in this subject. Clearly it should be useful to both graduate students and workers in the field. We have attempted to bring together many of the concepts used in channeling beam analysis with an indication of the origin of the ideas within fundamental channeling theory. The level of the book is appropriate to senior under-graduates and graduate students who have had a modern physics course work in related areas of materials science and wish to learn more about the "channeling" probe, its strengths, weaknesses, and areas of further potential application. To them we hope we have explained this apparent paradox of using mega-electron volt ions to probe solid state phenomena that have characteristic energies of electron volts.

This book highlights the application of Time-of-Flight Secondary Ion Mass Spectrometry (ToF-SIMS) for high-resolution surface analysis and characterization of materials. While providing a brief overview of the principles of SIMS, it also provides examples of how dual-beam ToF-SIMS is used to investigate a range of materials systems and properties. Over the years, SIMS instrumentation has dramatically changed since the earliest secondary ion mass spectrometers were first developed. Instruments were once dedicated to either the depth profiling of materials using high-ion-beam currents to analyse near surface to bulk regions of materials (dynamic SIMS), or time-of-flight instruments that produced complex mass spectra of the very outer-most surface of samples, using very low-beam currents (static SIMS). Now, with the development of dual-beam instruments these two very distinct fields now overlap.