This book highlights a high-density helicon plasma source produced by radio frequency excitation in the presence of magnetic fields, which has attracted considerable attention thanks to its wide applicability in various fields, from basic science to industrial use. Presenting specific applications such as plasma thrusters, nuclear fusion, and plasma processing, it offers a review of modern helicon plasma science for a broad readership. The book covers a wide range of topics, including the fundamental physics of helicon plasma and their cutting-edge applications, based on his abundant and broad experience from low to high temperature plasmas, using various linear magnetized machines and nuclear fusion ones such as tokamaks and reversed field pinches. It first provides a brief overview of the field and a crash course on the fundamentals of plasma, including miscellaneous diagnostics, for advanced undergraduate and early graduate students in plasma science, and presents the basics of helicon plasma for beginners in the field. Further, digesting advanced application topics is also useful for experts to have a quick overview of extensive helicon plasma science research.

This book describes the design, physics, and performance of high density plasma sources which have been extensively explored in low pressure plasma processing, such as plasma etching and planarization, plasma enhanced chemical vapor deposition of thin films, sputtered deposition of metals and dielectrics, epitaxial growth of silicon and GaAs, and many other applications. This is a comprehensive survey and a detailed description of most advanced high density plasma sources used in plasma processing. The book is a balanced presentation in that it gives both a theoretical treatment and practical applications. It should be of considerable interest to scientists and engineers working on plasma source design, and process development.

In this new book, an interdisciplinary and international team of experts provides an exploration of the emerging plasma science that is poised to make the plasma technology a reality in the manufacturing sector. The research presented here will stimulate new ideas, methods, and applications in the field of plasma science and nanotechnology. Plasma technology applications are being developed that could impact the global market for power, electronics, mineral, and other fuel commodities. Currently, plasma science is described as a revolutionary discipline in terms of its possible impact on industrial applications. It offers potential solutions to many problems using emerging techniques. In this book the authors provide a broad overview of recent trends in field plasma science and nanotechnology. Divided into several parts, Plasma and Fusion Science: From Fundamental Research to Technological Applications explores some basic plasma applications and research, space and atmospheric plasma, nuclear fusion, and laser plasma and industrial applications of plasma. A wide variety of cutting-edge topics are covered, including: • basic plasma physics • computer modeling for plasma • exotic plasma (including dusty plasma) • industrial plasma applications • laser plasma • nuclear fusion technology • plasma diagnostics • plasma processing • pulsed power • space astrophysical plasma • plasma and nanotechnology Pointing to current and possible future developments in plasma science and technology, the diverse research presented here will be valuable for researchers, scientists, industry professionals, and others involved in the revolutionary field of plasma and fusion science.

This complete introduction to plasma physics and controlled fusion by one of the pioneering scientists in this expanding field offers both a simple and intuitive discussion of the basic concepts of this subject and an insight into the challenging problems of current research. In a wholly lucid manner the work covers single-particle motions, fluid equations for plasmas, wave motions, diffusion and resistivity, Landau damping, plasma instabilities and nonlinear problems. For students, this outstanding text offers a painless introduction to this important field; for teachers, a large collection of problems; and for researchers, a concise review of the fundamentals as well as original treatments of a number of topics never before explained so clearly. This revised edition contains new material on kinetic effects, including Bernstein waves and the plasma dispersion function, and on nonlinear wave equations and solitons. For the third edition, updates was made throughout each existing chapter, and two new chapters were added; Ch 9 on “Special Plasmas” and Ch 10 on Plasma Applications (including Atmospheric Plasmas).

This book describes the design, physics, and performance of high density plasma sources which have been extensively explored in low pressure plasma processing, such as plasma etching and planarization, plasma enhanced chemical vapor deposition of thin films, sputtered deposition of metals and dielectrics, epitaxial growth of silicon and GaAs, and many other applications. This is a comprehensive survey and a detailed description of most advanced high density plasma sources used in plasma processing.

This book presents a comprehensive description of the most promising high density plasma sources operated at low and intermediate pressures which are used, or could be used, in plasma processing such as etching and deposition. The authors are the leading experts in the field who are original inventors and designers of plasma sources they describe in this book. This book gives a balanced treatment of both the theoretical aspects and practical applications. It should be of considerable interest to scientists and engineers working on plasma source designs and process developments.

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