Pattern transfer by dry etching and plasma-enhanced chemical vapor de position are two of the cornerstone techniques for modern integrated cir cuit fabrication. The success of these methods has also sparked interest in their application to other techniques, such as surface-micromachined sen sors, read/write heads for data storage and magnetic random access memory (MRAM). The extremely complex chemistry and physics of plasmas and their interactions with the exposed surfaces of semiconductors and other materi als is often overlooked at the manufacturing stage. In this case, the process is optimized by an informed "trial-and-error" approach which relies heavily on design-of-experiment techniques and the intuition of the process engineer. The need for regular cleaning of plasma reactors to remove built-up reaction or precursor gas products adds an extra degree of complexity because the interaction of the reactive species in the plasma with the reactor walls can also have a strong effect on the number of these species available for etching or deposition. Since the microelectronics industry depends on having high process yields at each step of the fabrication process, it is imperative that a full understanding of plasma etching and deposition techniques be achieved.

This book, by 36 authorities on the subject, deals with ion beam processing for basic sputter etching of samples, for sputter deposition of thin films, for synthesis of material in thin film form, and of the modification of thin film properties.

This book covers all aspects of physical vapor deposition (PVD) process technology from the characterizing and preparing the substrate material, through deposition processing and film characterization, to post-deposition processing. The emphasis of the book is on the aspects of the process flow that are critical to economical deposition of films that can meet the required performance specifications. The book covers subjects seldom treated in the literature: substrate characterization, adhesion, cleaning and the processing. The book also covers the widely discussed subjects of vacuum technology and the fundamentals of individual deposition processes. However, the author uniquely relates these topics to the practical issues that arise in PVD processing, such as contamination control and film growth effects, which are also rarely discussed in the literature. In bringing these subjects together in one book, the reader can understand the interrelationship between various aspects of the film deposition processing and the resulting film properties. The author draws upon his long experience with developing PVD processes and troubleshooting the processes in the manufacturing environment, to provide useful hints for not only avoiding problems, but also for solving problems when they arise. He uses actual experiences, called ""war stories"", to emphasize certain points. Special formatting of the text allows a reader who is already knowledgeable in the subject to scan through a section and find discussions that are of particular interest. The author has tried to make the subject index as useful as possible so that the reader can rapidly go to sections of particular interest. Extensive references allow the reader to pursue subjects in greater detail if desired. The book is intended to be both an introduction for those who are new to the field and a valuable resource to those already in the field. The discussion of transferring technology between R&D and manufacturing provided in Appendix 1, will be of special interest to the manager or engineer responsible for moving a PVD product and process from R&D into production. Appendix 2 has an extensive listing of periodical publications and professional societies that relate to PVD processing. The extensive Glossary of Terms and Acronyms provided in Appendix 3 will be of particular use to students and to those not fully conversant with the terminology of PVD processing or with the English language.

The scientific and commercial purposes of ion beams are remarkable in many fields because ion beam technology is a primary tool that provides a wide range of applications in science, medicine, space, and engineering. This book presents theoretical and experimental knowledge about ion beam applications and technology. It includes six chapters that address such topics as the interaction of ion beams with matter, the evaluation of nuclear material damage, surface microstructure changes, oblique Ar+ sputtered SiC thin films, electron beam processing, and ribbon ion beams.

The Handbook of Thin Film Process Technology is a practical handbook for the thin film scientist, engineer and technician. This handbook is regularly updated with new material, and this volume presents additional recipe-type information (i.e. important deposition system details and process parameters) for optical materials.

Ion Beam Treatment of Polymers, Second Edition presents the results of polymer investigations and technique development in the field of polymer modification by high-energy ion beams. It shows how to use ion beam equipment in the polymer industry, as well as how to use it to produce new polymer materials. The authors, scientists and researchers active in the field, provide analysis and data from their work, and give an overview of related work by others. The authors focus on wetting, adhesion, hardness, chemical activity, environmental stability, biocompatibility, new synthesis methods, and space flight construction. The technologies of material modification by a beam of high energy ions have wide applications in different fields, from microelectronics to medicine. Historically, ion beam treatment of polymers had fewer applications due to high costs of ion beam equipment and low costs of polymer materials. The modern development of new pulse sources with a high current density and wide ion beams increase the effectiveness of ion beam technology for polymers. - Collates data from many scientists working in polymer chemistry, physics of ion beam implantation, and in development and production of ion beam equipment - Covers industrial and scientific applications of ion beam implanted polymers - Integrates physical and chemical aspects of the processes in polymers treated by ion beams

This 3e, edited by Peter M. Martin, PNNL 2005 Inventor of the Year, is an extensive update of the many improvements in deposition technologies, mechanisms, and applications. This long-awaited revision includes updated and new chapters on atomic layer deposition, cathodic arc deposition, sculpted thin films, polymer thin films and emerging technologies. Extensive material was added throughout the book, especially in the areas concerned with plasma-assisted vapor deposition processes and metallurgical coating applications.