Growth and Characterization of Epitaxial Films and Magnetic Multilayers Grown by Dc Sputtering

Growth and Characterization of Epitaxial Films and Magnetic Multilayers Grown by Dc Sputtering
Title Growth and Characterization of Epitaxial Films and Magnetic Multilayers Grown by Dc Sputtering PDF eBook
Author Reza Loloee
Publisher
Pages 486
Release 2000
Genre Epitaxy
ISBN

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Epitaxial Growth and Characterization of Thin Films and Superlattices of Wide Band Gap II-VI Semiconductors Grown by Pulsed Laser Deposition

Epitaxial Growth and Characterization of Thin Films and Superlattices of Wide Band Gap II-VI Semiconductors Grown by Pulsed Laser Deposition
Title Epitaxial Growth and Characterization of Thin Films and Superlattices of Wide Band Gap II-VI Semiconductors Grown by Pulsed Laser Deposition PDF eBook
Author Shengxi Duan
Publisher
Pages 142
Release 1994
Genre Epitaxy
ISBN

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Fabrication and Characterization of Epitaxial Thin Films and Multilayers of La2/3ca1/3mno3 and Yba2cu3oy

Fabrication and Characterization of Epitaxial Thin Films and Multilayers of La2/3ca1/3mno3 and Yba2cu3oy
Title Fabrication and Characterization of Epitaxial Thin Films and Multilayers of La2/3ca1/3mno3 and Yba2cu3oy PDF eBook
Author 金通利
Publisher Open Dissertation Press
Pages
Release 2017-01-27
Genre
ISBN 9781374768574

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This dissertation, "Fabrication and characterization of epitaxial thin films and multilayers of La2/3Ca1/3MnO3 and YBa2Cu3Oy" by 金通利, Tung-Lee, Tony, Kam, was obtained from The University of Hong Kong (Pokfulam, Hong Kong) and is being sold pursuant to Creative Commons: Attribution 3.0 Hong Kong License. The content of this dissertation has not been altered in any way. We have altered the formatting in order to facilitate the ease of printing and reading of the dissertation. All rights not granted by the above license are retained by the author. DOI: 10.5353/th_b3122613 Subjects: Thin films - Design

Growth and Characterization of Epitaxial Oxide Thin Films

Growth and Characterization of Epitaxial Oxide Thin Films
Title Growth and Characterization of Epitaxial Oxide Thin Films PDF eBook
Author Ashish Garg
Publisher
Pages
Release 2001
Genre
ISBN

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Epitaxial oxide thin films are used in many technologically important device applications. This work deals with the deposition and characterization of epitaxial WO3 and SrBi2Ta2O9 (SBT) thin films on single crystal oxide substrates. WO3 thin films were chosen as a subject of study because of recent findings of superconductivity at surfaces and twin boundaries in the bulk form of this oxide. Highly epitaxial thin films would be desirable in order to be able to create a device within a film without patterning it, by locally creating superconducting regions (e.g. twins) within an otherwise defect free film by reducing or doping the film with Na. Films were deposited by reactive magnetron sputtering at various temperatures on single crystal SrTiO3 (100) and R-sapphire substrates. X-ray diffraction studies showed that the optimised films were highly (001) oriented, quality of epitaxy improving with decreasing deposition temperature. AFM studies revealed columnar growth of these films. Films were heat treated with Na vapour in order to reduce or dope them with Na. Low temperature measurements of the reduced films did not show existence of any superconductivity. SBT is a ferroelectric oxide and its thin films are attractive candidates for non-volatile ferroelectric random access memory (FRAM) applications. High structural anisotropy leads to a high degree of anisotropy in its ferroelectric properties which makes it essential to study epitaxial SBT films of different orientations. In this study, SBT films of different orientations were deposited on different single crystal substrates by pulsed laser ablation. Highly epitaxial c-axis oriented and smooth SBT films were deposited on SrTiO3 (100) substrates. AFM studies revealed the growth of these films by 3-D Stranski-Krastanov mode. However, these films did not exhibit any ferroelectric activity. Highly epitaxial (116)-oriented films were deposited on SrTiO3 (110) substrates. These films were also very smooth with root mean square (RMS) roughness of 15-20 Å. Films deposited on TiO2 (110) were partially a-/b-axis oriented and showed the formation of c-axis oriented SBT and many impurities. Completely a-/b-axis oriented SBT films were deposited on LaSrAlO4 (110) substrates. Films deposited at non-optimal growth temperatures showed the formation of many impurities. Attempts were also made towards depositing Sr2RuO4 films on LaSrAlO4 (110) substrates, which can act as a bottom electrode for ferroelectric SBT films.

Structural Studies of GMR Magnetic Multilayers and Spin-valves Grown by DC Sputtering

Structural Studies of GMR Magnetic Multilayers and Spin-valves Grown by DC Sputtering
Title Structural Studies of GMR Magnetic Multilayers and Spin-valves Grown by DC Sputtering PDF eBook
Author Hong Geng
Publisher
Pages 386
Release 2002
Genre Magnetoresistance
ISBN

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Quantitative and Analytical High-resolution Transmission Electron Microscopy Study of Epitaxial Co/Cu GMR Multilayers

Quantitative and Analytical High-resolution Transmission Electron Microscopy Study of Epitaxial Co/Cu GMR Multilayers
Title Quantitative and Analytical High-resolution Transmission Electron Microscopy Study of Epitaxial Co/Cu GMR Multilayers PDF eBook
Author John William Heckman
Publisher
Pages 310
Release 2002
Genre Cobalt
ISBN

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Characterization of Epitaxial CdTe and PbTe Layers Grown by R.F. Magnetron Sputtering

Characterization of Epitaxial CdTe and PbTe Layers Grown by R.F. Magnetron Sputtering
Title Characterization of Epitaxial CdTe and PbTe Layers Grown by R.F. Magnetron Sputtering PDF eBook
Author Goutam Mukherjee
Publisher
Pages 166
Release 1989
Genre Magnetrons
ISBN

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Hall measurements on sputter-deposited epitaxial PbTe films have confirmed that samples prepared at high growth temperatures are n-type and those grown at low substrate temperatures are p-type, irrespective of the substrate bias applied during growth. The low temperature mobility values in the sputter-deposited samples are found to be limited by a temperature-independent neutral impurity scattering mechanism. One of the features of heteroepitaxial growth is the existence of a large density of structural defects at the interface due to lattice mismatch. (Abstract shortened by UMI.).