In this thesis, two major modifications to an ultra-high-vacuum scanning tunneling microscope system are described: an update to the cooling plate structure for more effective cooling of the dipstick and sample holder, and the installation of a capillary doser for concentrating the precursor gas to the tip-ample junction during silicon nanostructure growth. The updated cooling plate is able to shorten the total sample preparation time from 6 hours to 3 hours. The capillary doser lowers the base pressure during the silicon growth experiment by two orders of magnitude. The system operation after the system modification was tested. The system is now ready for subsequent silicon nanostructure growth using disilane gas.