From materials science to integrated circuit development, much of modern technology is moving from the microscale toward the nanoscale. This book focuses on the fundamental physics underlying innovative techniques for analyzing surfaces and near-surfaces. New analytical techniques have emerged to meet these technological requirements, all based on a few processes that govern the interactions of particles and radiation with matter. This book addresses the fundamentals and application of these processes, from thin films to field effect transistors.

Chemical Imaging Analysis covers the advancements made over the last 50 years in chemical imaging analysis, including different analytical techniques and the ways they were developed and refined to link the composition and structure of manmade and natural materials at the nano/micro scale to the functional behavior at the macroscopic scale. In a development process that started in the early 1960s, a variety of specialized analytical techniques was developed – or adapted from existing techniques – and these techniques have matured into versatile and powerful tools for visualizing structural and compositional heterogeneity. This text explores that journey, providing a general overview of imaging techniques in diverse fields, including mass spectrometry, optical spectrometry including X-rays, electron microscopy, and beam techniques. - Provides comprehensive coverage of analytical techniques used in chemical imaging analysis - Explores a variety of specialized techniques - Provides a general overview of imaging techniques in diverse fields

This book is an introduction to the basics of surface science. The Nobel Prize winner Wolfgang Pauli's statement, 'God made solids, but surfaces were the work of the devil!' emphasizes the diabolic nature of surfaces. Surfaces are the external border of materials to the external worlds, thus by exploring surfaces one can investigate the material. In the last few decades new and exciting surface properties have been explored in nanomaterials, low-dimensional structures in electronic and photonic devices and other numerous applications.

An updated fourth edition of the text that provides an understanding of chemical transformations and the formation of structures at surfaces The revised and enhanced fourth edition of Surface Science covers all the essential techniques and phenomena that are relevant to the field. The text elucidates the structural, dynamical, thermodynamic and kinetic principles concentrating on gas/solid and liquid/solid interfaces. These principles allow for an understanding of how and why chemical transformations occur at surfaces. The author (a noted expert on in the field) combines the required chemistry, physics and mathematics to create a text that is accessible and comprehensive. The fourth edition incorporates new end-of-chapter exercises, the solutions to which are available on-line to demonstrate how problem solving that is relevant to surface science should be performed. Each chapter begins with simple principles and builds to more advanced ones. The advanced topics provide material beyond the introductory level and highlight some frontier areas of study. This updated new edition: Contains an expanded treatment of STM and AFM as well as super-resolution microscopy Reviews advances in the theoretical basis of catalysis and the use of activity descriptors for rational catalyst design Extends the discussion of two-dimensional solids to reflect remarkable advances in their growth and characterization Delves deeper into the surface science of electrochemistry and charge transfer reactions Updates the “Frontiers and Challenges” sections at the end of each chapter as well as the list of references Written for students, researchers and professionals, the fourth edition of Surface Science offers a revitalized text that contains the tools and a set of principles for understanding the field. Instructor support material, solutions and PPTs of figures, are available at http://booksupport.wiley.com

Ion Beam Analysis: Fundamentals and Applications explains the basic characteristics of ion beams as applied to the analysis of materials, as well as ion beam analysis (IBA) of art/archaeological objects. It focuses on the fundamentals and applications of ion beam methods of materials characterization.The book explains how ions interact with solids

Nanoelectronics is changing the way the world communicates, and is transforming our daily lives. Continuing Moore’s law and miniaturization of low-power semiconductor chips with ever-increasing functionality have been relentlessly driving R&D of new devices, materials, and process capabilities to meet performance, power, and cost requirements. This book covers up-to-date advances in research and industry practices in nanometrology, critical for continuing technology scaling and product innovation. It holistically approaches the subject matter and addresses emerging and important topics in semiconductor R&D and manufacturing. It is a complete guide for metrology and diagnostic techniques essential for process technology, electronics packaging, and product development and debugging—a unique approach compared to other books. The authors are from academia, government labs, and industry and have vast experience and expertise in the topics presented. The book is intended for all those involved in IC manufacturing and nanoelectronics and for those studying nanoelectronics process and assembly technologies or working in device testing, characterization, and diagnostic techniques.

Molecular Beam Epitaxy (MBE): From Research to Mass Production, Second Edition, provides a comprehensive overview of the latest MBE research and applications in epitaxial growth, along with a detailed discussion and 'how to' on processing molecular or atomic beams that occur on the surface of a heated crystalline substrate in a vacuum. The techniques addressed in the book can be deployed wherever precise thin-film devices with enhanced and unique properties for computing, optics or photonics are required. It includes new semiconductor materials, new device structures that are commercially available, and many that are at the advanced research stage. This second edition covers the advances made by MBE, both in research and in the mass production of electronic and optoelectronic devices. Enhancements include new chapters on MBE growth of 2D materials, Si-Ge materials, AIN and GaN materials, and hybrid ferromagnet and semiconductor structures. - Condenses the fundamental science of MBE into a modern reference, speeding up literature review - Discusses new materials, novel applications and new device structures, grounding current commercial applications with modern understanding in industry and research - Includes coverage of MBE as mass production epitaxial technology and how it enhances processing efficiency and throughput for the semiconductor industry and nanostructured semiconductor materials research community