This volume deals with the basic knowledge and understanding of fundamental interactions of low energy electrons with molecules. It pro vides an up-to-date and comprehensive account of the fundamental in teractions of low-energy electrons with molecules of current interest in modern technology, especially the semiconductor industry. The primary electron-molecule interaction processes of elastic and in elastic electron scattering, electron-impact ionization, electron-impact dissociation, and electron attachment are discussed, and state-of-the art authoritative data on the cross sections of these processes as well as on rate and transport coefficients are provided. This fundamental knowledge has been obtained by us over the last eight years through a critical review and comprehensive assessment of "all" available data on low-energy electron collisions with plasma processing gases which we conducted at the National Institute of Standards and Technology (NIST). Data from this work were originally published in the Journal of Physical and Chemical Reference Data, and have been updated and expanded here. The fundamental electron-molecule interaction processes are discussed in Chapter 1. The cross sections and rate coefficients most often used to describe these interactions are defined in Chapter 2, where some recent advances in the methods employed for their measurement or calculation are outlined. The methodology we adopted for the critical evaluation, synthesis, and assessment of the existing data is described in Chapter 3. The critically assessed data and recommended or suggested cross sections and rate and transport coefficients for ten plasma etching gases are presented and discussed in Chapters 4, 5, and 6.

With the constant emergence of new research and application possibilities, gaseous electronics is more important than ever in disciplines including engineering (electrical, power, mechanical, electronics, and environmental), physics, and electronics. The first resource of its kind, Gaseous Electronics: Tables, Atoms, and Molecules fulfills the author’s vision of a stand-alone reference to condense 100 years of research on electron-neutral collision data into one easily searchable volume. It presents most—if not all—of the properly classified experimental results that scientists, researchers, and students require for a theoretical and practical understanding of collision properties and their impact. An unprecedented collection and analysis of electron neutral collision properties This book follows a new user-friendly format that enables readers to easily retrieve, analyze, and apply specific atomic/molecular information as needed. In his previous work, Gaseous Electronics: Theory and Practice, the author first explored electron–neutron interactions. To clarify the complex fundamental processes involved, he cited as much experimental data on atoms and molecules as limited space would allow. Completing that task, this handy reference more fully compiles essential revised data on more than 420 atoms and molecules, arranging it into easily digestible chapters, sections, and appendices. Analysis parameters include total scattering, ionization, excitation, attachment cross sections, ionization and attachment coefficients, attachment rates, and ion drift velocity. Some recent research areas in gaseous electronics include: Environmentally efficient and protective lighting devices Plasma research for power generation and space applications Medical applications (some involving skin treatment and healing) Written entirely in SI units, the book includes hundreds of tables, figures, and specially drawn charts, with data expressed in both tabular and graphical form. Each chapter stands independently and contains references for further research.

Covers quantum scattering theories, experimental and theoretical calculations and applications in a comprehensive manner.

NONTHERMAL PLASMAS FOR MATERIALS PROCESSING This unique book covers the physical and chemical aspects of plasma chemistry with polymers and gives new insights into the interaction of physics and chemistry of nonthermal plasmas and their applications in materials science for physicists and chemists. The properties and characteristics of plasmas, elementary (collision) processes in the gas phase, plasma surface interactions, gas discharge plasmas and technical plasma sources, atmospheric plasmas, plasma diagnostics, polymers and plasmas, plasma polymerization, post-plasma processes, plasma, and wet-chemical processing, plasma-induced generation of functional groups, and the chemical reactions on these groups along with a few exemplary applications are discussed in this comprehensive but condensed state-of-the-art book on plasma chemistry and its dependence on plasma physics. While plasma physics, plasma chemistry, and polymer science are often handled separately, the aim of the authors is to harmoniously join the physics and chemistry of low-pressure and atmospheric-pressure plasmas with polymer surface chemistry and polymerization and to compare such chemistry with classic chemistry. Readers will find in these chapters Interaction of plasma physics and chemistry in plasmas and at the surface of polymers; Explanation and interpretation of physical and chemical mechanisms on plasma polymerization and polymer surface modification; Introduction of modern techniques in plasma diagnostics, surface analysis of solids, and special behavior of polymers on exposure to plasmas; Discussion of the conflict of energy-rich plasma species with permanent energy supply and the much lower binding energies in polymers and alternatives to avoid random polymer decomposition Technical applications such as adhesion, cleaning, wettability, textile modification, coatings, films, etc. New perspectives are explained about how to use selective and mild processes to allow post-plasma chemistry on non-degraded polymer surfaces. Audience Physicists, polymer chemists, materials scientists, industrial engineers in biomedicine, coatings, printing, etc.

Advances in Atomic, Molecular, and Optical Physics, Volume 66 provides a comprehensive compilation of recent developments in a field that is in a state of rapid growth. New to this volume are chapters devoted to 2D Coherent Spectroscopy of Electronic Transitions, Nonlinear and Quantum Optical Properties and Applications of Intense Twin-Beams, Non-classical Light Generation from III-V and Group-IV Solid-State Cavity Quantum Systems, Trapping Atoms with Radio Frequency Adiabatic Potentials, Quantum Control of Optomechanical Systems, and Efficient Description of Bose–Einstein Condensates in Time-Dependent Rotating Traps. With timely articles written by distinguished experts that contain relevant review materials and detailed descriptions of important developments in the field, this series is a must have for those interested in the variety of topics covered. - Presents the work of international experts in the field - Contains comprehensive articles that compile recent developments in a field that is experiencing rapid growth, with new experimental and theoretical techniques emerging - Ideal for users interested in optics, excitons, plasmas, and thermodynamics - Topics covered include atmospheric science, astrophysics, surface physics, and laser physics, amongst others

Building on Mozumder's and Hatano's Charged Particle and Photon Interactions with Matter: Chemical, Physicochemical, and Biological Consequences with Applications (CRC Press, 2004), Charged Particle and Photon Interactions with Matter: Recent Advances, Applications, and Interfaces expands upon the scientific contents of the previous volume by cover

In addition to introducing the basics of plasma physics, Nonthermal Plasma Chemistry and Physics is a comprehensive presentation of recent developments in the rapidly growing field of nonthermal plasma chemistry. The book offers a detailed discussion of the fundamentals of plasma chemical reactions and modeling, nonthermal plasma sources, relevant diagnostic techniques, and selected applications. Elucidating interconnections and trends, the book focuses on basic principles and illustrations across a broad field of applications. Expert contributors address environmental aspects of plasma chemistry. The book also includes selected plasma conditions and specific applications in volume plasma chemistry and treatment of material surfaces such as plasma etching in microelectronics, chemical modification of polymer surfaces and deposition of functional thin films. Designed for students of plasma physics, Nonthermal Plasma Chemistry and Physics is a concise resource also for specialists in this and related fields of research.