Laser ablation refers to the phenomenon in which a low wavelength and short pulse (ns-fs) duration of laser beam irradiates the surface of a target to induce instant local vaporization of the target material generating a plasma plume consisting of photons, electrons, ions, atoms, molecules, clusters, and liquid or solid particles. This book covers various aspects of using laser ablation phenomenon for material processing including laser ablation applied for the deposition of thin films, for the synthesis of nanomaterials, and for the chemical compositional analysis and surface modification of materials. Through the 18 chapters written by experts from international scientific community, the reader will have access to the most recent research and development findings on laser ablation through original research studies and literature reviews.

Optoelectronics - Advanced Device Structures (Book IV) is following the Optoelectronics (Books I, II, and III) published in 2011, 2013, and 2015, as part of the InTech collection of international works on optoelectronics. Accordingly, as with the first three books of the collection, this book covers recent achievements by specialists around the world. The growing number of countries participating in this endeavor as well as joint participation of the US and Moldova scientists in edition of this book testifies to the unifying effect of science. An interested reader will find in the book the description of properties and applications employing organic and inorganic materials, as well as the methods of fabrication and analysis of operation and regions of application of modern optoelectronic devices.

This book provides a highly practical treatment of Glancing Angle Deposition (GLAD), a thin film fabrication technology optimized to produce precise nanostructures from a wide range of materials. GLAD provides an elegant method for fabricating arrays of nanoscale helices, chevrons, columns, and other porous thin film architectures using physical vapour deposition processes such as sputtering or evaporation. The book gathers existing procedures, methodologies, and experimental designs into a single, cohesive volume which will be useful both as a ready reference for those in the field and as a definitive guide for those entering it. It covers: Development and description of GLAD techniques for nanostructuring thin films Properties and characterization of nanohelices, nanoposts, and other porous films Design and engineering of optical GLAD films including fabrication and testing, and chiral films Post-deposition processing and integration to optimize film behaviour and structure Deposition systems and requirements for GLAD fabrication A patent survey, extensive relevant literature, and a survey of GLAD's wide range of material properties and diverse applications.

Badeker in 1907 observed that some materials are optically transparent in the visible light and electrically conducting [1]. Because of the increasing interest in electrically and electronically active materials, the search for materials and the techniques for producing semi-transparent electrically conducting films have gained much importance. In an intrinsic stoichiometric material, it is not possible to have simultaneously high transparency (>80%%) in the visible region and high electrical conductivity (>103 Ω cm-1). A variety of metals in thin film form (